Patents Assigned to EON LABS, LLC
  • Patent number: 9120073
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Grant
    Filed: June 5, 2009
    Date of Patent: September 1, 2015
    Assignee: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska
  • Publication number: 20140246381
    Abstract: A system for performing ozone water treatment comprises a voltage supply circuit and a plasma eductor reactor. The voltage supply circuit includes an H-bridge controller and driver, a transformer, and an output port. The H-bridge controller and driver are configured to switch the electrical polarity of a pair of terminals. A primary of the transformer is connected to the H-bridge driver and controller. A secondary of the transformer connects in parallel with a first capacitor and in series with an inductor and a second capacitor. The output port connects in parallel with the second capacitor. The plasma eductor reactor includes an electric field generator, a flow spreader, and a diffuser. The electric field generator includes a pair of electrodes that generate an electric field. The flow spreader supplies a stream of oxygen. The diffuser supplies a stream of water. The streams of water and oxygen pass through the electric field.
    Type: Application
    Filed: February 24, 2014
    Publication date: September 4, 2014
    Applicant: EON LABS,LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska, David Forsee
  • Publication number: 20140246364
    Abstract: A system for performing ozone water treatment comprises a voltage supply circuit and a plasma eductor reactor. The voltage supply circuit includes an H-bridge controller and driver, a transformer, and an output port. The H-bridge controller and driver are configured to switch the electrical polarity of a pair of terminals. A primary of the transformer is connected to the H-bridge driver and controller. A secondary of the transformer connects in parallel with a first capacitor and in series with an inductor and a second capacitor. The output port connects in parallel with the second capacitor. The plasma eductor reactor includes an electric field generator, a flow spreader, and a diffuser. The electric field generator includes a pair of electrodes that generate an electric field. The flow spreader supplies a stream of oxygen. The diffuser supplies a stream of water. The streams of water and oxygen pass through the electric field.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 4, 2014
    Applicant: Eon Labs LLC
    Inventors: Chris Hruska, Walter Buchanan, David Forsee
  • Publication number: 20100310434
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Application
    Filed: June 5, 2009
    Publication date: December 9, 2010
    Applicant: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska