Abstract: A semiconductor waste abatement system for a semiconductor processing system includes a vacuum pump, an abatement apparatus having an abatement chamber in fluid communication with a source of semiconductor waste gas from the semiconductor processing chamber, and with the abatement chamber configured to ionize the waste gas and to exhaust ionized gas. The abatement system further includes a filter apparatus with a filter chamber, which forms a liquid reservoir. The inlet of the filter apparatus is in fluid communication with the outlet of the abatement chamber and the liquid reservoir, and the outlet of the filter apparatus is in communication with the inlet of the vacuum pump, wherein the filter chamber is under a vacuum, and wherein semiconductor waste gas is ionized in the abatement chamber and then filtered by the filter apparatus prior to input to the vacuum pump.

Abstract: A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.

Abstract: A Gifford-McMahon cryogenic refrigerator comprises a reciprocating displacer within a refrigeration volume. The displacer is pneumatically driven by a drive piston within a pneumatic drive volume. Pressure in the pneumatic drive volume is controlled by valving that causes the drive piston to follow a programmed displacement profile through stroke of the drive piston. The drive valving may include a proportional valve that provides continuously variable supply and exhaust of drive fluid. In a proportionally controlled feedback system, the valve into the drive volume is controlled to minimize error between a displacement signal and a programmed displacement profile. Valving to the warm end of the refrigeration volume may also be proportional. A passive force generator such as a mechanical spring or magnets may apply force to the piston in opposition to the driving force applied by the drive fluid.

Abstract: A semiconductor processing system includes a semiconductor processing chamber, a pump, an exhaust line in fluid communication with the chamber through the pump, and a steam generator and reactor. The steam generator and reactor has a process conduit with an inlet in line in the exhaust line for generating superheated steam and effecting transformations of chemicals in the exhaust fluid flowing in exhaust line into the inlet.

Abstract: In a cryopump, a primary cryopumping array having adsorbent and cooled by a second refrigerator stage extends along radiation shield sides. That array is shielded by a condensing cryopumping array that extends along the primary cryopumping array. The primary cryopumping array may be a cylinder with adsorbent on an inwardly facing surface, and the condensing cryopumping array may comprise an array of baffles having surfaces facing the frontal opening. A raised surface such as a conical surface at the base of the radiation shield redirects molecules received from the frontal opening toward the primary cryopumping array. The refrigerator cold finger may extend tangentially relative to the radiation shield or connect to the base of the radiation shield.

Abstract: A cryopump has a cryogenic refrigerator with cold and colder stages that cool a radiation shield, a primary cryopumping array and a frontal array. The frontal array is coupled to the cold stage and is spaced from and wrapped around the frontally facing envelope of the primary cryopumping array. The frontal array may be recessed from the frontal opening and closer to the primary cryopumping array than to the frontal opening.

Abstract: A kit may include at least one frame lifting mechanism configured to be mounted within the support frame. The lifting mechanism may include a movable element configured to be movably mounted to the frame and an extendible member configured to extend between the movable element and a static member mounted on the frame. The movable element includes at least one support portion extending from a lower surface of the movable element when the movable element is mounted to the frame. The extendible member is configured to be movable between a compressed state and an extended state. The movable element is configured to be mounted to the frame such that on extension of the extendible member the movable element is pushed downwards and the at least one support portion moves below a base of the frame and provides a lifting force to the frame.

Abstract: A heat exchanger within an insulated enclosure receives primary refrigerant at a high pressure and cools the primary refrigerant using a secondary refrigerant from a secondary refrigeration system. An expansion unit within the insulated enclosure receives the primary refrigerant at the high pressure from the heat exchanger and discharges the primary refrigerant at a low pressure. A supply line delivers the primary refrigerant at the low pressure to the load and a return line returns the primary refrigerant from the load to the primary refrigeration system. A system control unit controls operation of at least one of the primary refrigeration system and the secondary refrigeration system to provide a variable refrigeration capacity to the load based on at least one of: a pressure of the primary refrigerant delivered to the load, and at least one temperature of the load.

Abstract: A Gifford-McMahon cryogenic refrigerator comprises a reciprocating displacer within a refrigeration volume. The displacer is pneumatically driven by a drive piston within a pneumatic drive volume. Pressure in the pneumatic drive volume is controlled by valving that causes the drive piston to follow a programmed displacement profile through stroke of the drive piston. The drive valving may include a proportional valve that provides continuously variable supply and exhaust of drive fluid. In a proportionally controlled feedback system, the valve into the drive volume is controlled to minimize error between a displacement signal and a programmed displacement profile. Valving to the warm end of the refrigeration volume may also be proportional. A passive force generator such as a mechanical spring or magnets may apply force to the piston in opposition to the driving force applied by the drive fluid.

