Patents Assigned to Gen Co., Ltd.
  • Patent number: 9263237
    Abstract: The following description relates to a plasma processing apparatus and a method thereof. The plasma processing apparatus comprises a first plasma chamber having a first plasma discharge space, a first plasma source for supplying a first activation energy to the first plasma discharge space within the first plasma chamber, a second plasma chamber which is connected to the first plasma chamber and has a second discharge space, and a second plasma source for supplying a second activation energy for inducing inductive coupled plasma to the second plasma discharge space within the second plasma chamber.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: February 16, 2016
    Assignee: GEN CO., LTD.
    Inventor: Dae-Kyu Choi
  • Publication number: 20150059979
    Abstract: A plasma apparatus for vapor phase etching and cleaning, includes a reactor body configured to process a substrate; a direct plasma generation area in the reactor body, into which a process gas is introduced and in which plasma is directly induced to disassociate the process gas; a substrate processing area in the reactor body in which the substrate is processed by reactive species produced by reacting the disassociated process gas introduced from the direct plasma generation area with a vaporised gas introduced from the outside of the reactor body; a plasma induction assembly configured to induce plasma in the direct plasma generation area; and a gas distribution baffle, disposed between the direct plasma generation area and the substrate processing area, having a plurality of through holes through which the disassociated process gas is introduced from the direct plasma generation area to the substrate processing area.
    Type: Application
    Filed: January 27, 2014
    Publication date: March 5, 2015
    Applicant: Gen Co., Ltd.
    Inventors: Gyoo Dong KIM, Sung Yong KANG, Woo Gon SHIN
  • Patent number: 8888428
    Abstract: A method of manufacturing an insert nut having a diamond lattice structure comprises cutting and forging a metal rod and thus preparing a forged article having a flange and a nut body; pressing-in the forged article between a first thread rolling die formed with a first annular die protrusion and a left diagonal die protrusion for forming a left diagonal line of a diamond lattice and a second thread rolling die formed with a second annular die protrusion and a right diagonal die protrusion for forming a right diagonal line of the diamond lattice; and pressing the forged article with the thread rolling dies, and then moving up and down each of the thread rolling dies so that a plurality of diamond lattices and an annular protrusion are arranged on the external circumferential surface of the nut body.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: November 18, 2014
    Assignee: Gen Co., Ltd.
    Inventor: Won Sool Park
  • Publication number: 20140241827
    Abstract: A method of manufacturing the insert nut having the rectangular lattice structure, comprises preparing a forged article having a flange and a nut body formed with a serration, which are formed by a forging process; pressing the forged article with a thread rolling die in which a diagonal line inclined at an angle of 15° to 30° with respect to a vertical line to a length direction thereof is formed, and a circular arc is defined by the diagonal line, and a curved die protrusion is provided to have a curvature R so that the vertical line is tangentially contacted with the circular arc, and thus an angle between rectangular lattices is maintained to 50° to 40°; and performing a thread rolling process by pressing-in and rotating the forged article.
    Type: Application
    Filed: February 22, 2013
    Publication date: August 28, 2014
    Applicant: GEN CO.,LTD.
    Inventor: WON SOOL PARK
  • Publication number: 20140186139
    Abstract: The present invention relates to an insert nut having a diamond lattice structure, which can increase the pull out force, and a manufacturing method thereof. The method of manufacturing the insert nut having the diamond lattice structure, comprises cutting and forging a metal rod and thus preparing a forged article having a flange and a nut body; pressing-in the forged article between a first thread rolling die formed with a first annular die protrusion and a left diagonal die protrusion for forming a left diagonal line of a diamond lattice and a second thread rolling die formed with a second annular die protrusion and a right diagonal die protrusion for forming a right diagonal line of the diamond lattice; and pressing the forged article with the thread rolling dies, and then moving up and down each of the thread rolling dies so that a plurality of diamond lattices and an annular protrusion are arranged on the external circumferential surface of the nut body.
    Type: Application
    Filed: June 27, 2012
    Publication date: July 3, 2014
    Applicant: GEN CO., LTD.
