Patents Assigned to Excillum AB
  • Patent number: 11257651
    Abstract: A method in an X-ray source configured to emit, from an interaction region, X-ray radiation generated by an interaction between an electron beam and a target, the method including the steps of: providing the target; providing the electron beam; deflecting the electron beam along a first direction relative the target; detecting electrons indicative of the interaction between the electron beam and the target; determining a first extension of the electron beam on the target, along the first direction, based on the detected electrons and the deflection of the electron beam; detecting X-ray radiation generated by the interaction between the electron beam and the target; and determining a second extension of the electron beam on the target, along a second direction, based on the detected X-ray radiation.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: February 22, 2022
    Assignee: EXCILLUM AB
    Inventors: Per Takman, Ulf Lundström, Björn Hansson
  • Publication number: 20220028645
    Abstract: An X-ray source including a liquid target source configured to provide a liquid target in an interaction region of the X-ray source, an electron source adapted to provide an electron beam directed towards the interaction region, such that the electron beam interacts with the liquid target to generate X-ray radiation, and an electron collector arranged at a distance downstream of the interaction region, as seen along a travel direction of the electron beam. The electron collector includes an impact portion configured to absorb electrons of the electron beam impinging thereon, and the impact portion is arranged so as to be oblique with respect to the travel direction of the electron beam at the impact portion.
    Type: Application
    Filed: December 17, 2019
    Publication date: January 27, 2022
    Applicant: Excillum AB
    Inventors: Tomi TUOHIMAA, Ulf LUNDSTRÖM, Björn HANSSON
  • Publication number: 20210410260
    Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
    Type: Application
    Filed: November 4, 2019
    Publication date: December 30, 2021
    Applicant: Excillum AB
    Inventors: Johan KRONSTEDT, Ulf LUNDSTRÖM, Per TAKMAN
  • Publication number: 20210249215
    Abstract: A method in an X-ray source configured to emit, from an interaction region, X-ray radiation generated by an interaction between an electron beam and a target, the method including the steps of: providing the target; providing the electron beam; deflecting the electron beam along a first direction relative the target; detecting electrons indicative of the interaction between the electron beam and the target; determining a first extension of the electron beam on the target, along the first direction, based on the detected electrons and the deflection of the electron beam; detecting X-ray radiation generated by the interaction between the electron beam and the target; and determining a second extension of the electron beam on the target, along a second direction, based on the detected X-ray radiation.
    Type: Application
    Filed: June 24, 2019
    Publication date: August 12, 2021
    Applicant: Excillum AB
    Inventors: Per TAKMAN, Ulf LUNDSTRÖM, Björn HANSSON
  • Publication number: 20210195724
    Abstract: A method for controlling an X-ray source configured to emit, from an X-ray spot on a target, X-ray radiation generated by an interaction between an electron beam and the target, wherein the X-ray spot is determined by the field of view of an X-ray optical system of the X-ray source. The method includes providing the target, providing the electron beam forming an electron spot on the target and interacting with the target to generate X-ray radiation, and adjusting a width and total power of the electron beam such that a maximum of the power density profile in the electron spot is below a predetermined limit, and such that a total power delivered to the target in the X-ray spot is increased.
