Patents Assigned to Exitech Limited
  • Patent number: 8581140
    Abstract: A laser processing apparatus is provided. The laser processing apparatus includes a laser processing head having a transmission window, an opening portion, an outlet hole, a first vent hole and a second vent hole. The transmission window transmits laser light by which a processing object is irradiated. The opening portion passes the transmitted laser light to a bottom portion of the laser processing head. The outlet hole discharges an atmosphere in the vicinity of a laser light irradiation region of the processing object to the outside. The first vent hole directs gas into the vicinity of the laser light irradiation region. The second vent hole discharges the atmosphere in the vicinity of the laser light irradiation region. Debris generated from the processing object is discharged from the outlet hole and the second vent hole that are continuous with the opening portion provided at the bottom portion of the laser processing head.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: November 12, 2013
    Assignees: Sony Corporation, Exitech Limited
    Inventors: Kosei Aso, Yoshinari Sasaki, Hidehisa Murase, Naoki Yamada
  • Patent number: 8344285
    Abstract: The invention firstly comprises a method of ablation processing including a step of ablating a region of a substrate (1) by way of a laser beam (3) characterized by a further step of removing debris ablated from the region (1) by way of a flow of a fluid (7), namely a gas or vapour, a liquid or a combination of these, wherein the flow of fluid (7) is directed to flow over the region so as to entrap debris and thereafter to remove the entrapped debris from the region by directing the flow of fluid with any entrapped debris away from region along a predetermined path (6) avoiding subsequent deposition of entrapped debris on the substrate.
    Type: Grant
    Filed: June 13, 2005
    Date of Patent: January 1, 2013
    Assignees: Exitech Limited, Sony Corporation
    Inventors: Neil Sykes, Yoshinari Sasaki, Hidehisa Murase, Naoki Yamada, Kousei Aso
  • Patent number: 7863542
    Abstract: A laser processing apparatus is provided. The laser processing apparatus is for performing pattern processing of a transparent conductive film that is formed on a multilayer film on a substrate by using laser light, includes debris extraction module having a vortex generation mechanism that generates a vortex flow by directing gas into the vicinity of a laser-irradiated portion of the transparent conductive film. The debris extraction module is disposed close to the substrate, and debris before deposition and after deposition on the substrate, which is generated by laser irradiation, is entrapped into the vortex flow to be extracted to the outside with the gas.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: January 4, 2011
    Assignees: Sony Corporation, Exitech Limited
    Inventors: Hidehisa Murase, Yoshinari Sasaki, Kosei Aso, Naoki Yamada
  • Publication number: 20090188543
    Abstract: A method for accurately laser scribing lines on a panel utilising a laser beam scanner unit (13) including an optical system and a scanner lens. The unit (13) moves a laser beam (12) in a first direction (X), to scribe sections of lines (15) on the panel (11) that are a fraction of the total line length required and then moving the unit (13) continuously with respect to the panel (11) in a second direction (Y), perpendicular to the first direction (X), to form a band (16) of scribe lines. The scanner unit (13) is positioned so that the starting position of scribe lines in each band next to be processed overlap exactly the finishing position ends of scribe lines in the last band that has been processed so that all scribe lines interconnect. The method repeats the using and moving steps to form a plurality of parallel bands of scribe lines which cover the area of the panel.
    Type: Application
    Filed: January 16, 2008
    Publication date: July 30, 2009
    Applicant: EXITECH LIMITED
    Inventor: Robert Bann
  • Publication number: 20080237206
    Abstract: A method of laser micro-machining, by means of a laser, a work piece (31) of the type described comprising the steps of: locating the workpiece on a carrier forming a part of a transport system whereby the carrier can be displaced along a path (P) parallel to an X-axis of the workpiece, a Y-axis lying transverse the path, and a Z-axis lying transverse the path; focusing an image generated by means of an output beam from the laser at a working datum position (A) defined relative to the path which path is established by means of the transport system to traverse the first datum position; a plane defined by the X- and Y-Axis lying substantially perpendicular to the output beam; and displacing the workpiece along the path by way of the transport system so as to enable the work-piece to be subject to micro-machining by way of the laser characterized by the steps of: maintaining distance between the datum position and a current first surface position of the work-piece in the vicinity of the datum position; and varyi
    Type: Application
    Filed: May 12, 2008
    Publication date: October 2, 2008
    Applicant: EXITECH LIMITED
    Inventors: Robert BANN, Neil SYKES
  • Patent number: 7371993
    Abstract: A method of laser micro-machining a work piece, with a laser, including the steps of: locating the workpiece on a carrier forming a part of a transport system, the carrier can be displaced along a path parallel to an X-axis of the workpiece, a Y-axis lying transverse the path, and a Z-axis lying transverse the path; focusing an image generated by an output beam from the laser at a working datum position defined relative to the path which path is established by the transport system to traverse the first datum position; a plane defined by the X- and Y-axis lying substantially perpendicular to the output beam; and displacing the workpiece along the path by way of the transport system so as to enable the work-piece to be subject to micro-machining by way of the laser.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: May 13, 2008
    Assignee: Exitech Limited
    Inventors: Robert Bann, Neil Sykes
  • Publication number: 20070210045
    Abstract: A laser processing apparatus is provided. The laser processing apparatus includes a laser processing head having a transmission window, an opening portion, an outlet hole, a first vent hole and a second vent hole. The transmission window transmits laser light by which a processing object is irradiated. The opening portion passes the transmitted laser light to a bottom portion of the laser processing head. The outlet hole discharges an atmosphere in the vicinity of a laser light irradiation region of the processing object to the outside. The first vent hole directs gas into the vicinity of the laser light irradiation region. The second vent hole discharges the atmosphere in the vicinity of the laser light irradiation region. Debris generated from the processing object is discharged from the outlet hole and the second vent hole that are continuous with the opening portion provided at the bottom portion of the laser processing head.
    Type: Application
    Filed: August 25, 2006
    Publication date: September 13, 2007
    Applicants: SONY CORPORATION, EXITECH LIMITED
    Inventors: Kosei Aso, Yoshinari Sasaki, Naoki Yamada
  • Patent number: 6576869
    Abstract: This invention relates to using mid-infrared high-power pulsed laser radiation sources for drilling high-quality microvia interconnection holes in printed circuit (wiring) boards and other electrical circuit packages.
    Type: Grant
    Filed: November 27, 2000
    Date of Patent: June 10, 2003
    Assignees: Excellon Automation Co., Exitech Limited
    Inventors: Malcolm Charles Gower, Philip Thomas Rumsby, Dafydd Wyn Thomas