Abstract: A method for forming through-via metal wiring is disclosed. According to the method, through-via metal wiring can be formed with excellent plating quality without an expensive sputtering process by bonding a metal foil to one side of a substrate having a through-via formed therein and using the foil as a metal seed layer.
Type:
Application
Filed:
August 28, 2023
Publication date:
March 7, 2024
Applicant:
EXTOLCO.,LTD.
Inventors:
Sung Woong KIM, Wook Hwan, Nam-jin Kim, Yong-chae NA