Patents Assigned to GASPLAS AS
  • Patent number: 9293302
    Abstract: A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: March 22, 2016
    Assignee: GasPlas AS
    Inventors: Philip John Risby, Dale Pennington
  • Publication number: 20140159572
    Abstract: A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.
    Type: Application
    Filed: February 14, 2014
    Publication date: June 12, 2014
    Applicant: GASPLAS AS
    Inventors: Philip John Risby, Dale Pennington
  • Publication number: 20120034135
    Abstract: A reaction vessel has a reaction chamber, and two or more plasma nozzles coupled to the reactor chamber. Each plasma nozzle has a microwave plasma generator powered by a magnetron, and a feed tube for directing a flow of material via the plasma generator to a respective inlet to the reaction chamber whereby the plasma generator at least partly ionises the material to form a plasma prior to entry of the at least partly ionised material into the reaction chamber. The plasma-generating region of each nozzle is separated from the reactor chamber at a distance between 0.005 to 1 m.
    Type: Application
    Filed: February 19, 2010
    Publication date: February 9, 2012
    Applicant: GASPLAS AS
    Inventor: Philip John Risby
  • Publication number: 20120034137
    Abstract: A reaction vessel has a reaction chamber; and one or more plasma sources coupled to the reaction chamber. Each plasma source has a plasma generator in fluid communication with a reaction region within the reaction chamber whereby the plasma generator at least partly ionises material to form a plasma prior to entry of the at least partly ionised material into the reaction region. The reaction vessel further includes a flow inducer for establishing a fluid flow within the reaction chamber. The flow inducer has the coupling of the one or more plasma sources to the reaction chamber. The coupling induces the flow of the at least partly ionised material from the plasma generator to establish a fluid flow within the reaction chamber. The flow of the at least partly ionised material from the plasma generator is a vortex.
    Type: Application
    Filed: February 19, 2010
    Publication date: February 9, 2012
    Applicant: GASPLAS AS
    Inventor: Philip John Risby