Patents Assigned to FUJIFILM HUNT CHEMICALS U.S.A., INC.
  • Patent number: 9725617
    Abstract: A polyamideimide and polyamide amic acid resin polymer that allows for reduced levels of toxicity in manufacturing. In an embodiment, a coating composition comprises at least one polyamideimide resin, at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from a group consisting of methyl acetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ?-caprolactone and methylcyclohexane.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: August 8, 2017
    Assignee: FUJIFILM Hunt Chemicals U.S.A., Inc.
    Inventors: Carissa M. Kelly, David E. Noga, John E. Sidenstick, Limor Ben-Asher, Atsuo Kondo
  • Publication number: 20080194719
    Abstract: A coating composition for coating on a substrate to form a sensitive media suitable for color formation by exposure to a laser in the wavelength range of from about 10.3 to about 10.6 microns is provided, the coating composition comprising: (a) at least one organic compound which absorbs electromagnetic radiation in the wavelength range of from about 10.3 to about 10.6 microns and which generates sufficient energy to trigger a color formation reaction, and (b) at least one color forming agent which can form a human-visible mark upon a triggering reaction by the absorbed energy in the coated media.
    Type: Application
    Filed: September 5, 2007
    Publication date: August 14, 2008
    Applicant: FUJIFILM HUNT CHEMICALS U.S.A., INC.
    Inventors: Hailing Duan, Janet Carlock