Patents Assigned to Evolving nano process infrastructure Development Center, Inc.
  • Photosensitive composition and pattern formation method
    Patent number: 10095108
    Abstract: According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a shell and having a structure that the core is metal oxide particle and covered by the shell. The shell includes a) unsaturated carboxylic acid or unsaturated carboxylate, which is a negatively ionized unsaturated carboxylic acid, and b) silylated unsaturated carboxylic acid or unsaturated carboxylate which is negatively ionized silylated unsaturated carboxylic acid.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: October 9, 2018
    Assignee: Evolving nano process Infrastructure Development Center, Inc.
    Inventors: Minoru Toriumi, Toshiro Itani
  • PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD
    Publication number: 20170277036
    Abstract: According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a shell and having a structure that the core is metal oxide particle and covered by the shell. The shell includes a) unsaturated carboxylic acid or unsaturated carboxylate, which is a negatively ionized unsaturated carboxylic acid, and b) silylated unsaturated carboxylic acid or unsaturated carboxylate which is negatively ionized silylated unsaturated carboxylic acid.
    Type: Application
    Filed: March 1, 2017
    Publication date: September 28, 2017
    Applicant: Evolving nano process infrastructure Development Center, Inc.
    Inventors: MINORU TORIUMI, TOSHIRO ITANI