Abstract: The invention relates to a device for gasification of material comprising: a chamber (1) for mixing a plasma and material to be treated, comprising openings (12, 12?, 13, 13?, 14) for positioning means for injecting a flow of said material and for positioning at least one plasma source, and forming a zone (300) for a homogenous mixture of a flow of said material and at least one plasma jet (200, 200?) a zone for reaction (5a, 5b), of a mixture of said material and the plasma, in communication with an opening of the chamber and extending axially.