Abstract: A semiconductor device includes a semiconductor substrate having first and second regions, a first pillar transistor, and a second pillar transistor, wherein the first pillar transistor comprises a first semiconductor pillar disposed in the first region, and a first gate electrode covering a side surface of the first semiconductor pillar, wherein the second pillar transistor comprises a second semiconductor pillar disposed in the second region, and a second gate electrode covering a side surface of the second semiconductor pillar, wherein the first gate electrode is different in height from the second gate electrode, and the first and second pillar transistors form a CMOS device.

Abstract: A delay circuit generates an internal clock signal or a second clock signal by delaying an external clock signal. A detection-potential generation circuit included in a phase-difference determination circuit generates a detection potential corresponding to a difference between a timing of an active edge of an internal clock signal or a third clock signal and a timing of the target external clock signal in a first node. A reference-potential generation circuit included in the phase-difference determination circuit generates a reference potential in a second node. A phase control circuit delays the second clock signal according to the detection potential. At this time, when the detection potential is higher than the reference potential, an adjustment amount of the second clock signal per adjustment changes.

Abstract: A device includes a substrate, a semiconductor chip, first and second pads, and a first wiring layer. The substrate includes first and second surfaces. The semiconductor chip includes third and fourth surfaces. The third surface faces toward the first surface. The first and second pads are provided on the third surface. The first and second pads are connected to each other. The first wiring layer is provided on the second surface of the substrate. The first wiring layer is connected to the first pad.

Abstract: A semiconductor device includes a semiconductor substrate, first and second penetration electrodes each penetrating the semiconductor substrate, a multi-level wiring structure formed on the semiconductor substrate, the multi-level wiring structure including a lower-level wiring, an upper-level wiring and an interlayer insulating film between the lower-level wiring and the upper-level wiring, a first wiring pad formed as the lower-level wiring and electrically connected to the first penetration electrode, a second wiring pad formed as the upper-level wiring, a plurality of first through electrodes each formed in the interlayer insulating film to form an electrical connection between the first and second wiring pads, a third wiring pad formed as the lower-level wiring and electrically connected to the second penetration electrode, a fourth wiring pad formed as the upper-level wiring, and a plurality of second through electrodes each formed in the interlayer insulating film.

Abstract: A method of producing a Metal-Insulator-Metal (MIM) capacitor stack through doping to achieve low current leakage and low equivalent oxide thickness is disclosed. A high K dielectric material is deposited on a non-noble electrode; the dielectric material is doped with oxides from group IIA. The dopant increases the barrier height of metal/insulator interface and neutralizes free electrons in dielectric material, therefore reduces the leakage current of MIM capacitor. The electrode may also be doped to increase work function while maintaining a rutile crystalline structure. The method thereby enhances the performance of DRAM MIM capacitor.

Abstract: Variations of the impedance of each output driver of a semiconductor device can be reduced, and high-speed calibration is achieved. A calibration circuit including a replica circuit having the same configuration as each pull-up circuit or pull-down circuit included in an output driver of a semiconductor device is provided within a chip. During a first calibration operation, the replica circuit is provided with voltage conditions that allow the maximum current to flow through the output driver so that an impedance of the replica circuit is equal to a value of an external resistor. During a second calibration operation, table parameters obtained in the first calibration operation are used to adjust the impedance of the output driver without use of the replica circuit.

Abstract: To provide a DLL circuit including: a first phase determination circuit that compares phases of rising edges of an external clock and a first internal clock; a second phase determination circuit that compares phases of falling edges of the external clock and the first internal clock; an adjusting unit that adjusts positions of active edges of internal clocks based on determination results; and a control circuit that sets one of adjustment amounts of the second and third internal clocks to a larger value than the other, in response to a fact that adjustment directions of the active edges of the second and third internal clocks are mutually the same. With this arrangement, a duty can be set nearer to 50% while performing phase adjustment. Accordingly, the time required to lock the DLL circuit can be shortened.

Abstract: A device includes memory banks, each having a plurality of memory cells with respective error data output circuits. Each of the error data output circuits outputs first to M-th (M is an integer of 2 or more) error data according to first to M-th data retrieved from first to M-th memory cell groups selected from its corresponding memory bank. A test control circuit has first error data synthesis circuits and second to (M+1)-th error data synthesis circuits, each of which synthesizes the first to M-th error data from a corresponding error data output circuit and outputs the synthesized data as first test data. Each of the error data synthesis circuits synthesizes m-th (m is an integer of from 1 to M) error data from the error data output circuits and outputs the synthesized data as (m+1)-th test data.

Abstract: Disclosed herein is a device that includes a memory cell array having a plurality of pages, a row cache register, and an array control circuit. The array control circuit is configured to: select one of the pages as a selected page to form an electrical path between the selected page and the row cache register in response to a first command with a row address; cut the electrical path between the selected page and the row cache register; and form the electrical path again between the selected page and the row cache register in response to a second command without the row address.

