Patents Assigned to Gigaphoton Inc.
  • Publication number: 20220371121
    Abstract: An exposure system that performs scanning exposure of a semiconductor substrate by irradiating a reticle with a pulse laser beam includes a laser apparatus configured to emit a pulse laser beam, an illumination optical system through which the pulse laser beam is guided to the reticle, a reticle stage, and a processor configured to control emission of the pulse laser beam from the laser apparatus and movement of the reticle by the reticle stage. The reticle includes a region in which multiple kinds of patterns are arranged in a mixed manner in a scanning width direction orthogonal to a scanning direction of the scanning exposure. The processor instructs the laser apparatus about a target wavelength such that the laser apparatus emits the pulse laser beam of a wavelength with which dispersion of best focus positions corresponding to respective patterns of the multiple kinds of patterns is minimum.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Koichi FUJII, Osamu WAKABAYASHI
  • Publication number: 20220373896
    Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Koichi FUJII, Osamu WAKABAYASHI
  • Publication number: 20220376455
    Abstract: A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.
    Type: Application
    Filed: August 5, 2022
    Publication date: November 24, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Yoichi SASAKI, Kouji KAKIZAKI, Hakaru MIZOGUCHI
  • Publication number: 20220373893
    Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus emitting a pulse laser beam, an illumination optical system guiding the pulse laser beam to a reticle, a reticle stage moving the reticle, and a processor controlling emission of the pulse laser beam and movement of the reticle. The exposure system performs scanning exposure of a semiconductor substrate by irradiating the reticle with the pulse laser beam. The reticle has first and second regions. The processor instructs the laser apparatus about, based on proximity effect characteristics corresponding to the first and second regions, a value of a control parameter of the pulse laser beam corresponding to each region so that the laser apparatus emits the pulse laser beam with which a difference of the proximity effect characteristic of each region from a reference proximity effect characteristic is in an allowable range.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Koichi FUJII, Osamu WAKABAYASHI
  • Patent number: 11500194
    Abstract: A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: November 15, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Takashi Suganuma, Takahiro Tatsumi
  • Patent number: 11502478
    Abstract: A laser apparatus according to the present disclosure includes: a laser output unit configured to perform laser oscillation; and a control unit configured to acquire first laser performance data obtained when the laser output unit performs laser oscillation based on a first laser control parameter, and second laser performance data obtained when the laser output unit performs laser oscillation based on a second laser control parameter, while laser output from the laser output unit to an external device is stopped, and determine whether the second laser performance data has been improved as compared to the first laser performance data.
    Type: Grant
    Filed: November 5, 2019
    Date of Patent: November 15, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Hiroyuki Masuda, Osamu Wakabayashi
  • Publication number: 20220350120
    Abstract: A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.
    Type: Application
    Filed: July 6, 2022
    Publication date: November 3, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Hirotaka MIYAMOTO, Osamu WAKABAYASHI
  • Publication number: 20220342311
    Abstract: An information processing device includes a processor and a storage device. The processor is configured to acquire data for each parameter provided from each of a light source device which generates pulse light and an exposure apparatus which performs exposure on a wafer with the pulse light output from the light source device, and time data associated with the data; to perform classification, based on the acquired data and time data, for each record of the data associated with same time data for distinguishing whether being data during exposure in which the wafer is irradiated with the pulse light or being data during non-exposure; to associate attribute information indicating an attribute according to the classification with each of the records; to cause the storage device to store the data and the time data associated with the attribute information; and to generate a chart using data read from the storage device.
    Type: Application
    Filed: July 6, 2022
    Publication date: October 27, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Yutaka IGARASHI, Satoru KIKUCHI, Kunihiko ABE, Yuji MINEGISHI
  • Patent number: 11483917
    Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: October 25, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Takayuki Osanai, Koichiro Koge
  • Publication number: 20220334383
    Abstract: A cleaning method for an extreme ultraviolet light reflection mirror includes a contacting step of bringing ?-tin into contact with solid tin debris attached to an extreme ultraviolet light reflection mirror and an aging step of leaving the tin debris brought into contact with the ?-tin in a temperature environment below a freezing point to promote turning into tin pest of the tin debris. The cleaning method further includes a removing step of removing the tin debris turned into tin pest from the extreme ultraviolet light reflection mirror.
    Type: Application
    Filed: March 14, 2022
    Publication date: October 20, 2022
    Applicant: Gigaphoton Inc.
