Abstract: An improved system and method for purging a microenvironment to desired levels of relative humidity, oxygen, or particulates through the implementation of a purge gas delivery apparatus and method that provides even distribution of the purging gas within the microenvironment. A substrate container has a tower therein with a fluid flow passageway extending the length of the tower. Apertures with porous media between the aperture and fluid flow passageway regulate the volume and pressure of air discharging at each aperture. Alternatively, the tower may be formed of a porous tubular polymeric material. A sleeve may direct the discharge purge gas in the interior.

Abstract: A purifier for removing metal, such as chromium, from an organic solvent is disclosed. The purifier comprises a housing having a fluid inlet and a fluid outlet in fluid communication with the fluid inlet; a volume of ion-exchange resin disposed within the housing downstream of the fluid inlet; and a filtration member downstream of the volume of ion-exchange resin, the filtration member comprising at least one microporous membrane having a substantially neutral surface and a microporous polytetrafluoroethylene membrane downstream of the at least one microporous membrane. A method for removing metal, including chromium, from an organic solvent using a purifier of the invention is also disclosed.

Abstract: Precursors for use in depositing antimony-containing films on substrates such as wafers or other microelectronic device substrates, as well as associated processes of making and using such precursors, and source packages of such precursors. The precursors are useful for deposition of Ge2Sb2Te5 chalcogenide thin films in the manufacture of nonvolatile Phase Change Memory (PCM) or for the manufacturing of thermoelectric devices, by deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).

Abstract: Material management systems and methods include material storage vessels with information (e.g., electronic information) storage. Information may be communicated from a storage device to a process tool controller and employed to set or adjust a process tool operating parameter. Material information may be determined by remote analysis and subsequently communicated to an electronic information storage device of a vessel containing such material. Location and movement of material storage vessels within a customer facility may be automatically tracked, with further transfer of material-specific information. Product information may be associatively stored with material-specific information utilized in product manufacture.

Abstract: The present invention is a purification system for removing hydrogen fluoride and water from an electrolytic solution for lithium-ion secondary batteries in which [1] a purifier for removing hydrogen fluoride containing a hydrogen fluoride adsorbent selected from among carbonate hydrotalcites and calcined hydrotalcites and [2] a purifier for removing water containing an adsorbent for trapping water are connected in this order from upstream to downstream.

Abstract: An optical sensor apparatus includes an optically transmissive structure having planar first, second, and third faces, two or more light sources located outside the structure adjacent the first face, and a photodetector array located outside the prism adjacent the first face. The structure, light sources, and photodetector array are configured such that light from the light sources that is totally internally reflected at an optical interface between the prism and a sample outside the structure proximate the second face is reflected at the third face and incident on a portion of the photodetector array that depends on a refractive index of the sample. The light sources are positioned with respect to the structure and photodetector array such that the totally internally reflected light from each light source corresponds to a different range of refractive index of the sample and maps to a corresponding portion of the photodetector array.

Abstract: In accordance with an embodiment of the invention, there is provided an electrostatic chuck. The electrostatic chuck comprises an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck, the surface layer including a charge control layer comprising a surface resistivity of greater than about 1011 ohms per square.

Abstract: Embodiments of the present invention provide I/O systems, methods, and devices for interfacing pump controller(s) with control device(s) which may have different interfaces and/or signaling formats. In one embodiment, an I/O interface module comprises a processor, a memory, and at least two data communications interfaces for communicating with a pumping controller and a control device. The I/O interface module can receive discrete signals from the control device, interpret them accordingly and send the packets to the pump controller. The pump controller reads the packets and takes appropriate actions at the pump. The I/O interface module can interpret packets of data received from the pump controller and assert corresponding discrete signals to the control device. The I/O interface module is customizable and allows a variety of interfaces and control schemes to be implemented with a particular multiple stage pump without changing the hardware of the pump.

