Abstract: Condensation copolymers such as polyesters are rendered photodegradable, by subjecting them to conditions under which they undergo ester interchange effectively causing polymer chain scission, in the presence of a keto carbonyl containing compound having chemical groups reactive with the condensation polymer products formed by the ester interchange. The compound reacts chemically with the polymer products to reform the high molecular weight condensation copolymer, but with the keto carbonyl groups chemically linked into the polymer chains to confer photodegradability thereon.
Type:
Grant
Filed:
September 30, 1988
Date of Patent:
November 28, 1989
Assignee:
Ecoplastics Limited
Inventors:
James E. Guillet, Ilse Treurnicht, Ruey S. Li
Abstract: Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
Abstract: Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.