Patents Assigned to Gartek Systems, Inc.
  • Planar magnetron sputtering device
    Patent number: 4444643
    Abstract: A planar magnetron sputtering device having a movable magnetic source which is hydraulically moved with respect to a target and substrate to cause lines magnetic flux parallel to the surface of the target to sweep over the surface of the target during the sputtering process.
    Type: Grant
    Filed: June 16, 1983
    Date of Patent: April 24, 1984
    Assignee: Gartek Systems, Inc.
    Inventor: Charles B. Garrett