Patents Assigned to G-FORCE NANOTECH LTD.
  • Patent number: 9691611
    Abstract: A method and apparatus for fabricating two-dimensional layered chalcogenide film are provided. A catalyst gas, a metal-based precursor gas and a chalcogen-based precursor gas are ionized with external stimuli to generate energetic particles which facilitate a chalcogen-substitution reaction of a metal-based precursor gas in a reaction chamber to form uniform two-dimensional layered chalcogenide film of at least a single crystalline layer via chemical vapor deposition.
    Type: Grant
    Filed: January 7, 2016
    Date of Patent: June 27, 2017
    Assignee: G-FORCE NANOTECH LTD.
    Inventors: Chao-Hui Yeh, Jen-Kuan Chiu