Patents Assigned to Facility Ltd.
  • Patent number: 4425205
    Abstract: A process for regenerating electroless plating bath comprising the steps of:(i) continuously or intermittently taking out a part or the whole of chelating agent-containing copper electroless plating bath from an electroless plating tank, followed by removing off the copper ion content from said bath;(ii) acidifying the thus obtained solution for precipitating the chelating agent therefrom and recovering the precipitated chelating agent;(iii) supplying said recovered chelating agent to an anodic cell separated by an exchange membrane from a cathodic cell having cathode, said anodic cell having copper anode, wherein in case a neutral or alkaline electrolyte solution is supplied to said cathodic cell said partitioning membrane is an anion exchange membrane or cation exchange membrane, while in case an acidic electrolyte solution is supplied to said cathodic cell said partitioning membrane is a cation exchange membrane, and applying direct current between both electrode; and(iv) then, recycling the solution withi
    Type: Grant
    Filed: April 27, 1982
    Date of Patent: January 10, 1984
    Assignees: Kanto Kasei Co., Ltd., Facility Ltd.
    Inventors: Hideo Honma, Yoshiaki Suzuki, Yasuhiro Matsumoto