Abstract: A method for removing contaminants from a graphene product uses an accelerated neutral atom beam to remove product contaminants without disruption of the product's crystalline lattice and morphology to enable usage in high purity devices/systems such as exemplified in semi-conductor and like high purity needs applications.
Abstract: A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.
Type:
Grant
Filed:
April 8, 2021
Date of Patent:
August 22, 2023
Assignee:
EXOGENESIS CORPORATION
Inventors:
Sean R. Kirkpatrick, Kiet A. Chau, Thy Yam, Michael J. Walsh
Abstract: A method for preparing a biological material for implanting provides irradiating at least a portion of the surface of the material with an accelerated Neutral Beam.
Type:
Grant
Filed:
January 3, 2019
Date of Patent:
July 11, 2023
Assignee:
Exogenesis Corporation
Inventors:
Joseph B. Khoury, Laurence B. Tarrant, Sean R. Kirkpatrick, Richard C. Svrluga
Abstract: An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.
Abstract: A device such as a medical device and a method for making same provides a device surfaces modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets or to match surface energy of the device to that of a protein with the property of inhibition of bacterial colonization that can coat the all or part of the device surface to effect such inhibition.
Type:
Application
Filed:
April 5, 2021
Publication date:
December 30, 2021
Applicant:
Exogenesis Corporation
Inventors:
Joseph Khoury, Sean R. Kirkpatrick, Michael J. Walsh, James G. Bachand, Allen R. Kirkpatrick, Thomas J. Webster
Abstract: An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.
Abstract: A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.
Type:
Application
Filed:
April 8, 2021
Publication date:
July 22, 2021
Applicant:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Kiet A. Chau, Thy Yam, Michael J. Walsh
Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
Type:
Grant
Filed:
September 9, 2019
Date of Patent:
June 29, 2021
Assignee:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Allen R. Kirkpatrick
Abstract: A method for shallow etching a substrate surface forms a shallow modified substrate layer overlying unmodified substrate using an accelerated neutral beam and etches the modified layer, stopping at the unmodified substrate beneath, producing controlled shallow etched substrate surfaces.
Type:
Grant
Filed:
July 22, 2016
Date of Patent:
May 11, 2021
Assignee:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Richard C. Svrluga
Abstract: A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets.
Type:
Grant
Filed:
March 1, 2018
Date of Patent:
April 6, 2021
Assignee:
Exogenesis Corporation
Inventors:
Joseph Khoury, Sean R. Kirkpatrick, Michael J. Walsh, James G. Bachand, Allen R. Kirkpatrick
Abstract: A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.
Type:
Grant
Filed:
June 14, 2018
Date of Patent:
June 2, 2020
Assignee:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Kiet A. Chau, Son T. Chau
Abstract: Apparatus and methods are disclosed for employing an accelerated neutral beam derived from an accelerated gas cluster ion beam as a physical etching beam for providing reduced material mixing at the etched surface, compared to previous techniques. This results in the ability to achieve improved depth profile resolution in measurements by analytical instruments such as SIMS and XPS (or ESCA) analytical instruments.
Type:
Grant
Filed:
August 21, 2012
Date of Patent:
April 21, 2020
Assignee:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Allen R. Kirkpatrick
Abstract: An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.
Abstract: A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.
Type:
Grant
Filed:
June 15, 2017
Date of Patent:
February 11, 2020
Assignee:
Exogenesis Corporation
Inventors:
Sean R. Kirkpatrick, Richard C. Svrluga, Stephen M. Blinn
Abstract: A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.
Abstract: A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.
Type:
Grant
Filed:
August 22, 2012
Date of Patent:
July 9, 2019
Assignee:
EXOGENESIS
Inventors:
Richard C. Svrluga, Sean R. Kirkpatrick, Stephen M. Blinn
Abstract: A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.