Patents Assigned to Environmental Process Solutions, Inc.
  • Accurately monitored CMP recycling
    Patent number: 9050851
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: June 9, 2015
    Assignee: Environmental Process Solutions, Inc.
    Inventors: Martin Boehm, Shaun C. Bosar, Robert Edward Johnston
  • Accurately Monitored CMP Recycling
    Publication number: 20130306600
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Application
    Filed: July 29, 2013
    Publication date: November 21, 2013
    Applicant: Environmental Process Solutions, Inc.
    Inventors: Martin Boehm, Shaun C. Bosar, Robert Edward Johnston
  • Accurately monitored CMP recycling
    Patent number: 8557134
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: October 15, 2013
    Assignee: Environmental Process Solutions, Inc.
    Inventors: Shaun C. Bosar, Martin Boehm, Robert Edward Johnston