Patents Assigned to Faculty of Physics Eidhoven University of Technology
  • Method of treating surfaces of substrates with the aid of a plasma
    Patent number: 4871580
    Abstract: A method of treating substrate surfaces with the aid of a plasma such as etching, deposition etc. In the practice of the method, the plasma flows from its place of generation to the treatment-chamber, and in which method the plasma-generator is flushed through with a flushing gas. Preferably, and firstly after the flushing gas has passed the cathodes, the reactant is fed to the plasma-generator. The invention includes the reactor necessary for carrying out the method.
    Type: Grant
    Filed: June 13, 1988
    Date of Patent: October 3, 1989
    Assignee: Faculty of Physics Eidhoven University of Technology
    Inventors: Daniel C. Schram, Gerardus M. W. Kroesen