Abstract: A cleaning apparatus includes a nozzle assembly and an arm supporting the nozzle assembly. In some embodiments, the arm includes a first rotatable arm member defining a first axis and a second rotatable arm member defining a second axis and connected to the first rotatable member. In certain examples, the first rotatable arm is rotatable about the first axis and the second rotatable arm is rotatable about the second axis.

Abstract: A cleaning apparatus includes a nozzle assembly and an arm supporting the nozzle assembly. In some embodiments, the arm includes a first rotatable arm member defining a first axis and a second rotatable arm member defining a second axis and connected to the first rotatable member. In certain examples, the first rotatable arm is rotatable about the first axis and the second rotatable arm is rotatable about the second axis.

Abstract: A cleaning system includes a cleaning apparatus that is positionable in a cleaning environment and a cleaning processing device. The cleaning apparatus includes a sensor and a cleaning device. The sensor is configured to measure a depth of a target material on a surface of the vessel, and the cleaning device is configured to generate a cleaning force. The cleaning processing device is configured to receive a plurality of depth measurements of the target material on the surface, determine a cleaning protocol for the cleaning device on the surface based on the plurality of depth measurements, and control the cleaning apparatus to cause the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

Abstract: A cleaning system includes a cleaning apparatus that is positionable in a cleaning environment and a cleaning processing device. The cleaning apparatus includes a sensor and a cleaning device. The sensor is configured to measure a depth of a target material on a surface of the vessel, and the cleaning device is configured to generate a cleaning force. The cleaning processing device is configured to receive a plurality of depth measurements of the target material on the surface, determine a cleaning protocol for the cleaning device on the surface based on the plurality of depth measurements, and control the cleaning apparatus to cause the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

Abstract: Embodiments of the present invention include systems, apparatuses, and methods for cleaning areas. A cleaning apparatus is provided having a programmable, portable, multi axis articulating arm (MAAA). The apparatus may include a base having at least one magnet configured to magnetically mount the apparatus within the areas to be cleaned. The MAAA may have a first end attached to the base and extending away from the base, and a second end attached to a nozzle. The MAAA may have a plurality of connected arm segments. The MAAA may include at least two rotatable joints allowing for manipulation of the nozzle and movement of the apparatus along multiple axes.

Abstract: Embodiments of the present invention include systems, apparatuses, and methods for cleaning interiors of containers. Cleaning systems are provided having a frame, a table attached to the frame, a gantry system secured above the table and attached to the frame; and a cleaning attachment secured to the gantry system and including a cleaning tool. The cleaning attachment may be positionable using the gantry system to fit in an opening of a container placed on the table. The cleaning tool may be remotely operable. The table may be adjustable. The cleaning tool may include a high pressure water line with a gamma jet disposed at one end.