Abstract: A bio control surface (100) comprising a substrate (5) and a first plurality of discrete, spaced-apart particles (1) disposed on the substrate (5) and a second plurality of discrete, spaced-apart particles (6) disposed on the substrate (5), wherein the first (1) and second (6) pluralities of discrete, spaced-apart particles are formed from species having different chemical and/or electrical properties. An intermediate layer (4) may be interposed between the particles (1, 6) and the substrate (5). The bio control surface (100) can be activated by exposure to particular conditions, which cause the first (1) and second (6) pluralities of particles to adopt different potentials (+, ?), such that flow of charge, heat, ions etc. can be used to neutralise or kill bacteria or microorganisms resident on the surface (100).

Abstract: This invention relates to generation and control of electron emission and transport in a plasma device for enhancing ionization in sputtering, including magnetron sputtering, ion treatment, thermal evaporation, electron beam evaporation. The device in combines a sputtering enhanced electron emission on a cathodic element in which a strong electrical field around the electron emission element is created. In addition, this electric field area is in a magnetically confined space of nearly null strength and/or magnetic mirror features. The electron emission area would also comprise of guided magnetic field extraction magnetic field paths which could be either permanent or created at pulse modes. Also, the invention relates to reactive process and coating deposition ion bombardment management. This invention also relates to the use in feedback control systems; manufacturing process and methods which use these devices and materials and components processed by the present invention are also part of the invention.

Abstract: A method is provided for automated tuning and calibration of feedback control of systems and processes. A series of actuator pulses are automatically performed and, based on the gradient of the sensor response, information is determined on the dynamics of the system to be controlled in what is described as the system identification procedure. An automatic sensor calibration procedure is performed to determine the controller's window of operation. Based on the information collected during the system identification procedure, controller parameters are automatically calculated for a specified time for the sensor to reach a setpoint. A system that is managed and/or controlled by a controller and/or control algorithm is also provided. The disclosed method provides a scheme for parameterization of control algorithms.

Abstract: This invention relates to the in-vacuum rotational device on a cylindrical magnetron sputtering source where the target or target elements of the target construction of such device are enabled to rotate without the need of a vacuum to atmosphere or vacuum to coolant dynamic seal. This invention relates to the use of the device in vacuum plasma technology where a plasma discharge, or any other appropriate source of energy such as arcs, laser, which can be applied to the target or in its vicinity would produce suitable coating deposition or plasma treatment on components of different nature. This invention also relates but not exclusively to the use of the device in sputtering, magnetron sputtering, arc, plasma polymerization, laser ablation and plasma etching. This invention also relates to the use of such devices and control during non-reactive and reactive processes, with or without feedback plasma process control.

Abstract: A bio control surface (100) comprising a substrate (5) and a first plurality of discrete, spaced-apart particles (1) disposed on the substrate (5) and a second plurality of discrete, spaced-apart particles (6) disposed on the substrate (5), wherein the first (1) and second (6) pluralities of discrete, spaced-apart particles are formed from species having different chemical and/or electrical properties. An intermediate layer (4) may be interposed between the particles (1, 6) and the substrate (5). The bio control surface (100) can be activated by exposure to particular conditions, which cause the first (1) and second (6) pluralities of particles to adopt different potentials (+, ?), such that flow of charge, heat, ions etc. can be used to neutralise or kill bacteria or microorganisms resident on the surface (100).

Abstract: A magnetron sputtering apparatus (100) comprising: a magnetic array arranged to create a magnetic field (103) in the vicinity of a tubular target (2) which target at least partially surrounds the magnetic array and acts as a cathode (2a); an anode (2b); the magnetic array being arranged to create an asymmetric plasma distribution with respect to the normal angle of incidence to a substrate (3); and means (1b) for enhancing the magnetic field to produce a relatively low impedance path for electrons flowing from the cathode (2a) to the anode (2b).

Abstract: A magnetron sputtering apparatus (100) comprising: a magnetic array arranged to create a magnetic field (103) in the vicinity of a tubular target (2) which target at least partially surrounds the magnetic array and acts as a cathode (2a); an anode (2b); the magnetic array being arranged to create an asymmetric plasma distribution with respect to the normal angle of incidence to a substrate (3); and means (1b) for enhancing the magnetic field to produce a relatively low impedance path for electrons flowing from the cathode (2a) to the anode (2b).

Abstract: Disclosed is a metal sulphide coating composition of the formula MXSiVRYSZFW where M is one or more metals selected from: Mo, Ti, W, Nb, Ta, Zr, and Hf; Si is silicon; R is one or more elements selected from: C, B, Al, V, Cr, Fe, Co, Ni, Sm, Au, Cu, Zn, Sn, Pb, N, H, and O; S is sulphur; F is fluorine; X is 0.2 to 1.5; V is 0.02 to 3; Y is 0 to 4; Z is 0.2 to 6; and W is 0.01 to 6, and in which X, Y, Z, V, and W are given in amounts by atomic ratio. The compositions show good non-stick properties, low hydrophilia, and high stability.