Abstract: In accordance with the present invention, a new method, its structure and manufacturing method is described to reduce memory cell size about the half of the conventional method for a non-volatile NAND Flash cell. The control gates in a string of the NAND Flash cell array is formed as the combination of the drawn control gate and the self-aligned control gate by using a spacer method. The source and drain of a NAND cell is defined as the low doped region underneath the spacer.
Type:
Application
Filed:
March 1, 2007
Publication date:
March 13, 2008
Applicants:
Embedded Memory, Inc., Ace Memory, Inc.
Abstract: In accordance with the present invention, a new method, its structure and manufacturing method is proposed to reduce memory cell size about the half of the conventional method for a non-volatile NAND Flash cell. The control gates in a string of the NAND Flash cell array is formed as the combination of the drawn control gate and the self-aligned control gate by using a spacer method. The source and drain of a NAND cell is defined as the low doped region underneath the spacer.