Patents Assigned to Elionix, Inc.
  • Patent number: 9410984
    Abstract: The present invention provides a method and an apparatus for measuring a force (which will be referred to as surface force) acting between two material surfaces. A surface force measuring method includes moving an object (1) toward a probe (4) until the probe (4) is adsorbed to the object (1), then applying a load from an electromagnetic-force generator (20) to a supporting member (6) in a direction as to separate the probe (4) from the object (1) while gradually increasing an electric current supplied to the electromagnetic-force generator (20), obtaining a value of the electric current supplied to the electromagnetic-force generator (20) when the probe (4) is separated from the object (1), and converting the value of the electric current into a surface force acting between the probe (4) and the object (1).
    Type: Grant
    Filed: January 16, 2014
    Date of Patent: August 9, 2016
    Assignee: ELIONIX INC.
    Inventors: Hironao Amemiya, Hayato Kobayashi, Takahisa Kato
  • Patent number: 6605811
    Abstract: In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: August 12, 2003
    Assignee: Elionix Inc.
    Inventors: Masanao Hotta, Yasuhiko Kojima, Takaomi Ito, Katsumi Yokota, Tetsuyuki Okabayashi, Akio Otani, Susumu Ono
  • Patent number: 4554452
    Abstract: In a method of and an apparatus for handling a charged particle beam, at least one of a signal representative of the astigmatism and a signal for correction of the astigmatism is obtained by computation on the basis of values detected under a certain condition from signal particles derived from an object which is moved repeatedly at least two directions with respect to a charged particle beam. The amount and direction of astigmatism thus computed are displayed respectively for manual correction. Astigmatism correction and focusing can be also carried out automatically.
    Type: Grant
    Filed: July 18, 1983
    Date of Patent: November 19, 1985
    Assignee: Elionix, Inc.
    Inventor: Tadao Suganuma