Abstract: A thin film comprising a fullerodendrimer and a method of manufacturing a thin film comprising coating on a substrate of a mixture of a fullerodendrimer and a solvent. It is possible to further incorporate an organic polymer and/or an inorganic polymer. The fullerene may be C60 or C70. A product comprising a substrate on which is provided a fullerene thin film. A method of manufacturing a product comprising a substrate on which is provided a fullerene thin film, comprising providing on a substrate of a thin film comprising a fullerodendrimer and decomposing of at least the dendrimer constituting the fullerodendrimer by heating in a non-oxidizing atmosphere.

Abstract: The invention is directed to a catalyst having activity under the irradiation of a visible light, the catalyst being an oxide semiconductor such as an anatase type titanium dioxide, having stable oxygen defects. A method for producing a catalyst having activity under the irradiation of a visible light which comprises treating an oxide semiconductor with hydrogen plasma or with a plasma of a rare gas element, comprising performing the treatment in a state substantially free from the intrusion of air into the treatment system is also provided. An article comprising a base material having the catalyst above provided on the surface thereof and a method for decomposing a substance, comprising bringing an object to be decomposed into contact with the catalyst above under the irradiation of a light containing at least a visible radiation are disclosed.

Abstract: A thin film comprising a fullerodendrimer and a method of manufacturing a thin film comprising coating on a substrate of a mixture of a fullerodendrimer and a solvent. It is possible to further incorporate an organic polymer and/or an inorganic polymer. The fullerene may be C60 or C70. A product comprising a substrate on which is provided a fullerene thin film. A method of manufacturing a product comprising a substrate on which is provided a fullerene thin film, comprising providing on a substrate of a thin film comprising a fullerodendrimer and decomposing of at least the dendrimer constituting the fullerodendrimer by heating in a non-oxidizing atmosphere.