Patents Assigned to EN2CORE technology, Inc.
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Patent number: 12249925Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: GrantFiled: March 15, 2024Date of Patent: March 11, 2025Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 12249923Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: GrantFiled: January 11, 2022Date of Patent: March 11, 2025Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 12205794Abstract: This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.Type: GrantFiled: February 19, 2021Date of Patent: January 21, 2025Assignee: EN2CORE TECHNOLOGY INC.Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Patent number: 12159766Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: September 12, 2023Date of Patent: December 3, 2024Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Patent number: 12155320Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: January 10, 2024Date of Patent: November 26, 2024Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 11935725Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: October 28, 2022Date of Patent: March 19, 2024Assignee: EN2CORE TECHNOLOGY INC.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Patent number: 11909331Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: March 17, 2023Date of Patent: February 20, 2024Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 11791133Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: November 15, 2022Date of Patent: October 17, 2023Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Patent number: 11632061Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: February 17, 2022Date of Patent: April 18, 2023Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 11532455Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: December 27, 2019Date of Patent: December 20, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae-Hoon Uhm, Yun-Seong Lee, Yeong-Hoon Sohn, Se-Hong Park
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Patent number: 11521829Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 15, 2020Date of Patent: December 6, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Patent number: 11290028Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: June 11, 2018Date of Patent: March 29, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 11258373Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: GrantFiled: June 11, 2018Date of Patent: February 22, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 10903046Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 4, 2019Date of Patent: January 26, 2021Assignee: EN2CORE technology, Inc.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Patent number: 10896806Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 4, 2019Date of Patent: January 19, 2021Assignee: EN2CORE technology, Inc.Inventors: Sae Hoon Uhm, Yun Seong Lee
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Patent number: 10541114Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.Type: GrantFiled: December 8, 2017Date of Patent: January 21, 2020Assignee: EN2CORE technology, Inc.Inventors: Sae Hoon Uhm, Yun Seong Lee