Patents Assigned to Fudan Univeristy
  • Patent number: 11447501
    Abstract: A biphenyl-containing diarylpyrimido compound of formula (I), which is prepared by reacting a 4-chloropyrimidine derivative with a biphenyl derivative in a solvent in the presence of a base. A pharmaceutically-acceptable salt of the compound (I) and a pharmaceutical composition containing the compound (I) or a pharmaceutically-acceptable salt thereof are also provided.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: September 20, 2022
    Assignee: Fudan Univeristy
    Inventors: Fener Chen, Yali Sang, Chunlin Zhuang
  • Patent number: 8969911
    Abstract: The present invention belongs to the technical field of optical interconnection and relates to a photo detector, in particular to a photo detector consisting of tunneling field-effect transistors.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: March 3, 2015
    Assignee: Fudan Univeristy
    Inventors: Pengfei Wang, Xi Lin, Wei Wang, Xiaoyong Liu, Wei Zhang
  • Publication number: 20130062684
    Abstract: The invention relates to a gate stack structure suitable for use in a semiconductor flash memory device and its fabricating method. The gate stack structure is fabricated on a p-type 100 silicon substrate, which also includes the following components in sequence from bottom to top: a charge tunnel layer of Al2O3 film, the first charge trapping layer of RuOx nanocrystals; the second charge trapping layer of high-k HxAlyOz film, a charge blocking layer of Al2O3 film, and a top electrode. In this invention, the RuOx nanocrystals have excellent thermal stability, and do not diffuse easily at high temperatures. The high-k HfxAlyOz film has high density charge traps.Pd with a high work function is used as the top electrode. Therefore, the present gate stack structure has vast practical prospects for nanocrystal memory devices.
    Type: Application
    Filed: May 24, 2011
    Publication date: March 14, 2013
    Applicant: Fudan Univeristy
    Inventors: Shijin Ding, Hongyan Gou, Wei Zhang