Patents Assigned to Gemio Technologies, Inc.
  • Methods and apparatus for ion sources, ion control and ion measurement for macromolecules
    Publication number: 20070075240
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Application
    Filed: September 8, 2006
    Publication date: April 5, 2007
    Applicant: GEMIO TECHNOLOGIES, INC.
    Inventor: Andreas Hieke
  • Ion source with controlled superposition of electrostatic and gas flow fields
    Patent number: 7138642
    Abstract: Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: November 21, 2006
    Assignee: Gemio Technologies, Inc.
    Inventor: Andreas Hieke