Patents Assigned to EN2CORE technology, Inc.
  • Patent number: 10903046
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: January 26, 2021
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 10896806
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: January 19, 2021
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 10541114
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: January 21, 2020
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee