Patents Assigned to Fuchita Nanotechnology Ltd.
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Patent number: 10266938Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.Type: GrantFiled: July 31, 2017Date of Patent: April 23, 2019Assignee: Fuchita Nanotechnology Ltd.Inventors: Eiji Fuchita, Eiji Tokizaki, Eiichi Ozawa
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Patent number: 9752227Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.Type: GrantFiled: February 19, 2015Date of Patent: September 5, 2017Assignee: FUCHITA NANOTECHNOLOGY LTD.Inventors: Eiji Fuchita, Eiji Tokizaki, Eiichi Ozawa
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Patent number: 9034438Abstract: A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.Type: GrantFiled: June 28, 2013Date of Patent: May 19, 2015Assignees: Fuchita Nanotechnology LTD., National University Corporation Nagoya UniversityInventors: Eiji Fuchita, Yasutoshi Iriyama
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Patent number: 8882970Abstract: An apparatus for manufacturing carbon nanohorns includes a production chamber configured to irradiate a solid carbon material with a laser beam to produce a product containing carbon nanohorns; and a separation mechanism configured to separate the product produced in the production chamber into a lightweight component and a heavyweight component. The heavyweight component includes carbon nanohorn aggregate with high purity, and high-purity carbon nanotubes can be obtained by collecting the heavyweight component.Type: GrantFiled: April 19, 2007Date of Patent: November 11, 2014Assignees: NEC Corporation, Fuchita Nanotechnology Ltd.Inventors: Takeshi Azami, Daisuke Kasuya, Tsutomu Yoshitake, Yoshimi Kubo, Masako Yudasaka, Sumio Iijima, Eiji Fuchita
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Patent number: 8877297Abstract: A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 ?m, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.Type: GrantFiled: December 15, 2010Date of Patent: November 4, 2014Assignee: Fuchita Nanotechnology Ltd.Inventors: Eiji Fuchita, Eiji Tokizaki, Eiichi Ozawa
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Publication number: 20130280414Abstract: [Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 ?m diameter) to be more stably deposited on a substrate by using a simple configuration. [Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container 2, and a carrier gas is introduced into the container, thereby triboelectrically charging the fine particles and generating an aerosol A of the fine particles. The fine particles in question are charged by friction with the inner surface of a transfer tubing 6 connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber 3 which is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate S placed in the deposition chamber.Type: ApplicationFiled: December 15, 2010Publication date: October 24, 2013Applicant: FUCHITA NANOTECHNOLOGY LTD.Inventors: Eiji Fuchita, Eiji Tokizaki, Eiichi Ozawa
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Patent number: 8137743Abstract: [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method. [Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 ?m or more and 11 ?m or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.Type: GrantFiled: January 21, 2010Date of Patent: March 20, 2012Assignee: Fuchita Nanotechnology Ltd.Inventor: Eiji Fuchita
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Publication number: 20110305828Abstract: [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method. [Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 ?m or more and 11 ?m or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.Type: ApplicationFiled: January 21, 2010Publication date: December 15, 2011Applicant: FUCHITA NANOTECHNOLOGY LTDInventor: Eiji Fuchita