Patents Assigned to Gamma Precision Technology
  • Apparatus and method for cleaning semiconductor wafers
    Patent number: 6146469
    Abstract: The present invention relates to an apparatus and method for cleaning post-etch semiconductor wafers using ultra-pure dry steam.
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: November 14, 2000
    Assignee: Gamma Precision Technology
    Inventor: Masato Toshima