Abstract: The present invention provides a method and an apparatus for measuring a force (which will be referred to as surface force) acting between two material surfaces. A surface force measuring method includes moving an object (1) toward a probe (4) until the probe (4) is adsorbed to the object (1), then applying a load from an electromagnetic-force generator (20) to a supporting member (6) in a direction as to separate the probe (4) from the object (1) while gradually increasing an electric current supplied to the electromagnetic-force generator (20), obtaining a value of the electric current supplied to the electromagnetic-force generator (20) when the probe (4) is separated from the object (1), and converting the value of the electric current into a surface force acting between the probe (4) and the object (1).
Abstract: In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor.
Abstract: In a method of and an apparatus for handling a charged particle beam, at least one of a signal representative of the astigmatism and a signal for correction of the astigmatism is obtained by computation on the basis of values detected under a certain condition from signal particles derived from an object which is moved repeatedly at least two directions with respect to a charged particle beam. The amount and direction of astigmatism thus computed are displayed respectively for manual correction. Astigmatism correction and focusing can be also carried out automatically.