Abstract: A solar cell comprising a substrate, a buffer layer, a first subcell, a second subcell, and a third subcell, where said first subcell, said second subcell, and said third subcell are lattice matched, and where said substrate is lattice mismatched with said first, second, and third subcells.
Type:
Grant
Filed:
April 2, 2002
Date of Patent:
December 9, 2003
Assignee:
Essential Research, Inc.
Inventors:
Martin O. Patton, Samar Sinharoy, Victor G. Weizer
Abstract: A method for growing InxGa1−xAs epitaxial layer on a lattice mismatched InP substrate calls for depositing by organo-metallic vapor phase epitaxy, or other epitaxial layer growth technique, a plurality of discreet layers of InAsyP1−y over an InP substrate. These layers provide a buffer. Each succeeding buffer layer has a distinct composition which produces less than a critical amount of lattice mismatch relative to the preceding layer. An InxGa1−xAs epitaxial layer is grown over the buffer wherein 0.53≦x≦0.76.
A resulting InGaAs structure comprises an InP substrate with at least one InAsP buffer layer sandwiched between the substrate and the InGaAs epitaxial layer. The buffer layer has a critical lattice mismatch of less than 1.3% relative to the substrate. Additional buffer layers will likewise have a lattice mismatch of no more than 1.3% relative to the preceding layer.
Abstract: A dot-junction photovoltaic cell using high absorption semi-conductors increases photovoltaic conversion performance of direct band gap semi-conductors by utilizing dot-junction cell geometry. This geometry is applied to highly absorbing materials, including In.sub.x-1 Ga.sub.x As. The photovoltaic cell configured to be separated into a thin active region and a thick, inactive substrate, which serves as a mechanical support.
Abstract: A hydrogen passivated photovoltaic device such as a solar cell comprises a lattice mismatched substrate such as Ge or Si, and a hydrogen passivated heteroepitaxial layer such as InP grown on the substrate. The hydrogen passivated heteroepitaxial III-V photovoltaic device is produced by exposing a sample of a heteroepitaxial III-V material grown on a lattice-mismatched substrate to reactive hydrogen species at elevated temperatures. Reactive hydrogen forms bonds with dangling bonds along dislocations defined in the sample. The electrical activity in the dislocations is passivated as a result of the hydrogenation process.
Type:
Grant
Filed:
April 17, 1995
Date of Patent:
November 5, 1996
Assignees:
The Ohio State Univ. Research Found, Essential Research Inc.
Inventors:
Steven A. Ringel, Richard W. Hoffman, Jr., Basab Chatterjee