Abstract: A semiconductor memory device comprises a memory cell array, first and second bit lines, first and second amplifiers, and a sense amplifier control circuit. An amplifying element in the first sense amplifier amplifiers the signal of the first bit line and converts it into an output current. The second bit line is selectively connected to the first bit line via the first sense amplifier. A signal voltage decision unit in the second sense amplifier determines the signal level of the second bit line being supplied with the output current. The sense amplifier control circuit controls connection between the amplifying element and the unit in accordance with a determination timing, which switches the above connection from a connected state to a disconnected state at a first timing in a normal operation and switches in the same manner at a delayed second timing in a refresh operation.

Abstract: A semiconductor device includes a first amplifier circuit, a second amplifier circuit, first and second bit lines coupled to the first amplifier circuit, third and fourth bit lines coupled to the second amplifier circuit, a first equalizer circuit being coupled to the first and second bit lines, and a second equalizer circuit being coupled between the second and third bit lines. The second equalizer circuit being closer to the second amplifier circuit than the first equalizer circuit, the first equalizer circuit being closer to the first amplifier circuit than the second equalizer circuit.

Abstract: A plurality of contact plugs to be connected to a drain region or a source region of each of transistors constituting a sub-word line driver that drives a sub-word line are formed, by using a SAC line technique of selectively etching an insulation layer that covers each of the transistors by using a mask having line-shaped openings provided across a portion in which the contact plugs of each of the transistors are to be formed.

Abstract: A write circuit writes a first data signal that is an input data signal that indicates a first logic level to each memory bank in sequence and writes a second data signal that is an input data signal that indicates a second logic level to each memory bank simultaneously.

Abstract: A method for fabricating a DRAM capacitor stack is described wherein the dielectric material is a multi-layer stack formed from a highly-doped material combined with a lightly or non-doped material. The highly-doped material remains amorphous with a crystalline content of less than 30% after an annealing step. The lightly or non-doped material becomes crystalline with a crystalline content of equal to or greater than 30% after an annealing step. The dielectric multi-layer stack maintains a high k-value while minimizing the leakage current and the EOT value.

Abstract: Disclosed herein is a device that includes a multi-level wiring structure including a first wiring layer and a second wiring layer formed over the first wiring layer; a memory cell array area including a plurality of memory cells, a plurality of sense amplifiers and a plurality of sub amplifiers; a main amplifier area including a plurality of main amplifiers, the memory cell array area and the main amplifier area being arranged in line in a first direction; and a plurality of first I/O lines each connecting an associated one of the sub amplifiers to an associated one of the main amplifiers, each of the first I/O lines including first and second wiring portions that are elongated in the first direction, the first wiring portion being formed as the first wiring layer and the second wiring portion being formed as the second wiring layer.

Abstract: A semiconductor device includes a plurality of channels, a plurality of command monitor circuits provided corresponding to the plurality of channels, respectively, and a plurality of signal lines coupled in common to the plurality of command monitor circuits. Each of the plurality of command monitor circuits includes a selector configured to receive a plurality of input signals and selectively output a plurality of selected signals among the input signals, based on a first selection information, and an output circuit coupled between the selector and the plurality of signal lines, and configured to output the selected signals to the plurality of signal lines, respectively, based on a second selection information. One of the plurality of command monitor circuits is selected to output the selected signals to the plurality of signal lines while the remaining of the command monitor circuits is non selected, based on the second selection information.

Abstract: Disclosed herein is a semiconductor chip that includes: a plurality of penetration electrodes each penetrating between main and back surfaces of the semiconductor chip, the penetration electrodes including a plurality of first penetration electrodes, a second penetration electrode and a third penetration electrode; and a wiring configured to intersect with a plurality of regions, each of the regions being defined as a region between corresponding two of the first penetration electrodes, one end of the wiring being coupled to the second penetration electrode, the other end of the wiring being coupled to the third penetration electrode.

Abstract: A semiconductor device of the invention comprise a memory cell array configured with hierarchical local bit lines and global bit lines, in which there are provide local bit lines, global bit lines, switches controlling a connection between the global bit lines, sense amplifiers, and a control circuit controlling the switches. In a first period, each sense amplifier amplifies a signal of one of adjacent global bit lines, and in a second period, each sense amplifier amplifies a signal of the other thereof. Accordingly, coupling between the global bit lines can be suppressed.

Abstract: The core chips each include a timing control circuit that outputs a timing signal synchronized with the outputting of parallel data to the interface chip. The interface chip includes a data input circuit that captures parallel data in synchronization with the timing signal. With this arrangement, the timing to output the parallel data and the timing to capture the parallel data are both synchronized with the timing signal generated in the core chips. Therefore, even if there is a difference in operation speed between each core chip and the interface chip, the parallel data can be accurately captured on the interface chip side.

Abstract: A semiconductor device includes a sense amplifier circuit. The sense amplifier circuit includes a cross-coupled first transistor and second transistor that perform amplification. The sources of the cross-coupled transistors are respectively connected in series with a third transistor and a fourth transistor, and electrical current supply capability of the third and fourth transistors is controlled by a control voltage given to control electrodes of the third and fourth transistors. In a data retaining period, a minimum sub-threshold current necessary for retaining the data is flowed to the third and fourth transistors according to the control voltage, and bit line potential is maintained.