Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
Abstract: A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.
Type:
Grant
Filed:
June 6, 2000
Date of Patent:
December 10, 2002
Assignee:
ESC, Inc.
Inventors:
Shahriar Naghshineh, Jeff Barnes, Dingying Xu
Abstract: A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, optionally an organic acid, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, gallic acid ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.
Type:
Application
Filed:
February 12, 2001
Publication date:
June 21, 2001
Applicant:
ESC, Inc.
Inventors:
Shahriar Naghshineh, Jeff Barnes, Ewa B. Oldak
Abstract: A cleaning solution is provided for cleaning copper-containing microelectronic substrates, particularly for post-CMP or Via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethanolamine, gallic acid, and water. The pH of the cleaning solution is greater than 10.
Type:
Grant
Filed:
November 16, 1999
Date of Patent:
February 27, 2001
Assignee:
ESC, Inc.
Inventors:
Shahriar Naghshineh, Jeff Barnes, Yassaman Hashemi, Ewa B. Oldak
Abstract: A therapeutic treatment device includes a housing and an incoherent light source such as a flashlamp disposed in the housing. The flashlamp provides a pulsed light output for treatment of external skin disorders. To provide light to the treatment area the housing has an opening that is disposed adjacent a skin treatment area. A reflector is mounted within the housing near proximate the light source to reflect the light to the treatment area. At least one optical filter and an iris are mounted near the opening in the housing. Power to the lamp is provided by a pulse forming circuit that can provide a variable pulse width.