Abstract: A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithograhic pattern is a mask for producing electronic circuits.

Abstract: In the electron beam lithographic system disclosed herein, a semiconductor wafer to be exposed is carried on an air bearing puck which is, on both sides, supported or located by balanced annular regions of air pressure. These annular supporting regions surround central evacuated regions which are also balanced so that the puck is not subject to large bending forces. Accordingly, the puck can be constructed to light-weight materials facilitating rapid and precise positioning of the semiconducter wafer with respect to an E-beam generating column.

Abstract: A system for automatically detecting dust or other minute particles on a large-area, optically unpolished surface such as a face of a glass reticle plate used in the production of microelectronic circuits. The system irradiates the surface with a narrow, high intensity beam of monochromatic radiation at a grazing angle, typically 1/2 degree with respect to the surface. An oscillating mirror scans the beam across the moving surface in a direction generally perpendicular to the direction of plate advance. A beam splitter provides separate inspecting beams for each surface of the plate. Optical systems characterized by a high numerical aperture are positioned on opposite sides of the plate to collect radiation which is scattered from the particles. The optical systems are oriented to accept scattered radiation, and typically have their optical axes at an angle in the range of 60.degree. to 160.degree. measured from the direction of advance.

Abstract: The cleaning apparatus disclosed herein employs ultrasonic energy applied through a transducer face which overlies the entire wafer face. A cleaning liquid is introduced through the center of the transducer faceplate into the gap between the wafer and the faceplate. The transducer includes a plurality of piezoelectric transducer elements annularly distributed around the faceplate which are energized for synchronous vibration to provide an essentially uniform acoustic field over the faceplate. The faceplate is essentially flat over a majority of its surface but includes a plurality of grooves facilitating the venting of vapors created by cavitation during cleaning.

Abstract: A sample fluid stream passes through a molecular sieve in which moisture is adsorbed in direct proportion to the moisture in the fluid stream. Fast neutrons beamed through the sieve interact with the hydrogen nuclei in the accumulated water. The resulting slow neutrons are detected to produce an output indicative of the percentage of moisture in the fluid stream.

Abstract: An automatic wafer processing system is modular in format and includes wafer treatment units, storage units and air bearing transport track units which are all operatively interconnected in a coplanar configuration to provide an automated wafer flow path. To facilitate such automated system improved variable width air bearing tracks are provided by flexible strips in slots.

Abstract: In the alignment system disclosed, herein a raster scanned video signal representing a selected portion of the wafer surface is analyzed for diagonal reference lines or features on the surface of the wafer utilizing a swept gating technique which extracts desired image features from an obscuring or noisy background. A given point on the wafer surface is determined by locating two oppositely-inclined diagonal features, the point being defined by their intersection. These two features are searched for simultaneously and independently, minimizing the search time.

Abstract: Disclosed is a vacuum furnace temperature controller for the stable regulation of temperature over a wide range of temperatures. The control loop includes a multiplier responsive to the desired temperature which modifies the overall loop gain and the maximum power which may be applied to the furnace heater as a function of the desired temperature.

Abstract: In the smoke opacity monitor disclosed herein, a measurement of opacity is obtained by measuring the proportion of polarized light from the background sky which is detectable through the smoke plume. Compensation and normalization is provided to minimize errors generated by illumination of the plume itself and for the overall intensity of the background sky light.

Abstract: A wafer processing system for spin processing photoresist liquid on a silicon wafer and automatically sequencing them through the processor includes a shuttle having upper and lower air bearing slides. The upper slide receives the wafer from a supply magazine and centers it on a rotating chuck and the lower slide of the shuttle receives the wafer from the chuck and allows it to be transferred to a receive track.

Abstract: An automatic wafer processing system is modular in format and includes wafer treatment units, storage units and air bearing transport track units which are all of a common module size or an integral multiple thereof. All of these units can then be operatively interconnected in a coplanar configuration to provide an automated wafer flow path. Variation of treatment units can provide many different types of wafer processing in a simple and economical manner. To facilitate such automated system improved variable width air bearing tracks are provided along with a buffer storage unit to accommodate differing process times.