    Type: Application
    Filed: June 7, 2019
    Publication date: June 24, 2021
    Applicant: Excillum AB
    Inventors: Per TAKMAN, Ulf LUNDSTRÖM
  • Patent number: 10971323
    Abstract: A solid X-ray target for generating X-ray radiation is disclosed. The X-ray target includes at least one material selected from a list including trivalent elements; and at least one material selected from a list including pentavalent elements, wherein a first one of the materials is capable of generating the X-ray radiation upon interaction with an electron beam, and a second one of the materials forms a compound with the first one of the materials. An X-ray source including such an X-ray target and an electron source is also disclosed.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: April 6, 2021
    Assignee: EXCILLUM AB
    Inventors: Björn Hansson, Andrii Sofiienko, Ulf Lundström
  • Patent number: 10930464
    Abstract: A method for generating X-ray radiation, the method including providing a liquid target in a chamber, directing an electron beam towards the liquid target such that the electron beam interacts with the liquid target to generated X-ray radiation, estimating a number of particles produced from the interaction between the electron beam and the liquid target by measuring a number of positively charged particles in the chamber and eliminating a contribution from scattered electrons to the estimated number of particles, and controlling the electron beam, and/or a temperature in a region of the liquid target in which the electron beam interacts with the target, such that the estimated number of particles is below a predetermined limit. Also, a corresponding X-ray source.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: February 23, 2021
    Assignee: EXCILLUM AB
    Inventors: Per Takman, Tomi Tuohimaa
  • Publication number: 20210027974
    Abstract: The present inventive concept relates to an X-ray source comprising: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to comprise a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target comprises an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.
    Type: Application
    Filed: November 30, 2018
    Publication date: January 28, 2021
    Applicant: Excillum AB
    Inventors: Björn HANSSON, Per TAKMAN, Yuli WANG, Shiho TANAKA
  • Publication number: 20200367351
    Abstract: A method for protecting an X-ray source including: a liquid jet generator configured to form a liquid jet moving along a flow axis; an electron source configured to provide an electron beam interacting with the liquid jet to generate X-ray radiation; the method including: generating the liquid jet: monitoring a quality measure indicating a performance of the liquid jet; identifying, based on the quality measure, a malperformance of the liquid jet; and if said malperformance is identified, causing the X-ray source to enter a safe mode for protecting the X ray source. Further, to corresponding devices.
    Type: Application
    Filed: February 8, 2019
    Publication date: November 19, 2020
    Applicant: Excillum AB
    Inventors: Tomi TUOHIMAA, Per TAKMAN, Daniel LARSSON
  • Patent number: 10825642
    Abstract: An X-ray source and a corresponding method for generating X-ray radiation are disclosed. The X-ray source includes a chamber comprising an interaction region, and a first electron source operable to emit a first electron beam, including electrons of a first energy, towards the interaction region such that the first electron beam interacts with a target to generate X-ray radiation. The X-ray source further includes a second electron source adapted to be independently operated to emit a second electron beam including electrons of a second energy for ionising particles in the chamber, and an ion collection tool that is adapted to remove the ionised particles from the chamber by means of an electromagnetic field. By ionising particles and preventing them from moving freely in the chamber, problems related to contamination of the chamber may be mitigated.
    Type: Grant
    Filed: June 18, 2017
    Date of Patent: November 3, 2020
    Assignee: EXCILLUM AB
    Inventor: Tomi Tuohimaa
  • Patent number: 10818468
    Abstract: An X-ray source and a corresponding method for generating X-ray radiation are disclosed. The X-ray source includes a target generator, an electron source and a mixing tool. The target generator is adapted to form a liquid jet propagating through an interaction region, whereas the electron source is adapted to provide an electron beam directed towards the interaction region such that the electron beam interacts with the liquid jet to generate X-ray radiation. The mixing tool is adapted to induce mixing of the liquid jet at a distance downstream of the interaction region such that a maximum surface temperature of the liquid jet is below a threshold temperature. By controlling the maximum surface temperature, vaporisation, and thus the amount of contaminations originating from the jet, may be reduced.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: October 27, 2020
    Assignee: EXCILLUM AB
    Inventors: Björn Hansson, Tomi Tuohimaa, Göran Johansson
  • Patent number: 10784069
    Abstract: A system and method for generating X-ray radiation. The system includes an electron source operable to generate an electron beam and an X-ray target for generating X-ray radiation upon interaction with the electron beam. The method includes moving the electron beam over an edge separating a first region and a second region of the X-ray target, wherein the first region and the second region have different capability to generate X-ray radiation upon interaction with the electron beam. The system allows for a lateral extension of the electron beam to be determined based on a change in a quantity indicative of the interaction between the electron beam and the first region and between the electron beam and the second region, and the movement of the electron beam.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: September 22, 2020
    Assignee: EXCILLUM AB
    Inventors: Tomi Tuohimaa, Per Takman, Andrii Sofiienko
  • Publication number: 20200058461
    Abstract: A method for generating X-ray radiation, the method including providing a liquid target in a chamber, directing an electron beam towards the liquid target such that the electron beam interacts with the liquid target to generated X-ray radiation, estimating a number of particles produced from the interaction between the electron beam and the liquid target by measuring a number of positively charged particles in the chamber and eliminating a contribution from scattered electrons to the estimated number of particles, and controlling the electron beam, and/or a temperature in a region of the liquid target in which the electron beam interacts with the target, such that the estimated number of particles is below a predetermined limit. Also, a corresponding X-ray source.
