Abstract: A continuous strip is electrochemically processed in an electrolytic processing bath using either a thin flexible or resilient dielectric wiping blade or an open web, plastic mesh to wipe bubbles of gas from the surface, sever dendritic material, if such is present, and to remove a surface layer of partially depleted electrolytic solution, replacing with fresh solution and to stabilize strip portions extending between support rolls. The resilient dielectric wiper blade is preferably used with perforated anodes which allow fresh electrolytic solution to flow into the space between the anodes and the strip surface after being expelled by passage of the strip past the wiping blade. The wiping blades may also be angularly oriented with respect to the strip to increase the wiping effectiveness.
Type:
Grant
Filed:
December 15, 1995
Date of Patent:
November 17, 1998
Assignee:
Electroplating Technologies, Inc.
Inventors:
James L. Forand, Harold M. Keeney, Erik S. Vananglen
Abstract: A resilient dielectric wiper blade is mounted between a cathodic workpiece and an anode to wipe bubbles of hydrogen from the surface, sever dendritic material, if such is present as the coating thickens, and to remove a surface layer of partially depleted electrolytic solution and replace with fresh solution. The resilient dielectric wiper blade is preferably used with perforated anodes.
Type:
Grant
Filed:
January 10, 1994
Date of Patent:
October 31, 1995
Assignee:
Electroplating Technologies, Inc.
Inventors:
Harold M. Keeney, Erik S. Van Anglen, James L. Forand