Patents Assigned to Gigaphoton Inc.
  • Publication number: 20240196505
    Abstract: An extreme ultraviolet light generation chamber device includes a chamber including, at an internal space thereof, a plasma generation region; an etching gas supply port supplying an etching gas; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port and an opening at the outside of the chamber as an exhaust port; and a concentrating mirror reflecting extreme ultraviolet light generated at the plasma generation region and having passed through the inlet port. A first recessed portion is provided at a part of a first region among an inner peripheral surface of the partition wall. The first region is on a travel direction side of the laser light with respect to the plasma generation region and surrounded by a curved surface that forms 45 degrees with respect to the optical axis of the laser light.
    Type: Application
    Filed: October 25, 2023
    Publication date: June 13, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Atsushi UEDA
  • Publication number: 20240186760
    Abstract: A laser apparatus includes a first seed laser outputting continuous-wave first seed laser light having a first wavelength, a second seed laser outputting continuous-wave second seed laser light having a second wavelength, an optical switch sequentially selecting the first seed laser light and the second seed laser light one at a time and outputting the selected seed laser light, a first pulsing section pulsing the selected laser light and outputting first pulse laser light, a wavelength converter outputting output laser light by using the first pulse laser light, and a processor controlling a timing of sequentially selecting the first seed laser light and the second seed laser light one at a time. The wavelength converter outputs the output laser light having a first converted wavelength produced using the first wavelength, and outputs the output laser light having a second converted wavelength produced using the second wavelength.
    Type: Application
    Filed: January 3, 2024
    Publication date: June 6, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Takayuki YABU, Taisuke MIURA
  • Publication number: 20240184211
    Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.
    Type: Application
    Filed: November 16, 2023
    Publication date: June 6, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Yuichi NISHIMURA, Yoshifumi UENO, Kotaro MIYASHITA
  • Publication number: 20240184220
    Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.
    Type: Application
    Filed: November 16, 2023
    Publication date: June 6, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Yuichi NISHIMURA, Yoshifumi UENO, Kotaro MIYASHITA
  • Publication number: 20240173796
    Abstract: A laser processing apparatus forms a hole in a workpiece having a resin layer on a processing surface by irradiating the workpiece with a laser beam discharge-excited between a pair of discharge electrodes, and includes a laser apparatus that outputs the laser beam having a first divergence angle in a discharge direction between the pair of discharge electrodes larger than a second divergence angle in a direction perpendicular to the discharge direction and a laser beam traveling direction, a transfer mask that forms a transfer pattern, an introducing optical system for guiding the laser beam to the transfer mask, a projection optical system that images the transfer pattern on the resin layer, and a divergence angle adjusting optical system that is disposed on an optical path of the laser beam and adjusts a difference between the first divergence angle and the second divergence angle to be reduced.
    Type: Application
    Filed: December 28, 2023
    Publication date: May 30, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Yasufumi KAWASUJI, Yasuhiro ADACHI, Akira SUWA
  • Publication number: 20240160107
    Abstract: An extreme ultraviolet light generation chamber device includes a chamber generating, at an internal space thereof, extreme ultraviolet light by irradiating a droplet target of tin with laser light to turn the droplet target into plasma; a target supply unit supplying the droplet target into the internal space; an extreme ultraviolet light concentrating mirror arranged in the internal space and including a reflection surface which reflects the extreme ultraviolet light; a first etching gas supply unit supplying an etching gas containing a hydrogen gas to the reflection surface having a flow velocity at the reflection surface variable; a data generation unit generating data reflecting reflectance of the extreme ultraviolet concentrating mirror; and a processor controlling the first etching gas supply unit to decrease the flow velocity when the data indicates that an amount of decrease in the reflectance is equal to or more than a reference value.
    Type: Application
    Filed: September 28, 2023
    Publication date: May 16, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Yoshiyuki HONDA
  • Publication number: 20240154381
    Abstract: A gas laser apparatus includes a voltage application circuit, a chamber device that includes an electrode and is configured to output light generated when a voltage is applied to the electrode from the voltage application circuit, a first pallet that includes a mounting surface on which the chamber device and the voltage application circuit are disposed in parallel with each other, and a housing unit in and out of which the first pallet is movable by movement in an in-plane direction of the mounting surface.
