Patents Assigned to Emil Kamieniecki
  • APPARATUS AND METHOD FOR RAPID PHOTO-THERMAL SURFACE TREATMENT
    Publication number: 20010001391
    Abstract: An apparatus for surface treating a semiconductor wafer includes a surface treatment chamber and a source of radiation. The semiconductor wafer disposed inside the chamber is illuminated with radiation sufficient to create a plurality of electron-hole pairs near the surface of the wafer and to desorb ions and molecules adsorbed on the surface of the wafer.
    Type: Application
    Filed: January 7, 1998
    Publication date: May 24, 2001
    Applicant: Emil Kamieniecki
    Inventor: EMIL KAMIENIECKI