Abstract: In accordance with an embodiment of the invention, there is provided a method of warming a heat exchanger array of a very low temperature refrigeration system, the method comprising diverting at least a portion of refrigerant flow in the refrigeration system away from a refrigerant flow circuit used during very low temperature cooling operation of the refrigeration system, to effect warming of at least a portion of the heat exchanger array; and while diverting the at least a portion of refrigerant flow, preventing excessive refrigerant mass flow through a compressor of the refrigeration system.

Abstract: A refrigerant management system controls the supply of refrigerant from two or more variable speed and fixed speed compressors to a plurality of cryogenic refrigerators. The system employs a plurality of sensors to monitor and regulate the overall refrigerant supply to deliver an appropriate refrigerant supply to each of the cryogenic refrigerators. The amount of refrigerant to supply is based on an aggregate demand for refrigerant from the plurality of cryogenic refrigerators and a refrigerant correction metric. An appropriate supply of refrigerant is distributed to each cryogenic refrigerator by adjusting the speed of the variable speed compressors or, alternatively, selectively turning the compressors on or off. The speed of the variable speed compressors is adjusted by determining an amount of refrigerant to supply to the plurality of cryogenic refrigerators.

Abstract: The present disclosure relates to an abatement apparatus monitoring system. The abatement apparatus monitoring system includes a processor; and at least one load cell for outputting a load cell signal to the processor. The at least one load cell is configured to support a waste tank of an abatement apparatus. The processor is configured to monitor a level of a liquid in the waste tank in dependence on the load cell signal. The present disclosure also relates to an abatement system comprising an abatement apparatus monitoring system; and a method of monitoring operation of an abatement system.

Abstract: A cryopump includes a refrigerator with at least first and second stages. A radiation shield surrounds the second stage and is in thermal contact with the first stage. The radiation shield includes a drain hole to permit cryogenic fluid to traverse through the drain hole during regeneration. The cryopump also includes a primary pumping surface supporting adsorbent in thermal contact with the second stage. The second stage array assembly includes a primary condensing surface, protected surfaces having adsorbent, and non-primary condensing surfaces. A baffle is disposed over the drain hole. The baffle redirects gas from an annular space disposed between the radiation shield and the vacuum vessel that attempts to traverse through the drain hole to prevent the gas from condensing on a non-primary condensing surface. The baffle directs gas to condense on the primary condensing surface.

Abstract: A refrigerator system or cryopump includes a first refrigerator having at least first and second stages, and a second refrigerator. A thermal coupling between the first stage of the first refrigerator and a cold end of the second refrigerator is restricted to maintain a temperature difference between the cold end of the second refrigerator and the first stage of the first refrigerator. The refrigerator system or cryopump also includes a radiation shield in thermal contact with the cold end of the second refrigerator, and a condensing surface, spaced from and surrounded by the radiation shield, and in thermal contact with a second stage, e.g., coldest stage, of the first refrigerator. The restricted thermal coupling can be configured to balance the cooling load on the two refrigerators.

Abstract: An ion pump includes an anode, a backing surface having at least one surface structure extending toward the anode and a cathode positioned between the anode and the backing surface and having an opening such that the at least one surface structure is aligned with and extends from the backing surface towards the opening.

Abstract: A cryopump comprises a refrigerator, a condensing array cooled by the refrigerator, a radiation shield surrounding the condensing array and cooled by the refrigerator. The radiation shield has a frontal opening covered by a frontal array that is also cooled by the refrigerator. The frontal array comprises louvers across an otherwise substantially open center region of the frontal opening and an orifice plate across an outer region of the frontal opening. The hybrid frontal array allows for pumping speeds approximating those of a louver frontal array but with flow control comparable to an orifice plate.

Abstract: A fault indicating circuit for an electric heater has a first branch to conduct a supply of electrical ,energy to the electrical heater and includes a temperature sensitive device to interrupt the supply of electrical energy to the electric heater when exposed to a temperature exceeding a set temperature. The fault detecting circuit has a second branch that includes at least an element of a fault indicating device. The first branch has a first resistance R1, the second branch has a second resistance R2 and the two branches are, electrically in parallel.

Abstract: A method includes assessing a plurality of Titanium plates to determine a grain size for each plate and removing all Titanium plates with an average grain size that is larger than a threshold size from the plurality of Titanium plates. One of the Titanium plates remaining in the plurality of Titanium plates after the removing step is then used to form a cathode for an ion pump.

Abstract: A process equipment heating system has a group of electric heaters and a heater checking system. The heater checking system is configured to determine a resistance value R1 for the group of electric heaters, compare the resistance value R1 with a reference resistance value RR and judge a fault condition if the resistance value R1 differs from the reference resistance value RR by more than a predetermined amount.