    Type: Application
    Filed: January 10, 2024
    Publication date: May 9, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Junichi FUJIMOTO, Akira SUWA
  • Patent number: 11978997
    Abstract: A laser apparatus includes an output coupling mirror; a grating that constitutes an optical resonator together with the output coupling mirror; a laser chamber in an optical path of the optical resonator; at least one prism in an optical path between the laser chamber and the grating; a rotary stage including an actuator that rotates the prism to change an incident angle of a laser beam from the laser chamber on the grating; a wavelength measuring unit that measures a central wavelength of the laser beam from the laser chamber through the output coupling mirror; an angle sensor that detects a rotation angle of the prism; a first control unit that controls the actuator at a first operation frequency; and a second control unit that controls the actuator at a second operation frequency.
    Type: Grant
    Filed: August 10, 2021
    Date of Patent: May 7, 2024
    Assignee: Gigaphoton Inc.
    Inventors: Hirotaka Miyamoto, Takuma Yamanaka, Miwa Igarashi
  • Publication number: 20240146011
    Abstract: A gas laser device includes a chamber device including electrodes at an inside thereof to be filled with laser gas and configured to output, through a window to an outside thereof, light generated from the laser gas when a voltage is applied to the electrodes; a mirror arranged at the outside of the chamber device and configured to reflect at least a part of the light output through the window; a holding portion holding the mirror; a support member configured to support the holding portion to be movable along a plane perpendicular to an optical axis of the light output through the window; a moving mechanism configured to move the holding portion with respect to the support member along the plane; and an angle maintaining mechanism configured to maintain an inclination angle of the holding portion with respect to the support member at a predetermined angle.
    Type: Application
    Filed: January 10, 2024
    Publication date: May 2, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Koji ASHIKAWA, Shinichi MATSUMOTO
  • Publication number: 20240136787
    Abstract: A gas laser device includes a laser oscillator outputting laser light, and a laser amplifier amplifying the laser light and outputting the amplified laser light. The laser amplifier includes a discharge chamber accommodating electrodes for causing discharge, an input coupling optical system causing part of the laser light to be transmitted toward the discharge chamber, and an output coupling optical system configuring an optical resonator together with the input coupling optical system and causing part of the laser light transmitted through the input coupling optical system and the discharge chamber to be transmitted therethrough and output the amplified laser light. A first focal point of the input coupling optical system and a second focal point of the output coupling optical system in a first direction being perpendicular to a direction of the discharge coincides at a position between the input coupling optical system and the output coupling optical system.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Yousuke FUJIMAKI
  • Publication number: 20240128702
    Abstract: A bypass apparatus is attachable to and detachable from a laser apparatus, and constitutes a bypass optical path bypassing a pulse width stretching apparatus stretching the pulse width of pulse laser light having entered the pulse width stretching apparatus, the bypass apparatus including optical elements constituting the bypass optical path, and an enclosure housing the optical elements, the optical elements including a first highly reflective mirror that reflects the pulse laser light entering the pulse width stretching apparatus out of the pulse width stretching apparatus and that guides the reflected pulse laser light to the bypass optical path, and a second highly reflective mirror reflecting the pulse laser light reflected off the first highly reflective mirror and incident on the second highly reflective mirror through the bypass optical path to cause the reflected pulse laser light to return to a light-exiting-side optical path of the pulse width stretching apparatus.
    Type: Application
    Filed: December 28, 2023
    Publication date: April 18, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Shinichi MATSUMOTO
  • Publication number: 20240126185
    Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.
    Type: Application
    Filed: September 7, 2023
    Publication date: April 18, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Yoshifumi UENO, Shogo KITASAKA, Yuichi NISHIMURA
  • Publication number: 20240128701
    Abstract: An ultraviolet laser device includes an oscillation stage laser outputting linearly polarized pulse laser light having an ultraviolet wavelength, an optical isolator arranged on an optical path between the oscillation stage laser and an amplifier, and a processor. The optical isolator includes a first polarizer, a first Faraday rotator rotating a polarization direction of the pulse laser light transmitted through the first polarizer in a first rotation direction, a second polarizer arranged so that the pulse laser light output from the first Faraday rotator is transmitted therethrough, a first actuator relatively moving the first magnet and the first Faraday material in an optical axis direction, and a first sensor measuring a power of pulse laser light reflected by the second polarizer among the pulse laser light output from the oscillation stage laser. The processor controls the first actuator based on a measurement result of the first sensor.
