Abstract: Disclosed are transparent articles having a substrate adapted for carrying a transparent and electrically conductive thin film thereon. The thin film includes an optical matching-stress releasing layer directly deposited on the substrate; a first antireflection layer directly deposited on the optical matching layer; a metal layer adapted for infra-red reflection and electrical conductivity directly deposited on the first antireflection layer; a second antireflection layer deposited directly on the metal layer adapted for high visibility and infra-red transmission, and an optionally visible and infra-red region transparent outermost protective layer deposited on the second antireflection layer. In certain aspects, no buffer layer is positioned between the metal layer adapted for infra-red reflection and electrical conductivity and the second antireflection layer.

Abstract: Electrochromic devices having buffer layer(s) that promote electron transfer between the second transparent electrode and second electrochromic layer while concurrently reducing or inhibiting deleterious chemical interaction between the second electrochromic layer and the second electrode and/or maintaining the conductive state of the second electrode and while the device changes the from a low transparency state of approximately 10-20% transmittance in the visible region to a high transparency state of approximately 75% to 95% transmittance in the visible region with at least a 70% difference in transmittance between the low and high transmittance states. In certain aspects, the electrochromic devices change from a low transparency state having a gray color to a high transparency state that is substantially colorless within 20 seconds of applying the selective electrical potential to the electrochromic device. Also disclosed are methods of making the electrochromic devices.

Abstract: Disclosed are transparent articles having a substrate adapted for carrying a transparent and electrically conductive thin film thereon. The thin film includes an optical matching-stress releasing layer directly deposited on the substrate; a first antireflection layer directly deposited on the optical matching layer; a metal layer adapted for infra-red reflection and electrical conductivity directly deposited on the first antireflection layer; a second antireflection layer deposited directly on the metal layer adapted for high visibility and infra-red transmission, and an optionally visible and infra-red region transparent outermost protective layer deposited on the second antireflection layer. In certain aspects, no buffer layer is positioned between the metal layer adapted for infra-red reflection and electrical conductivity and the second antireflection layer.

Abstract: A protective film for a thin film device comprises a composite inorganic film that may be deposited on a parylene film or deposited directly on the device. Optionally, additional parylene and composite inorganic protective films may be added. The composite inorganic protective film is on the order of 1-100 nm thick and contains a material (e.g., Si) that forms a tenacious oxide at room temperature. When the device is exposed to air after deposition of the composite inorganic film, the oxidizable species oxidizes and fills voids to create an effective diffusion barrier.

Abstract: The polarization of a beam of radiation can be changed by passing the beam through an electrochromic device (ECD) and applying voltages to the ECD to selectively change the absorption of components of the beam and to change its polarization. This method can operate over a wide spectral region that may extend from 200 nm to 30 ?m. In addition, the polarizer can be configured to be tuned by moving the polarizer transversely with respect to a beam of radiation that is characterized by a selected wavelength. In this case either or both of the composition and thickness of the polarizer may vary along the direction of motion in a controlled fashion.

Abstract: A solid-state electronic electrochromic device (ECD) operates electronically rather than relying on the ionic motion that is common in electrochromic devices. The electronic ECD has at least one active layer sandwiched between two electrodes. The active layer is made of mixed metal oxides and may be made of a mixture of tungsten and praseodymium oxides. The electronic ECD may have only a single active layer, or may have multiple layers that have the same composition and that are separated by thin transparent metal films. Some versions of the electronic ECD incorporate a distribution of small metal particles within the active layer.

Abstract: An electrically conductive multilayer thin film structure and composition is transparent in both the visible and infrared portions of the spectrum. This multilayer film is readily deposited on a variety of substrates, including plastics, and survives such in service conditions as flexing, vibration, thermal cycling, thermal shock, ultraviolet exposure, and high humidity. The preferred films are also compatible with conventional photolithography processes.

Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: A substrate for use in a vacuum chamber has a workpiece supporting surface that has two or more mutually electrically insulated bifilar conductors configured as interleaved spirals disposed on it. Each of these bifilar conductors has a respective electrode at each of its two ends. This provides an electrostatic chuck for clamping a workpiece to the supporting surface when an electric voltage is applied between the two bifilar conductors or between one of the two bifilar conductors and an insulating workpiece. This arrangement also provides for electric heating of the workpiece when an electric voltage is applied between the two electrodes associated with one of the bifilar conductors. Moreover, when the electrical resistance of at least one of the bifilar conductors is known as a function of temperature, this arrangement allows one to sense the temperature of a workpiece supported on the substrate.

Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer. A second conductive layer is located on the active layer.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer. A second conductive layer is located on the active layer.