Patents Assigned to Electro-Graph, Inc.
  • Patent number: 5545257
    Abstract: Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.
    Type: Grant
    Filed: June 13, 1994
    Date of Patent: August 13, 1996
    Assignee: Electro-Graph, Inc.
    Inventor: Michael C. Vella