Abstract: The present invention is a method and apparatus for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
Type:
Grant
Filed:
February 17, 1995
Date of Patent:
August 25, 1998
Assignees:
Air Products and Chemicals, Inc., GEC, Inc.
Inventors:
Bruce Alan Huling, Charles Anthony Schneider, George Martin Engle
Abstract: A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated diluted nitrogen trifluoride at elevated temperatures, typically at the process operation temperature, wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
Type:
Grant
Filed:
February 17, 1995
Date of Patent:
February 3, 1998
Assignees:
Air Products and Chemicals Inc., Aspect Systems Inc., GEC Inc.
Inventors:
Charles Anthony Schneider, Ronald James Gibson, Bruce Alan Huling, George Martin Engle