Abstract: A particulate form carbon pyrolyzate adsorbent, having the following characteristics: (a) CO2 capacity greater than 105 cc/gram at one bar pressure and temperature of 273° Kelvin; (b) CO2 Working Capacity greater than 7.0 weight percent; (c) CO2 heats of adsorption and desorption each of which is in a range of from 10 to 50 kJ/mole; and (d) a CO2/N2 Henry's Law Separation Factor greater than 5. The carbon pyrolyzate material can be formed from a polyvinylidene chloride-based polymer or copolymer, or other suitable resin material, to provide an adsorbent that is useful for carbon dioxide capture applications, e.g., in treatment of flue gases from coal-fired power generation plants.

Abstract: Germanium antimony telluride materials are described, e.g., material of the formula GexSbyTezCmNn, wherein x is about 0.1-0.6, y is about 0-0.7, z is about 0.2-0.9, m is about 0.02-0.20, and n is about 0.2-0.20. One specific composition includes from 0 to 50% Sb, from 50 to 80% Te, from 20 to 50% Ge, from 3 to 20% N and from 2 to 15% carbon, wherein all atomic percentages of all components of the film total to 100 atomic %. Another specific composition includes from 10 to 50% Sb, from 50 to 80% Te, from 10 to 50% Ge, from 3 to 20% N and from 3 to 20% carbon, and wherein all atomic percentages of all components of the film total to 100 atomic %. Material of such composition is useful to form phase change films, e.g., as conformally coated on a phase change memory device substrate to fabricate a phase change random access memory cell.

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.

Abstract: A semi-aqueous removal composition and process for selectively removing spin-on glass relative to a metal gate and/or ILD material from a microelectronic device having said material thereon. The semi-aqueous removal composition can be a fluoride-containing composition or an alkaline composition.

Abstract: A wafer container for holding a spaced stack of thin wafers, comprising an H-bar carrier, a base portion for receiving same, a base wafer cushion attached at the bottom wall positioned below the H-bar carrier, the cushion having a plurality of ribs defining slots each with a bottom wafer seating region having a curvature and a pair of ends, each of the ends having a flare whereby the seating region flares outwardly at the ends, a cover portion that connects with the base portion to form a closed interior. The cover portion having an uppermost wall a wafer cushion secured thereto. The cover wafer cushion having a row of wafer engaging finger portions, the finger portions Y shaped and having two legs extending from a support portion and alternatingly extending from opposing support portions, the finger portions may be S shaped with a wafer pad flared in two direction.

Abstract: The invention relates to a gas purifier that removes moisture and oxygen from inert gases and reducing gases, for example, at sub-atmospheric pressures. The purifier can remove part per million levels of moisture in a gas stream to less than 100 parts per trillion by volume, and has a low pressure drop and a sharp breakthrough curve.

Abstract: A leaching composition that substantially removes lead from solid materials and a method of using said composition. Preferably, the concentration of lead in the solid materials following processing is low enough that the solid materials can be reused and/or disposed of at minimal cost to the processor. Preferably, the solid materials comprise glass, such as cathode ray tube glass.

Abstract: A front opening wafer container suitable for large wafers such as 450 mm utilizes componentry with separate fasteners to lock the componentry together in an expedient manner providing robust connections and cost efficiencies. A container portion has an open front and receives on a bottom surface a base plate secured by twist lock connectors that also provide recesses for purge grommets. Kinematic coupling components readily and robustly lock onto the base plate. Interior wafer support components latch onto brackets on the side walls utilizing a separate locking insert with holding tabs and locking detents. A wafer retainer provides support and counters enhanced wafer sag associated with 450 mm wafers when the door is installed and seated.

Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include at least one quaternary base, at least one amine, at least one azole corrosion inhibitor, at least one reducing agent, and at least one solvent. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device while being compatible with barrier layers, wherein the barrier layers are substantially devoid of tantalum or titanium.

Abstract: A substrate container includes an enclosure and an access structure formed in the enclosure and providing fluid access through the enclosure to an interior of the substrate container. The access structure includes an opening and an inner surface. A grommet is situated against the inner surface of the access structure.