Patents Assigned to EN2CORE technology, Inc.
  • Patent number: 12249925
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Grant
    Filed: March 15, 2024
    Date of Patent: March 11, 2025
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 12249923
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Grant
    Filed: January 11, 2022
    Date of Patent: March 11, 2025
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 12205794
    Abstract: This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.
    Type: Grant
    Filed: February 19, 2021
    Date of Patent: January 21, 2025
    Assignee: EN2CORE TECHNOLOGY INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
  • Patent number: 12159766
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Grant
    Filed: September 12, 2023
    Date of Patent: December 3, 2024
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
  • Patent number: 12155320
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: January 10, 2024
    Date of Patent: November 26, 2024
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 11935725
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: October 28, 2022
    Date of Patent: March 19, 2024
    Assignee: EN2CORE TECHNOLOGY INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 11909331
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: March 17, 2023
    Date of Patent: February 20, 2024
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 11791133
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Grant
    Filed: November 15, 2022
    Date of Patent: October 17, 2023
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
  • Patent number: 11632061
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: April 18, 2023
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 11532455
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: December 20, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae-Hoon Uhm, Yun-Seong Lee, Yeong-Hoon Sohn, Se-Hong Park
  • Patent number: 11521829
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 15, 2020
    Date of Patent: December 6, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 11290028
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: March 29, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 11258373
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: February 22, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 10903046
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: January 26, 2021
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 10896806
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: January 19, 2021
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee
  • Patent number: 10541114
    Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: January 21, 2020
    Assignee: EN2CORE technology, Inc.
    Inventors: Sae Hoon Uhm, Yun Seong Lee