Patents Assigned to Feldman Technology Corporation
  • Method for etching
    Patent number: 7115212
    Abstract: A method of etching a metal oxide film includes depositing a metal (M) on the metal oxide film and contacting the metal oxide film and the metal (M) with an etch liquid comprising an acid (A) and a metal dissolution agent (X). The method can avoid patchwise etch.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: October 3, 2006
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman
  • Etched metal oxide film
    Patent number: 6749766
    Abstract: Metal oxide films are etched with a metal and an etch liquid containing an acid and a metal penetration control agent.
    Type: Grant
    Filed: January 10, 2003
    Date of Patent: June 15, 2004
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman
  • Method for etching
    Publication number: 20040045930
    Abstract: Methods for etching metal oxide films, especially tin oxide.
    Type: Application
    Filed: June 6, 2003
    Publication date: March 11, 2004
    Applicant: FELDMAN TECHNOLOGY CORPORATION
    Inventors: Douglas McLean, Bernard Feldman
  • Etched metal oxide film
    Publication number: 20030136755
    Abstract: Metal oxide films are etched with a metal and an etch liquid containing an acid and a metal penetration control agent.
    Type: Application
    Filed: January 10, 2003
    Publication date: July 24, 2003
    Applicant: FELDMAN TECHNOLOGY CORPORATION
    Inventors: Douglas McLean, Bernard Feldman
  • Method for etching
    Publication number: 20010035574
    Abstract: Methods for etching metal oxide films, especially tin oxide.
    Type: Application
    Filed: February 26, 2001
    Publication date: November 1, 2001
    Applicant: FELDMAN TECHNOLOGY CORPORATION
    Inventors: Douglas McLean, Bernard Feldman
  • Method for etching
    Patent number: 6193901
    Abstract: Masked tin oxide films are etched with an etchant composed of hydrochloric acid and a penetration control agent. The exposed metal oxide film is reduced to metallic tin by the action of active hydrogen (H0) produced in the reaction of zinc with acid, and etching stops when the metallic tin becomes impenetrable to H0.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: February 27, 2001
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman
  • Method for etching
    Patent number: 6180021
    Abstract: Masked tin oxide films are etched with an etchant composed of a zinc metal, an acid and a Ni++ penetration control agent. The exposed metal oxide film is reduced to metallic tin by the action of active hydrogen (H0) produced in the reaction of zinc with acid, and etching stops when the metallic tin becomes impenetrable to H0.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: January 30, 2001
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman
  • Method for etching
    Patent number: 6174452
    Abstract: Masked tin oxide films are etched with an etchant composed of zinc metal, HCl, and a penetration control agent. The exposed metal oxide film is reduced to metallic tin by the action of active hydrogen (Ho) produced in the reaction of zinc with acid, and etching stops when the metallic tin becomes impenetrable to Ho.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: January 16, 2001
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman
  • Transparent electrodes
    Patent number: 5986391
    Abstract: The present invention provides for transparent electrodes useful in display devices. The transparent electrodes are deposited on a substrate and formed with one or more apertures on their top surface that permit a second electrode, formed on the transparent electrode, to dip down and make contact with the substrate. The second electrode is made of an opaque conductive material that lowers the electrical resistance of the transparent electrode.
    Type: Grant
    Filed: March 9, 1998
    Date of Patent: November 16, 1999
    Assignee: Feldman Technology Corporation
    Inventor: Bernard Feldman
  • Method for etching
    Patent number: 5976396
    Abstract: Method for etching metal oxide films, especially tin oxide on a substrate in which a metal (Zn) is deposited on said film and etching is performed by a mixture of an acid, such as hydrochloric acid (HCl) and a metal dissolution agent, such as ferric chloride. The hydrochloric acid reacts with the zinc to produce active hydrogen which reduces the tin oxide to tin, which in turn is etched with the hydrochloric acid.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: November 2, 1999
    Assignee: Feldman Technology Corporation
    Inventors: Douglas McLean, Bernard Feldman