Patents Assigned to FEMTO SCIENCE INC
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Patent number: 11696387Abstract: A plasma generating device includes: a supply module for supplying gas; a handset for generating plasma from the supplied gas; and a control module attachable to or detachable from the supply module, wherein the plasma generating device switches to a button control mode or a dial control mode depending on the manner in which the handset is connected to the control module and the supply module.Type: GrantFiled: October 15, 2021Date of Patent: July 4, 2023Assignee: FEMTO SCIENCE INCInventors: Moo Hwan Kim, Yeon Sook Chang
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Patent number: 11664204Abstract: Disclosed is a plasma device which includes: a base including a power supply unit configured to receive electric power and form an AC signal, a gas flow rate adjustment unit configured to receive gas and control a flow rate of output gas, an input unit configured to receive an input of a user, and a controller configured to control the power supply unit and the gas flow rate adjustment unit according to the input; and a handpiece including a boosting transformer configured to boost the AC signal, an electrode structure configured to receive the boosted AC signal and the gas and form plasma, a switch configured to receive a plasma discharge signal of the user, and a nozzle configured to discharge the formed plasma, wherein the handpiece is connected to the base via a connector and is exchangeable.Type: GrantFiled: November 24, 2020Date of Patent: May 30, 2023Assignee: FEMTO SCIENCE INCInventors: Moo Hwan Kim, Yeon Sook Chang
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Publication number: 20230005662Abstract: A secondary bobbin of a high-voltage transformer and a portable plasma device including the same are provided to regulate discharge voltage. The secondary bobbin of the high-voltage transformer includes: a main body; barrier portions dividing the main body into a predetermined number of multiple segments along the length of the main body; winding portions where a coil is wound on the multiple segments into which the main body is divided; and switch circuit portions connecting neighboring barrier portions by a switch, wherein the switch circuit portions electrically connect or disconnect the winding portions to adjust the number of turns depending on whether the switch circuit portions are on or off.Type: ApplicationFiled: October 15, 2021Publication date: January 5, 2023Applicant: FEMTO SCIENCE INCInventors: Moo Hwan KIM, Yeon Sook CHANG
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Publication number: 20220406564Abstract: An inductively coupled plasma generating apparatus includes: a radio frequency (RF) generator; an impedance matcher connected to the RF generator; a gas supplier; and a first plasma head connected to the impedance matcher and the gas supplier to receive power and gas, that comprises a dielectric tube and a first antenna, wherein the first antenna is attached to the dielectric tube by being spirally wound along the length of the dielectric tube, and plasma is generated in the dielectric tube by a magnetic field created by the first antenna.Type: ApplicationFiled: October 15, 2021Publication date: December 22, 2022Applicant: FEMTO SCIENCE INCInventors: Moo Hwan KIM, Yeon Sook CHANG
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Patent number: 11508559Abstract: The present disclosure relates to a portable plasma device which is convenient to carry and has excellent performance and is capable of simply, uniformly, and locally treating an inner surface of a microstructure such as a microwell plate by easily adjusting a plasma flame.Type: GrantFiled: August 15, 2019Date of Patent: November 22, 2022Assignee: FEMTO SCIENCE INCInventors: Moo Hwan Kim, Yeon Sook Chang
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Publication number: 20220353981Abstract: A plasma generating device includes: a supply module for supplying gas; a handset for generating plasma from the supplied gas; and a control module attachable to or detachable from the supply module, wherein the plasma generating device switches to a button control mode or a dial control mode depending on the manner in which the handset is connected to the control module and the supply module.Type: ApplicationFiled: October 15, 2021Publication date: November 3, 2022Applicant: FEMTO SCIENCE INCInventors: Moo Hwan KIM, Yeon Sook CHANG
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Publication number: 20210225620Abstract: Disclosed is a plasma device which includes: a base including a power supply unit configured to receive electric power and form an AC signal, a gas flow rate adjustment unit configured to receive gas and control a flow rate of output gas, an input unit configured to receive an input of a user, and a controller configured to control the power supply unit and the gas flow rate adjustment unit according to the input; and a handpiece including a boosting transformer configured to boost the AC signal, an electrode structure configured to receive the boosted AC signal and the gas and form plasma, a switch configured to receive a plasma discharge signal of the user, and a nozzle configured to discharge the formed plasma, wherein the handpiece is connected to the base via a connector and is exchangeable.Type: ApplicationFiled: November 24, 2020Publication date: July 22, 2021Applicant: FEMTO SCIENCE INCInventors: Moo Hwan KIM, Yeon Sook CHANG
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Patent number: D935022Type: GrantFiled: March 4, 2019Date of Patent: November 2, 2021Assignee: FEMTO SCIENCE INCInventors: Moo Hwan Kim, Yeon Sook Chang