Abstract: A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R1 and R3 are each independently selected from H, OH, CO2H, halogen, C1–C3 alkyl, C1–C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9–C16 alkyl, or C9–C16 alkoxy
Type:
Grant
Filed:
April 12, 2001
Date of Patent:
March 14, 2006
Assignee:
EKC Technology, Ltd.
Inventors:
Jerome Daviot, Stanley Affrossman, Douglas Holmes