Abstract: A method of preparing an electrochromic device involves forming multiple layers of selected materials on a substrate in a vacuum processing chamber. A first of these layers is an electrode layer deposited directly on the substrate and used for making contact to a subsequently deposited precursor film, preferably tungsten oxide, from which an electrochromic layer is formed by lithium loading in the presence of ionized nitrogen. This not only forms the electrochromic layer by diffusion of the lithium into the tungsten oxide, but also forms a thin lithium nitride ion transfer layer on the then exposed surface. Subsequently, a lithium fluoro-nitride electrolyte layer is formed on the ion transfer layer by evaporation from a lithium fluoride source in the presence of ionized nitrogen. An ion storage layer, which may be a vanadium oxide and a transparent second electrode layer are subsequently vacuum deposited.

Abstract: A solid-state electronic electrochromic device (ECD) operates electronically rather than relying on the ionic motion that is common in electrochromic devices. The electronic ECD has at least one active layer sandwiched between two electrodes. The active layer is made of mixed metal oxides and may be made of a mixture of tungsten and praseodymium oxides. The electronic ECD may have only a single active layer, or may have multiple layers that have the same composition and that are separated by thin transparent metal films. Some versions of the electronic ECD incorporate a distribution of small metal particles within the active layer.

Abstract: A method of preparing an electrochromic device involves forming multiple layers of selected materials on a substrate in a vacuum processing chamber. A first of these layers is an electrode layer deposited directly on the substrate and used for making contact to a subsequently deposited precursor film, preferably tungsten oxide, from which an electrochromic layer is formed by lithium loading in the presence of ionized nitrogen. This not only forms the electrochromic layer by diffusion of the lithium into the tungsten oxide, but also forms a thin lithium nitride ion transfer layer on the then exposed surface. Subsequently, a lithium fluoro-nitride electrolyte layer is formed on the ion transfer layer by evaporation from a lithium fluoride source in the presence of ionized nitrogen. An ion storage layer, which may be a vanadium oxide and a transparent second electrode layer are subsequently vacuum deposited.

Abstract: An electrochromic device is usable for tuning and modulating infrared radiation in a spectral region comprising wavelengths between approximately 1 and 30 microns. This device comprises a plurality of thin films successively deposited on a substrate. The first of these films is a substrate electrode deposited on a suitably prepared substrate. A plurality of active layers comprising at least an electrochromic layer, an electrolyte layer and an ion storage layer and a substantially transparent metal layer are then preferably deposited on the substrate electrode. The preferred active layers are characterized by a transmittance that is selectively controllable by applying a voltage across the plurality of active layers.

Abstract: An electrochromic device is prepared by forming multiple layers of selected materials on a substrate in a vacuum processing chamber. A first of these layers is an electrode layer deposited directly on the substrate and used for making contact to a subsequently deposited precursor film, preferably tungsten oxide, from which an electrochromic layer is formed by lithium loading in the presence of ionized nitrogen. This not only forms the electrochromic layer by diffusion of the lithium into the tungsten oxide, but also forms a thin lithium nitride ion transfer layer on the then exposed surface. Subsequently, a lithium fluoro-nitride electrolyte layer is formed on the ion transfer layer by evaporation from a lithium fluoride source in the presence of ionized nitrogen. An ion storage layer, which may be a vanadium oxide and a transparent second electrode layer are subsequently vacuum deposited.

Abstract: An electrically conductive multilayer thin film structure and composition is transparent in both the visible and infrared portions of the spectrum. This multilayer film is readily deposited on a variety of substrates, including plastics, and survives such in service conditions as flexing, vibration, thermal cycling, thermal shock, ultraviolet exposure, and high humidity. The preferred films are also compatible with conventional photolithography processes.