    Inventor: Won Sool Park
  • Publication number: 20140083615
    Abstract: A plasma processing chamber includes a chamber body having a substrate support on which the substrate to be processed is placed, a dielectric window forming a ceiling of the chamber body, an inductive antenna set on a upper part of the dielectric window and configured to supply an electromotive force generating plasmas into the chamber body, a cooling water supplier configured to supply cooling water into the inductive antenna, a heating plate set on a upper part of the inductive antenna, and a heat conductive member filled in a space between the heating plate and the dielectric window to contact the heating plate, the inductive antenna and the dielectric window, wherein the heat conductive member makes the dielectric window to have a uniform heat distribution through the heat conduction between the inductive antenna and the dielectric window, and the heat conduction between the heating plate and the dielectric window.
    Type: Application
    Filed: March 14, 2013
    Publication date: March 27, 2014
    Applicant: GEN CO., LTD.
    Inventors: Gyoo-Dong KIM, Sung-Yong KANG
  • Publication number: 20130245066
    Abstract: 2-pyridyl-substituted imidazoles which are used advantageously in the treatment of diseases mediated by ALK 5 or ALK 4 receptor or both.
    Type: Application
    Filed: June 22, 2011
    Publication date: September 19, 2013
    Applicants: IN2GEN CO., LTD., EWHA UNIVERSITY INDUSTRY COLLABORATION FOUNDATION, SK CHEMICALS CO., LTD.
    Inventors: Dae-Kee Kim, Yung-Jue Bang, Hun-Taek Kim, II-Sang Cho, Myoung-Soon Park, Young Jae An, Joon Hun Choi
  • Patent number: 8409400
    Abstract: An inductive plasma chamber of the present invention comprises a plurality of discharge tube bridges connected between a discharge tube head and a process chamber. The discharge tube head is disc shaped and a cylindrical gas inlet which a gas is injected is disposed in its center. A susceptor on which a workpiece is placed is disposed inside a process chamber and a flange of upper certain area has an inclined surface which is upward centrally inclined. The discharge tube bridge is provided with at least one ferrite core, and the ferrite core has a winding connected to a power supply source. When a process gas is injected via the gas inlet and a RF power from the power supply source is supplied with a winding, the electromotive force is transmitted inside the discharge tube head, the discharge bridge and the process chamber so that the plasma discharge is occurred in the plasma chamber.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: April 2, 2013
    Assignee: Gen Co., Ltd.
    Inventor: Soon-Im Wi
  • Patent number: 8167489
    Abstract: A packaging bag for secondary packaging which allows safety transport of infectious substances is provided. Front and back surface materials are placed on top of another and formed into a bag member by heat-sealing both side edge and bottom edge portions continuously. Partitioning materials formed of a plastic sheet or film having a required size are disposed on inner surfaces of the upper ends of the front and back surface materials and attached to the front and back surface materials by heat-sealing both side edge and bottom edge portions except for an upper end edge portion to form pocket portions. A sealing material is stuck to the back surface material on the outside of the upper end portion thereof so as not to be opened. The internal pressure is received by one of the pocket portions when the internal pressure in the packaging bag is increased.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: May 1, 2012
    Assignee: Sugiyama-Gen Co., Ltd.
    Inventor: Hideo Igarashi
  • Patent number: 7862681
    Abstract: Provided is a plasma processing system comprising: a plasma reactor generating plasma by receiving an input gas; and a radio frequency generator supplying radio frequency. The radio frequency generator supplies radio frequency power for plasma generation to the plasma reactor, wherein upon power interruption within a predetermined time occurring during the operation of the plasma reactor, the radio frequency generator re-supplies the radio frequency power, without discontinuing the operation of the plasma reactor, after power returns. Thereby, the plasma reactor stably maintains plasma upon momentary power interruption.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: January 4, 2011
    Assignee: Gen Co., Ltd.
    Inventor: Dae-Kyu Choi
  • Publication number: 20080319022
    Abstract: 2-pyridyl-substituted imidazoles and their use in inhibiting ALK 5 and/or ALK 4 receptors is disclosed.
