Patents Assigned to FEI Company
  • ROTATING SAMPLE HOLDER FOR RANDOM ANGLE SAMPLING IN TOMOGRAPHY
    Publication number: 20210319975
    Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.
    Type: Application
    Filed: April 8, 2020
    Publication date: October 14, 2021
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
  • HALOGEN GENERATOR
    Publication number: 20210316989
    Abstract: Disclosed herein are embodiments of a method and system for producing a halogen gas. The method may comprise contacting a solid oxidizing agent with a vapor comprising a halide compound, to produce a gas stream comprising a halogen corresponding to the halide in the halide compound. The halide compound may be an acyl halide, such as an acetyl halide or an oxalyl halide. The oxidizing agent may be any suitable oxidizing agent, and in certain examples, potassium permanganate is used. The method may be performed under a reduced pressure. Also disclosed herein is a system suitable to perform the disclosed method. The system may comprise a reservoir, an oxidizing agent support and a gas stream outlet.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 14, 2021
    Applicant: FEI Company
    Inventor: Clive Chandler
  • METHOD FOR TEMPERATURE MONITORING IN CRYO-ELECTRON MICROSCOPY
    Publication number: 20210299665
    Abstract: Temperatures of cryo-electron microscopy samples are assessed based on images portions associated with high temperature superconductor (HTSC) areas or other thermal sensor materials that are thermally coupled to or thermally proximate the samples. Such thermal areas can be provided on sample mounts such as metallic grids, carbon films, or on sample stages. In examples using HTSCs, HTSCs having critical temperatures between ?175° C. and ?135° C. are typically used.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventor: Jakub Drahotsky
  • DUAL BEAM BIFOCAL CHARGED PARTICLE MICROSCOPE
    Publication number: 20210305007
    Abstract: Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr, Ali Mohammadi-Gheidari
  • ELECTRON DIFFRACTION HOLOGRAPHY
    Publication number: 20210302333
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LOSS SPECTROSCOPY DETECTOR
    Publication number: 20210305013
    Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.
    Type: Application
    Filed: March 26, 2021
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventor: Peter Christiaan Tiemeijer
  • SIMULTANEOUS TEM AND STEM MICROSCOPE
    Publication number: 20210305012
    Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • CHARGED PARTICLE BEAM SOURCE
    Publication number: 20210305006
    Abstract: A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.
    Type: Application
    Filed: March 24, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Kun Liu, Steven J. Randolph
  • METHODS AND SYSTEMS FOR ACQUIRING 3D DIFFRACTION DATA
    Publication number: 20210305010
    Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Bart Buijsse, Alexander Henstra, Yuchen Deng
  • CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
    Publication number: 20210296088
    Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.
    Type: Application
    Filed: March 3, 2021
    Publication date: September 23, 2021
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Bohuslav Sed'a, Petr Hlavenka, Libor Novák, Jan Stopka
  • METHOD AND SYSTEM FOR PLASMA ASSISTED LOW VACUUM CHARGED-PARTICLE MICROSCOPY
    Publication number: 20210296086
    Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.
    Type: Application
    Filed: March 18, 2020
    Publication date: September 23, 2021
    Applicant: FEI Company
    Inventors: James Bishop, Daniel Totonjian, Chris Elbadawi, Charlene Lobo, Milos Toth
  • System and method for RF pulsed electron beam based STEM
    Patent number: 11127562
    Abstract: Disclosed herein are systems and methods for pulsing electron beams and synchronizing the pulsed electron beam with scanning a sample at a plurality of scan locations. An example method at least includes pulsing an electron beam to form a pulsed electron beam having a pulse period, moving the pulsed electron beam to interact with a sample at a plurality of locations, the interaction at each of the plurality of locations occurring for a dwell time, and synchronizing data acquisition of the interaction of the pulsed electron beam with the sample based on the pulsing and the translating of the electron beam, wherein the dwell time is based on a derivative of the pulse period.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: September 21, 2021
    Assignee: FEI Company
    Inventors: Erik Rene Kieft, Bert Henning Freitag
  • Charged particle microscope with a manipulator device, and method of preparing a specimen with said charged particle microscope
    Patent number: 11127560
    Abstract: The invention relates to a charged particle microscope (CPM) that at least includes a sample holder, for holding a sample, and a manipulator device arranged for transferring a lamella created in said sample out of said sample, wherein said manipulator device comprises a first elongated manipulator member with a first outer end, and a second elongated manipulator member with a second outer end. The outer ends are movable for mechanically gripping and releasing said lamella. In embodiments, the elongated manipulator members comprise off-set parts that increase manoeuvrability, accessibility, and monitorability of the manipulator device during use.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: September 21, 2021
    Assignee: FEI Company
    Inventors: Johannes A. H. W. G. Persoon, Andreas Theodorus Engelen, Ruud Schampers
  • ADAPTIVE ENDPOINT DETECTION FOR AUTOMATED DELAYERING OF SEMICONDUCTOR SAMPLES
    Publication number: 20210287938
    Abstract: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.
