Patents Assigned to EEV Limited
  • Patent number: 5132195
    Abstract: In a method for fabricating imaging apparatus, adjoining regions, each forming only part of the active area of the complete device, are laid down separately, enabling larger active areas to be produced than would otherwise be possible using conventional wafer stepper equipment. In the complete device, imaging may be arranged over the boundary between the regions and/or charge may be transferred across the boundary.
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: July 21, 1992
    Assignee: EEV Limited
    Inventor: Peter J. Pool
  • Patent number: 5089914
    Abstract: A thermal camera is mounted within a helmet and is arranged such that the optical path in free space from its output is wholly within the volume defined by the helmet and the helmet faceplate. The output iminges on a concave mirror/lens combination located below the wearer's sightline. The arrangement is particularly suitable for fire fighting and search and rescue applications.
    Type: Grant
    Filed: September 27, 1990
    Date of Patent: February 18, 1992
    Assignee: EEV Limited
    Inventor: John A. Prescott
  • Patent number: 5041801
    Abstract: A magnetron is tuned by a co-axial transmission line co-axial with the axis of the magnetron and a radial transmission line linking the co-axial line to a plurality of sampling points symmetrically positioned on the end of the magnetron. A fraction of the R.F. power in the magnetron passes into the transmission lines and vice versa, so by altering the resonant frequency of the transmission lines the frequency of the RF power in the magnetron can be controlled.
    Type: Grant
    Filed: October 20, 1989
    Date of Patent: August 20, 1991
    Assignee: EEV Limited
    Inventor: Keith Squibb
  • Patent number: 5038215
    Abstract: A CCD imaging array includes one or more shift registers. By injecting a charge packet at one end of the shift register, at times related to the start of line read out, then the charge packet reaches the other end of the shift register at the end of the line period. Thus the shift register can be used to generate line synchronization signals. The technique can also be applied for more complex waveform generation and for field generation.
    Type: Grant
    Filed: January 17, 1990
    Date of Patent: August 6, 1991
    Assignee: EEV Limited
    Inventor: Kevin A. D. Hadfield
  • Patent number: 5017891
    Abstract: The performance of a magnetron may be degraded by its output frequency changing. This degradation may be reduced by fixing a resonator element in the magnetron's output waveguide enabling temperature stabilization to be achieved and also permitting the output spectrum of the radiation to be narrowed.
    Type: Grant
    Filed: November 13, 1989
    Date of Patent: May 21, 1991
    Assignee: EEV Limited
    Inventors: Paul A. Jerram, Stephen Bainbridge
  • Patent number: 4954748
    Abstract: In a thyratron gas discharge device, magnetic material is located coaxially with the anode to produce a magnetic field between the anode and cathode which is substantially parallel to a discharge established between them. This causes electrons emitted from the cathode to have longer path lengths than would otherwise be the case and so the ionization density within the device is increased. This improved this operating characteristics of the thyratron and results in greater utilization of the cathode.
    Type: Grant
    Filed: December 2, 1988
    Date of Patent: September 4, 1990
    Assignee: EEV Limited
    Inventor: Clifford R. Weatherup
  • Patent number: 4955033
    Abstract: Metal vapor laser apparatus includes an envelope within which is contained electrodes and a plurality of cylindrical copper segments arranged between them. During operation of the laser, bromine and helium buffer gas are arranged to flow through the envelope, causing copper bromide to be produced. When a discharge is established between the electrodes, the copper bromide vaporizes and dissociates to give copper vapor which is then excited to produce a population inversion. Such apparatus is able to operate at relatively low temperatures, in the region of 600.degree. C.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: September 4, 1990
    Assignee: EEV Limited
    Inventors: Arthur Maitland, Ewan S. Livingstone
  • Patent number: 4907242
    Abstract: Laser apparatus including a relatively long cylindrical cathode within a discharge tube containing a buffer gas at a low pressure of less than 1 Torr. By employing a laser constructed according to the invention, it is possible to achieve a plasma which extends along the length of the cathode, which may be up to one meter long.
    Type: Grant
    Filed: October 11, 1988
    Date of Patent: March 6, 1990
    Assignee: EEV Limited
    Inventors: Arthur Maitland, Clifford R. Weatherup
  • Patent number: 4899362
    Abstract: In a laser arrangement, solid or liquid material, at least part of which comprises a laser amplifying medium, is atomized in a gas prior to being applied to a discharge region. In one embodiment of the invention, the gas is combustible and is ignited to produce a flame which provides heating of the material. The invention is particularly applicable to metal vapour lasers.In another embodiment of the invention, the material is atomized in an inert gas and a discharge within a laser discharge tube is used to provide excitation.
    Type: Grant
    Filed: December 5, 1988
    Date of Patent: February 6, 1990
    Assignee: EEV Limited
    Inventors: Arthur Maitland, Ewan S. Livingstone