Patents Assigned to EON LABS, LLC
  • Distributed dielectric barrier discharge reactor
    Patent number: 9120073
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Grant
    Filed: June 5, 2009
    Date of Patent: September 1, 2015
    Assignee: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska
  • Distributed Dielectric Barrier Discharge Reactor
    Publication number: 20100310434
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Application
    Filed: June 5, 2009
    Publication date: December 9, 2010
    Applicant: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska