Patents Assigned to Gauda, Inc.
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Publication number: 20140310663Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: December 20, 2013Publication date: October 16, 2014Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8707222Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: November 27, 2012Date of Patent: April 22, 2014Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8689148Abstract: In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.Type: GrantFiled: March 20, 2012Date of Patent: April 1, 2014Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8615723Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: August 28, 2012Date of Patent: December 24, 2013Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8490034Abstract: Computationally intensive electronic design automation operations are accelerated with algorithms utilizing one or more graphics processing units. The optical proximity correction (OPC) process calculates, improves, and optimizes one or more features on an exposure mask (used in semiconductor or other processing) so that a resulting structure realized on an integrated circuit or chip meets desired design and performance requirements. When a chip has billions of transistors or more, each with many fine structures, the computational requirements for OPC can be very large. This processing can be accelerated using one or more graphics processing units.Type: GrantFiled: July 8, 2011Date of Patent: July 16, 2013Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas, Erich E. Elsen
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Patent number: 8478808Abstract: Minimizing memory access by converting a given matrix computation into a set of low-order polynomials. The low-order polynomials can be used by dividing the domain of the polynomials into smaller subregions. If the domain is divided into equal intervals, the low-order polynomial can be used to approximate results from the matrix computation. The set of polynomials is processed using parallel computational hardware such as graphical processing units.Type: GrantFiled: October 19, 2007Date of Patent: July 2, 2013Assignee: Gauda, Inc.Inventor: Ilhami H. Torunoglu
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Publication number: 20120324405Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: August 28, 2012Publication date: December 20, 2012Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8321819Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: December 20, 2010Date of Patent: November 27, 2012Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8255841Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: June 9, 2009Date of Patent: August 28, 2012Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8141004Abstract: In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.Type: GrantFiled: May 11, 2010Date of Patent: March 20, 2012Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 7856612Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: September 28, 2007Date of Patent: December 21, 2010Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Publication number: 20090245618Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: June 9, 2009Publication date: October 1, 2009Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 7546574Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: December 1, 2006Date of Patent: June 9, 2009Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Publication number: 20070130559Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: December 1, 2006Publication date: June 7, 2007Applicant: GAUDA, INC.Inventors: Ilhami Torunoglu, Ahmet Karakas