Abstract: A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.
Type:
Grant
Filed:
July 28, 2011
Date of Patent:
November 27, 2018
Assignee:
GES Associates LLC
Inventors:
Dennis Goodwin, Sr., Jeff Mittendorf, Charles J. Moretti, John W. Rose, Earl Blake Samuels