    Type: Application
    Filed: March 27, 2018
    Publication date: February 20, 2020
    Applicant: Excillum AB
    Inventors: Per TAKMAN, Tomi TUOHIMAA
  • Publication number: 20190311874
    Abstract: A system and method for generating X-ray radiation. The system includes an electron source operable to generate an electron beam and an X-ray target for generating X-ray radiation upon interaction with the electron beam. The method includes moving the electron beam over an edge separating a first region and a second region of the X-ray target, wherein the first region and the second region have different capability to generate X-ray radiation upon interaction with the electron beam. The system allows for a lateral extension of the electron beam to be determined based on a change in a quantity indicative of the interaction between the electron beam and the first region and between the electron beam and the second region, and the movement of the electron beam.
    Type: Application
    Filed: October 19, 2017
    Publication date: October 10, 2019
    Applicant: Excillum AB
    Inventors: Tomi TUOHIMAA, Per TAKMAN, Andrii SOFIIENKO
  • Publication number: 20190131103
    Abstract: An X-ray source and a corresponding method for generating X-ray radiation are disclosed. The X-ray source includes a chamber comprising an interaction region, and a first electron source operable to emit a first electron beam, including electrons of a first energy, towards the interaction region such that the first electron beam interacts with a target to generate X-ray radiation. The X-ray source further includes a second electron source adapted to be independently operated to emit a second electron beam including electrons of a second energy for ionising particles in the chamber, and an ion collection tool that is adapted to remove the ionised particles from the chamber by means of an electromagnetic field. By ionising particles and preventing them from moving freely in the chamber, problems related to contamination of the chamber may be mitigated.
    Type: Application
    Filed: June 18, 2017
    Publication date: May 2, 2019
    Applicant: Excillum AB
    Inventor: Tomi Tuohimaa
  • Patent number: 9947502
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: April 17, 2018
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Björn Sundman
  • Patent number: 9564283
    Abstract: In an electron irradiation system, a gas-tight housing encloses a cathode region and an irradiation region, which communicate through at least an aperture. In the cathode region, there is arranged a high-voltage cathode for emitting an electron beam. In the irradiation region, there is an irradiation site arranged to accommodate a stationary or moving object to be irradiated. The migration of cathode-degrading debris is limited by means of an electric field designed to prevent positively charged particles from entering the cathode region via the aperture. The invention can be embodied with an axial electric field, which realizes an energy threshold, or a transversal field which deflects charged particles away from trajectories leading into the cathode region.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: February 7, 2017
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Per Takman
  • Patent number: 9530607
    Abstract: Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump. The pressurized liquid metal is then conducted to a nozzle and ejected into a vacuum chamber in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir, and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump, suitable for the inlet of the high-pressure pump. Also, a corresponding circulation system and an X-ray source provided with such circulation system.
    Type: Grant
    Filed: August 12, 2014
    Date of Patent: December 27, 2016
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Mikael Otendal
  • Publication number: 20160247656
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Application
    Filed: May 5, 2016
    Publication date: August 25, 2016
    Applicant: Excillum AB
    Inventors: Oscar HEMBERG, Tomi TUOHIMAA, Björn SUNDMAN
  • Patent number: 9380690
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: June 28, 2016
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Björn Sundman