Patents Assigned to FASL, Inc.
  • Patent number: 7122853
    Abstract: Systems and methodologies are provided for simplifying a polymer memory cell's operation by employing a post polymer growth treatment to form ionic or super ionic metal compounds therein. Such post polymer growth treatment facilitates distribution and mobility of metal ions (or charged metallic molecules) within an active layer of the polymer memory cell, and mitigates (or eliminates) a need for initialization procedures. Moreover, the post treatment of the present invention can also facilitate controlling a distribution of various thresholds (e.g., write and erase threshold), and set them to predetermined values Accordingly, variability in threshold values of polymer memory cells that can result from initialization processes can be mitigated (or eliminated), and thicker polymer layers can be employed without an initialization penalty.
    Type: Grant
    Filed: August 17, 2004
    Date of Patent: October 17, 2006
    Assignee: FASL, Inc.
    Inventors: David Gaun, Stuart Spitzer, Nicolay F Yudanov