Patents Assigned to Electron Processing Systems, Inc.
  • Patent number: 6221216
    Abstract: Commercial sterilization of the interior surfaces of containers, cups or bottles by the use of energetic electrons is accomplished by directing electrons of moderate energies through the open mouth of such containers. Electrons which would normally illuminate the container beyond the inner diameter of the neck opening may be absorbed by a suitable electron-absorbing and cooled mask positioned above the container neck.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: April 24, 2001
    Assignee: Electron Processing Systems, Inc.
    Inventors: Samuel V. Nablo, Denise A. Cleghorn
  • Patent number: 5825037
    Abstract: A compact, selfshielded electron beam processing technique for three dimensional products includes a treatment zone bounded by at least one material of high atomic number. Energetic electrons are directed into the treatment zone in such a manner that electron reflection from the boundary of the treatment zone assists in filling the treatment zone with energetic electrons. The products to be treated are caused to travel through the treatment zone without any mechanical contact therewith (such as by ballistic or pneumatic techniques).
    Type: Grant
    Filed: May 30, 1996
    Date of Patent: October 20, 1998
    Assignee: Electron Processing Systems, Inc.
    Inventor: Samuel V. Nablo
  • Patent number: 5801387
    Abstract: Powders and aggregates are treated in pneumatic transfer as a thin layer moving at high velocity which electrons from a selfshielded electron beam processor of voltage less than or equal to 500 kilovolts.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: September 1, 1998
    Assignee: Electron Processing Systems, Inc.
    Inventors: Samuel V. Nablo, James C. Wood, Jr.