Patents Assigned to Fine Semitech Corp.
  • Patent number: 11790552
    Abstract: An apparatus and method for applying a multi-component curable composition is disclosed. The method for applying a multi-component curable composition includes a) applying a plurality of fluids constituting the multi-component curable composition to a surface of a bonding target object layer by layer, b) acquiring a two-dimensional image of all the fluids applied layer by layer using an image sensor, c) measuring a height of all the fluids applied layer by layer using a distance sensor, and d) calculating a total volume of the multi-component curable composition by using the two-dimensional image and height of the fluids obtained in b) and c).
    Type: Grant
    Filed: September 16, 2021
    Date of Patent: October 17, 2023
    Assignee: FINE SEMITECH CORP.
    Inventors: Sung Chul Jeon, Dong Young Shin, Sun Woo Lee
  • Publication number: 20220380643
    Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.
    Type: Application
    Filed: August 9, 2022
    Publication date: December 1, 2022
    Applicant: FINE SEMITECH CORP.
    Inventors: Byungchul YOO, Byunghoon LEE, Myungjun KIM, Jikang KIM, Jeonghwan MIN, Kyoungchae SEO, Changyoung JEONG
  • Publication number: 20210032514
    Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.
    Type: Application
    Filed: February 26, 2020
    Publication date: February 4, 2021
    Applicant: FINE SEMITECH CORP.
    Inventors: Byungchul YOO, Byunghoon LEE, Myungjun KIM, Jikang KIM, Jeonghwan MIN, Kyoungchae SEO, Changyoung JEONG
  • Patent number: 10087348
    Abstract: A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: October 2, 2018
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Byungchul Yoo, Sungyong Cho, Jaehyuck Choi, Jeongsu Yang, Donghoon Chung, Han-Shin Lee, Myungjun Kim, Ikjun Kim, Jikang Kim, Jeonghwan Min, Kyoungchae Seo
  • Patent number: 9436077
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: September 6, 2016
    Assignees: SAMSUNG ELECTRONICS CO., LTD., FINE SEMITECH CORP.
    Inventors: Jeong jin Kim, Bum hyun An, Chan uk Jeon, Han shin Lee, Jae hyuck Choi, Seung wan Kim, Ik jun Kim, Jang dong You
  • Patent number: 8779403
    Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: July 15, 2014
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Dong-Gun Lee, Eok-Bong Kim, Jong-Ju Park, Seong-Sue Kim
  • Publication number: 20140166907
    Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
    Type: Application
    Filed: December 11, 2013
    Publication date: June 19, 2014
    Applicants: FINE SEMITECH CORP., SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong-Gun LEE, Eok-Bong KIM, Jong-Ju PARK, Seong-Sue KIM
  • Publication number: 20130202993
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Application
    Filed: March 14, 2013
    Publication date: August 8, 2013
    Applicants: FINE SEMITECH CORP., SAMSUNG ELECTRONICS CO., LTD.
    Inventors: SAMSUNG ELECTRONICS CO., LTD., FINE SEMITECH CORP.
  • Patent number: 8404405
    Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: March 26, 2013
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Jung-jin Kim, Bum-hyun An, Chan-uk Jeon, Jang-dong You, Sung-wan Kim, Ik-jun Kim, Jae-hyuck Choi, Han-shin Lee