Abstract: An apparatus and method for applying a multi-component curable composition is disclosed. The method for applying a multi-component curable composition includes a) applying a plurality of fluids constituting the multi-component curable composition to a surface of a bonding target object layer by layer, b) acquiring a two-dimensional image of all the fluids applied layer by layer using an image sensor, c) measuring a height of all the fluids applied layer by layer using a distance sensor, and d) calculating a total volume of the multi-component curable composition by using the two-dimensional image and height of the fluids obtained in b) and c).
Type:
Grant
Filed:
September 16, 2021
Date of Patent:
October 17, 2023
Assignee:
FINE SEMITECH CORP.
Inventors:
Sung Chul Jeon, Dong Young Shin, Sun Woo Lee
Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.
Type:
Application
Filed:
August 9, 2022
Publication date:
December 1, 2022
Applicant:
FINE SEMITECH CORP.
Inventors:
Byungchul YOO, Byunghoon LEE, Myungjun KIM, Jikang KIM, Jeonghwan MIN, Kyoungchae SEO, Changyoung JEONG
Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.
Type:
Application
Filed:
February 26, 2020
Publication date:
February 4, 2021
Applicant:
FINE SEMITECH CORP.
Inventors:
Byungchul YOO, Byunghoon LEE, Myungjun KIM, Jikang KIM, Jeonghwan MIN, Kyoungchae SEO, Changyoung JEONG
Abstract: A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.
Type:
Grant
Filed:
September 1, 2016
Date of Patent:
October 2, 2018
Assignees:
Samsung Electronics Co., Ltd., Fine Semitech Corp.
Inventors:
Byungchul Yoo, Sungyong Cho, Jaehyuck Choi, Jeongsu Yang, Donghoon Chung, Han-Shin Lee, Myungjun Kim, Ikjun Kim, Jikang Kim, Jeonghwan Min, Kyoungchae Seo
Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
Type:
Grant
Filed:
December 11, 2013
Date of Patent:
July 15, 2014
Assignees:
Samsung Electronics Co., Ltd., Fine Semitech Corp.
Inventors:
Dong-Gun Lee, Eok-Bong Kim, Jong-Ju Park, Seong-Sue Kim
Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
Type:
Application
Filed:
December 11, 2013
Publication date:
June 19, 2014
Applicants:
FINE SEMITECH CORP., SAMSUNG ELECTRONICS CO., LTD.
Inventors:
Dong-Gun LEE, Eok-Bong KIM, Jong-Ju PARK, Seong-Sue KIM