    Inventor: Gouta NIIMI
  • Patent number: 11477877
    Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: October 18, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Hitoshi Nagano, Yasunori Wada, Tatsuya Yanagida, Osamu Wakabayashi
  • Patent number: 11474433
    Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a chamber housing a collector mirror configured to condense the extreme ultraviolet light; a gas introduction pipe through which gas is introduced into the chamber; a mass flow controller configured to change the flow rate of the gas; a discharge pump configured to discharge the gas from the chamber; a pressure sensor configured to monitor the pressure in the chamber; and a control unit configured to control the mass flow controller based on the pressure measured by using the pressure sensor. The control unit controls the mass flow controller to increase an increase ratio of the flow rate of the gas entering the chamber as the pressure acquired by the pressure sensor increases.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: October 18, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Yuki Takeda, Yutaka Shiraishi
  • Patent number: 11465233
    Abstract: A laser processing system includes: a wavelength-variable laser device configured to output each of a laser beam at an absorption line as a wavelength at which light is absorbed by oxygen and a laser beam at a non-absorption line as a wavelength at which the amount of light absorption by oxygen is smaller than at the absorption line; an optical system configured to irradiate a workpiece with the laser beam; and a laser control unit configured to control the wavelength-variable laser device, set the wavelength of the laser beam output from the wavelength-variable laser device to be the non-absorption line when laser processing is performed on the surface of the workpiece in gas containing oxygen, and set the wavelength of the laser beam output from the wavelength-variable laser device to be the absorption line when ozone cleaning is performed on the surface of the workpiece in gas containing oxygen.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: October 11, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Kouji Kakizaki, Osamu Wakabayashi
  • Patent number: 11467502
    Abstract: A wavelength control method of a laser apparatus includes sequentially obtaining target wavelength data of a pulse laser beam, sequentially saving the target wavelength data, sequentially measuring a wavelength of the pulse laser beam to obtain a measured wavelength, calculating a wavelength deviation using the measured wavelength and the target wavelength data at a time before a time when the measured wavelength is obtained, and feedback-controlling the wavelength of the pulse laser beam using the wavelength deviation.
    Type: Grant
    Filed: June 8, 2021
    Date of Patent: October 11, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Takuma Yamanaka, Hirotaka Miyamoto
  • Patent number: 11469568
    Abstract: A laser apparatus includes: (A) a solid-state laser apparatus that outputs burst seed pulsed light containing a plurality of pulses; (B) an excimer amplifier that amplifies the burst seed pulsed light in a discharge space in a single occurrence of discharge and outputs the amplified light as amplified burst pulsed light; (C) an energy sensor that measures the energy of the amplified burst pulsed light; and (D) a laser controller that corrects the timing at which the solid-state laser apparatus is caused to output the burst seed pulsed light based on the relationship of the difference between the timing at which the solid-state laser apparatus outputs the burst seed pulsed light and the timing at which the discharge occurs in the discharge space with a measured value of the energy.
    Type: Grant
    Filed: April 19, 2019
    Date of Patent: October 11, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Kouji Kakizaki, Osamu Wakabayashi
  • Patent number: 11452196
    Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: September 20, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Kouichiro Kouge, Yusuke Hoshino, Toshihiro Nishisaka, Takashi Okada
  • Patent number: 11451003
    Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.
    Type: Grant
    Filed: September 1, 2020
    Date of Patent: September 20, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Hiroaki Tsushima, Satoshi Tanaka, Yousuke Fujimaki, Takeshi Asayama, Osamu Wakabayashi
  • Patent number: 11428892
    Abstract: An optical apparatus may include a housing having an opened front face, an optical unit freely movable into and out of an internal space of the housing through the front face, and a positioning portion disposed on a back side of the optical unit in the internal space. A base plate of the optical unit may include first and second convex portions disposed on a base end face of the base plate. The second convex portion may be disposed at a position different from the first convex portion in a width direction of the base plate. The positioning portion may include a V block having a V groove shape at a part contacting the first convex portion, and a flat block having a flat surface shape at a part contacting the second convex portion. The optical unit may be positioned in the internal space through the contact.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: August 30, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Yukio Watanabe
  • Patent number: 11411364
    Abstract: A line narrowing module includes a prism including an entrance side surface that light enters, an exit side surface from which the light is emitted, and a bottom surface, and configured to wavelength-disperse the light having entered the entrance side surface and to emit the light from the exit side surface; a holder portion having a stationary surface on which the bottom surface of the prism is secured; a rotary mechanism portion including a rotary stage on which the holder portion is secured, the rotary stage being configured to rotate the prism around an axis perpendicular to a dispersion plane of the light emitted from the prism; a drive unit configured to rotate the rotary stage; and a grating configured to reflect the light emitted from the prism, centroids of the prism, the holder portion, and the rotary stage being located on the axis.
    Type: Grant
    Filed: July 9, 2021
    Date of Patent: August 9, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Miwa Igarashi, Shinichi Matsumoto
  • Patent number: 11409027
    Abstract: An extreme ultraviolet light condensation mirror may include a reflective surface formed in a concave shape and configured to diffract a laser beam incident from a first focal point and having a wavelength longer than a wavelength of extreme ultraviolet light. The reflective surface may be provided with a plurality of first reflection portions, a plurality of second reflection portions, a plurality of first stepped portions, and a plurality of second stepped portions. The first and second stepped portions may have such heights that the laser beam obtains phases opposite to each other through reflection at the first and second reflection portions adjacent to each other. The height of each first stepped portion may be equal to or higher than the height of each second stepped portion. The height of at least one of the first stepped portions may be higher than the height of each second stepped portion.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: August 9, 2022
    Assignee: Gigaphoton Inc.
    Inventor: Masayuki Morita