    Type: Application
    Filed: March 12, 2020
    Publication date: September 16, 2021
    Applicant: FEI Company
    Inventors: Sean O. Morgan-Jones, Sophia E. Weeks, Peter D. Carleson
  • Wettability estimation by differential multi-phase simulation
    Patent number: 11120542
    Abstract: Contact angles of multi-phase mixtures in a porous medium are determined by comparing images generated by flow simulations with a measured image of a fluid flow in the porous medium. A measured image can be compared image element by image element with corresponding locations in the flow simulations. A plurality of flow simulations associated with a corresponding plurality of contact angles is used for the comparison, and a contact angle associated with the greatest number of matches between the measured image and the flow simulation is selected.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: September 14, 2021
    Assignee: FEI Company
    Inventor: Stale Havsgaard Fjeldstad
  • Methods and systems for acquiring electron backscatter diffraction patterns
    Patent number: 11114275
    Abstract: Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Christopher J. Stephens
  • Pulsed CFE electron source with fast blanker for ultrafast TEM applications
    Patent number: 11114272
    Abstract: Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Kun Liu, Erik Kieft
  • Sixth-order and above corrected STEM multipole correctors
    Patent number: 11114271
    Abstract: Correctors for correcting axial aberrations of a particle-optical lens in a charged particle microscope system, according to the present disclosure include a first primary multipole that generates a first primary multipole field when a first excitation is applied to the first primary multipole, and a second primary multipole that generates a second primary multipole field when a second excitation is applied to the second primary multipole. The first primary multipole is not imaged onto the second primary multipole such that a combination fourth-order aberration is created. The correctors further include a secondary multipole for correcting the fourth-order aberration and the sixth-order aberration. Such correctors may further include a tertiary multipole for correcting an eighth-order aberration.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer, Marcel Niestadt
  • METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELECTRON MICROSCOPY
    Publication number: 20210272767
    Abstract: The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-axial aberrations and correcting a diffraction pattern of the resulting modified beam. The invention also relates to a method for reducing throughput time in a sample image acquisition session in transmission electron microscopy. The method comprises providing an electron microscope, generating a beam and an image beam, adjusting one of the two to reduce off-axial aberrations and filtering the resulting modified image beam. The invention further relates to an electron microscope and to a non-transient computer-readable medium with a computer program for carrying out the methods.
    Type: Application
    Filed: December 20, 2018
    Publication date: September 2, 2021
    Applicant: FEI Company
    Inventors: Maarten BISCHOFF, Peter Christiaan TIEMEIJER, Tjerk Gerrit SPANJER, Stan Johan Pieter KONINGS
  • METROLOGY OF SEMICONDUCTOR DEVICES IN ELECTRON MICROGRAPHS USING FAST MARCHING LEVEL SETS
    Publication number: 20210263430
    Abstract: Apparatuses and methods for metrology on devices using fast marching level sets are disclosed herein. An example method at least includes initiating a fast marching level set seed on an image, propagating a fast marching level set curve from the fast marching level set seed to locate boundaries of a plurality of regions of interest within the image, and performing metrology on the regions of interest based in part on the boundaries.
    Type: Application
    Filed: February 16, 2021
    Publication date: August 26, 2021
    Applicant: FEI Company
    Inventor: Umesh ADIGA