    Type: Application
    Filed: June 12, 2008
    Publication date: December 25, 2008
    Applicants: IN2GEN CO., LTD., SK CHEMICALS CO., LTD., EWHA UNIVERSITY INDUSTRY
    Inventors: Dae-Kee Kim, Yung-Jue Bang, Hun-Taek Kim, Il-Sang Cho, Myoung-Soon Park, Young Jae An, Joon Hun Choi
  • Publication number: 20080319012
    Abstract: 2-pyridyl-substituted imidazoles which are used advantageously in the treatment of diseases mediated by ALK 5 or ALK 4 receptor or both.
    Type: Application
    Filed: June 12, 2008
    Publication date: December 25, 2008
    Applicants: IN2GEN CO., LTD., SK CHEMICALS CO., LTD, EWHA UNIVERSITY INDUSTRY COLLABORATION FOUNDATION
    Inventors: Dae-Kee Kim, Yung-Jue Bang, Hun-Taek Kim, Il-Sang Cho, Myoung-Soon Park, Young Jae An, Joon Hun Choi
  • Patent number: 7041635
    Abstract: The application discloses Factor VIII polypeptides comprising internal deletions of amino acids within the area of residues 741 to 1689, wherein the thrombin cleavage sites at about 741 and about 1689 are present, and a site at about 1648 is not present, as compared to human Factor VIII.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: May 9, 2006
    Assignee: IN2GEN Co., Ltd.
    Inventors: Hun-Taek Kim, In-Young Song, Jae Won Choi, Jin-Wook Jang, Yong-Kook Kim, Ho Soon Lee, Yung-Jue Bang, Dae-Kee Kim
  • Publication number: 20050261299
    Abstract: Compounds of the formula: wherein R1, R2, R3, A1 and A2 are as defined herein, which are used advantageously in inhibiting the TGF-? and/or activin signaling pathway in mammals.
    Type: Application
    Filed: November 8, 2004
    Publication date: November 24, 2005
    Applicants: IN2GEN CO., LTD., SK CHEMICALS CO., LTD., Ewha University Industry Collaboration Foundation
    Inventors: Dae-Kee Kim, Yung-Jue Bang, Hun-Taek Kim, Il-Snag Cho, Myoung-Soon Park, Young An, Joon Choi
  • Patent number: 6962911
    Abstract: The invention relates to a series of pyrrolopyrimidinone derivatives of the formula (1): wherein R1 is H; C1-C3 alkyl optionally substituted with one or more fluoro atoms; or C3-C6 cycloalkyl; R2 is H; a halogen atom; C1-C6 alkyl optionally substituted with OH, C1-C3 alkoxy, C3-C6 cycloalkyl, or with one or more fluoro atoms; C3-C6 cycloalkyl; C2-C6 alkenyl; or C2-C6 alkynyl; R3 is H; C1-C6 alkyl optionally substituted with OH, C1-C3 alkoxy, C3-C6 cycloalkyl, or with one or more fluoro atoms; C3-C6 cycloalkyl; C2-C6 alkenyl; or C2-C6 alkynyl; R4 is C1-C6 alkyl optionally substituted with C3-C6 cycloalkyl or with one or more fluoro atoms; C2-C6 alkenyl; C2-C6 alkynyl; or C3-C6 cycloalkyl; and R5 is SO2NR6R7; NHSO2NR6R7; NHCOCONR6R7; NHSO2R8; NHCOR8; or phenyl or heterocyclyl either of which is optionally substituted with one or more fluoro atoms or C1-C3 alkyl.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: November 8, 2005
    Assignees: SK Chemicals Co., Ltd., In2Gen Co., Ltd.
    Inventors: Dae-Kee Kim, Ju Young Lee, Do Hyun Ryu, Nam Kyu Lee, Suk Ho Lee, Nam-Ho Kim, Jae-Sun Kim, Je Ho Ryu, Jin-Young Choi, Guang-Jin Im, Won-Son Choi, Tae Kon Kim, Hoon Cha
  • Patent number: D426216
    Type: Grant
    Filed: August 5, 1999
    Date of Patent: June 6, 2000
    Assignees: Sejin Electron Inc., NIT Gen Co., Ltd
    Inventors: Sang Young Lee, Jun Young Ahn