    Type: Application
    Filed: December 7, 2023
    Publication date: April 18, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Atsushi FUCHIMUKAI
  • Publication number: 20240128706
    Abstract: A control method of a discharge-excitation type laser device including a power source configured to control a pulse energy of pulse laser light includes: during a first period, outputting the pulse laser light including a plurality of pulses from the discharge-excitation type laser device while periodically changing a wavelength; calculating correction data for correcting a voltage command value to be set to the power source in accordance with a change in the wavelength by using first time-series data of pulse energies of the plurality of pulses; and during a second period, acquiring the voltage command value, correcting the acquired voltage command value using the correction data, and outputting the pulse laser light from the discharge-excitation type laser device in accordance with the corrected voltage command value.
    Type: Application
    Filed: December 15, 2023
    Publication date: April 18, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Keisuke ISHIDA
  • Publication number: 20240111219
    Abstract: A wavelength control method in a laser apparatus including a wavelength actuator configured to cyclically change the wavelength of pulse laser light output in the form of a burst includes reading data on a wavelength target value, determining from the data a first target wavelength and a second target wavelength shorter than the first target wavelength, and setting wavelengths of at least one first-period long wavelength pulse and at least one first-period short wavelength pulse contained in a first period at a start of a burst to a first set wavelength shorter than the first target wavelength and a second set wavelength longer than the second target wavelength, respectively, by using the first target wavelength and the second target wavelength to control the wavelength actuator.
    Type: Application
    Filed: December 14, 2023
    Publication date: April 4, 2024
    Applicant: Gigaphoton Inc.
    Inventors: Shigeto KISHIMOTO, Hirotaka MIYAMOTO
  • Patent number: 11947263
    Abstract: A laser chamber of a discharge-excitation-type gas laser apparatus may include a container which contains laser gas therein; a pair of discharge electrodes arranged in the container; a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; and a stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: April 2, 2024
    Assignee: Gigaphoton Inc.
    Inventors: Makoto Tanaka, Yosuke Fujimaki, Takashi Ito, Yousuke Kawagoe
  • Publication number: 20240103305
    Abstract: An optical isolator includes an enclosure, a first polarizer disposed in the enclosure, a first Faraday rotator including a first Faraday material rotating a polarization direction of the light having passed through the first polarizer, and a first magnet producing a first magnetic field applied to a first magnetic field generation region where the first Faraday material is disposed, the first Faraday rotator disposed in the enclosure, and a first position adjustment mechanism moving the first Faraday material relative to the enclosure. A cross-sectional shape of the first Faraday material in a cross section perpendicular to an optical axis of the light passing through the first Faraday material and a cross-sectional shape of the first magnetic field generation region have major axes in the same direction. The first position adjustment mechanism moves the first Faraday material in the direction of a minor axis perpendicular to the major axis.
    Type: Application
    Filed: December 7, 2023
    Publication date: March 28, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Atsushi FUCHIMUKAI
  • Publication number: 20240103336
    Abstract: A laser processing device includes a diffractive optical element dividing laser light into a plurality of beams of laser light and output the beams of laser light; a first acousto-optic element on which the beams of laser light from the diffractive optical element are incident, and which shifts, in accordance with a frequency of a voltage applied thereto, an optical path of the beams of laser light output therefrom along a first direction perpendicular to an irradiation direction of the beams of laser light; a first voltage application circuit applying a voltage of a desired frequency to the first acousto-optic element; a light concentrating optical system concentrating the beams of laser light output from the first acousto-optic element and radiate the beams of laser light to a workpiece; and a processor controlling the first voltage application circuit to adjust the frequency of the voltage applied to the first acousto-optic element.
    Type: Application
    Filed: December 8, 2023
    Publication date: March 28, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Yasufumi KAWASUJI
  • Publication number: 20240100631
    Abstract: A composite component includes a plurality of first fibers extending in a first direction, a plurality of second fibers extending in a second direction different from the first direction, and a matrix material with which gaps between the first fibers and the second fibers are filled, in which a plurality of holes are provided in each of at least one first row along the first direction and at least one second row along the second direction.
    Type: Application
    Filed: December 8, 2023
    Publication date: March 28, 2024
    Applicant: Gigaphoton Inc.
    Inventor: Yasufumi KAWASUJI
  • Patent number: 11940736
    Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.
    Type: Grant
    Filed: August 10, 2021
    Date of Patent: March 26, 2024
    Assignee: Gigaphoton Inc.
    Inventors: Gota Niimi, Yoshifumi Ueno, Shinji Nagai