Patents Assigned to GABAE Technologies, LLC
  • Compositions incorporating dielectric additives for particle formation, and methods of particle formation using same
    Patent number: 9353229
    Abstract: A method of forming particles that includes performing a strong force attenuation of a mixture to form pre-particles. The mixture including a base compound and a dielectric additive having an elevated dielectric constant dispersed therein. The pre-particles are then dielectrically spun in an electrostatic field to further attenuate the pre-particles and form the particles.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: May 31, 2016
    Assignee: GABAE Technologies LLC
    Inventors: Evan Koslow, Jocelyn Tindale, Ryan Gerakopoulos, Chitral Angammana, Tatiana Lazareva
  • High Dielectric Compositions for Particle Formation and Methods of Forming Particles Using Same
    Publication number: 20140350151
    Abstract: A high dielectric contrast composition for particle formation that includes a high dielectric solvent, and a polymer dissolved into the high dielectric solvent. A method of forming particles including dissolving a polymer in a high dielectric solvent to form a high dielectric composition, and dielectrophoretically spinning the high dielectric composition in an electric field to form particles.
    Type: Application
    Filed: February 11, 2014
    Publication date: November 27, 2014
    Applicant: GABAE Technologies, LLC
    Inventors: Evan Koslow, Jocelyn Tindale, Ryan Gerakopulos, Tatiana Lazareva, Angela Kim, Chitral Angammana