Abstract: In the bonding apparatus disclosed herein, possible misalignment of a semiconductor chip at the work station is sensed by first optically scanning the workpiece using a video scanning head mounted on a common X-Y carriage with the bonding head. A zone signal is generated which defines, within the scanned area, a limited zone of consideration. The video signal is evaluated as a function of the zone signal to measure the extent of coincidence between the zone and a target area on the workpiece. The placement and dimensions of the zone are progressively adjusted responsive to the evaluation and in accordance with a search algorithm to locate at least two target areas on the workpiece and the bonding head is then traversed to adjusted target coordinates derived from the optically located target areas.

Abstract: A relatively high percentage of the light given off by a source lamp is gathered by four collector lens systems disposed around the lamp. The desired wavelength components of the light gathered by each lens system are directed by a dichroic mirror toward the system axis and into a respective focusing lens system, while longer wavelengths are transmitted by each mirror to a heat sink. The light from each focusing lens system is directed to the entrance face of a respective sub-bundle of a fiber optic combining system. The entrance face of each sub-bundle is inclined off axis to receive the incident light. The sub-bundles then bend and join each other in alignment with the system axis to transmit the combined light to a single exit face.

Abstract: A positive displacement flow through fluid pump especially useful for dispensing exact volumes of photoresist on a silicon wafer uses a bellows for the main pumping component. The bellows is capped at both ends and they include slugs which extend into the interior of the bellows to minimize the static volume. In addition, internal porting is provided in the slugs to effectively wash or purge the convolutions of the bellows which results in continuous cleaning.

Abstract: A system for exposing photoresists "on-the-fly" is disclosed. The system incorporates a dye laser having an output pulse duration of less than about 250 nanoseconds to expose the photoresist while the photoresist is moving. Means are provided to synchronize the output of the laser to the motion of a photoresist coated surface and to insure spatial uniformity of energy across an object plane of an optical projection system.

Abstract: Apparatus and method for handling articles, such as glass or ceramic plates, commonly referred to as masks, employed in the manufacture of semi-conductor devices. The masks are transported between two predetermined stations with a treating operation being performed thereon at an intermediate station. The subject apparatus utilizes a fluid bearing for removing a plurality of masks in sequence from an indexable carrier and for accurately positioning the masks in sequence relative to a vacuum transfer arm. The transfer arm positions the masks in a precisely oriented location on a rotatable vacuum chuck so that a predtermined operation may be formed thereon. Another vacuum transfer arm then moves the treated masks in sequence from the vacuum chuck and places the same onto another fluid bearing for introduction thereby into another indexable carrier.

Abstract: A system is shown for the positive, metered lubrication of the shaft and rotor surfaces in a mechanical vacuum pump. The pump has an end plate which receives the shaft in a cylindrical opening and a lubricant conduit is provided in the end plate communicating with that opening. At a location of the opening's cylindrical surface circumferentially spaced from the lubricant conduit, a recess is provided in that cylindrical surface, the recess extending to the end of that surface adjacent the conventional pump rotor secured to the shaft for rotation therewith. One or more recesses are provided in the shaft itself and each is axially alinged with both the lubricant conduit and a portion of the recess in the cylindrical surface. Thus, upon rotation of the shaft, the recess in the shaft itself receives lubricant from the lubricant conduit and deposits the lubricant in the first-mentioned recess.

Abstract: Equipment for processing workpieces on a continuous basis under vacuum transfers workpieces from a feed compartment to an evacuated processing compartment, and removes processed workpieces to a discharge compartment, with a single reciprocating carriage and with lifters that selectively raise workpieces from the carriage and deposit them again. The carriage passes between the processing compartment and the terminal compartments through vacuum valves.

Abstract: In the sample introducer system disclosed herein, a sample-carrying probe engages and releases, from a sample-introducing port, a plug which closes the port when the probe is not in place. The probe then carries the plug ahead of itself into an evacuated chamber where the sample may be analyzed. Upon withdrawal of the probe, the plug is replaced so as to seal the port.

Abstract: Apparatus and method for handling articles, such as silicon and like wafers used in producing electronic devices. Articles are transferred between two predetermined stations on a fluid bearing track structure and may be selectively diverted in sequence into a storage magazine which defines a buffer station so that articles to be handled or treated in adjacent associated apparatus may be maintained in readily available supply to satisfy the needs of the associated apparatus. When such needs may be satisfied by direct transfer of articles into the associated apparatus the storage buffer zone is bypassed. A selectively actuated fluid bearing turntable directs articles into or from the storage magazine as operating conditions require. All handling of articles is automatically effected on fluid bearings and requires no direct manual participation.