Abstract: A laser apparatus includes an oscillation stage laser configured to generate and output a pulse laser beam, and an amplification stage laser configured to amplify the pulse laser beam output from the oscillation stage laser. The amplification stage laser includes an optical resonator configured to be a transfer optical system, a first discharge electrode pair and a second discharge electrode pair separated from each other in a first direction intersecting an optical path of the optical resonator, the first and second discharge electrode pairs being disposed across the optical path and configured to alternately discharge, and a slit disposed at a transfer position of the transfer optical system and configured to limit a beam size in a second direction orthogonal to the first direction of the pulse laser beam amplified by discharge of one of the first and second discharge electrode pairs.

Abstract: A laser apparatus according to one aspect of the present disclosure includes a line narrowing module and an output coupling mirror. The line narrowing module includes a prism including a transmission surface through which a laser beam is transmitted, a bottom surface in contact with the transmission surface, and a top surface facing the bottom surface, and a holder holding the prism on the bottom surface. The output coupling mirror includes a partial reflective film having a reflectance changing in a direction in which the bottom surface and the top surface face each other.

Abstract: A double-ended excitation laser amplifier includes a laser amplification medium configured to amplify pulsed seed light, an excitation light source configured to output excitation light, a first ?/4 wavelength plate and a first ?/2 wavelength plate through which the excitation light is transmitted, a first polarizing beam splitter configured to separate the excitation light transmitted through the first ?/4 wavelength plate and the first ?/2 wavelength plate into first light having a first polarization direction and second light having a second polarization direction, a first incident optical system configured to cause the first light to be incident on a first end of the laser amplification medium, and a second incident optical system configured to cause the second light to be incident on a second end of the laser amplification medium.

Abstract: A chamber of a gas laser apparatus, the chamber configured to encapsulate a laser gas in an internal space, includes an anode disposed in the internal space and having a longitudinal direction along a predetermined direction; a cathode disposed in the internal space and including a base and a discharge section protruding from the base toward the anode, the cathode having a longitudinal direction along the predetermined direction, the cathode being separate from and facing the anode; a cathode-side cover disposed in the internal space, being separate from a portion of the base and the discharge section, and covering the base; and a cathode-side sound absorbing member provided in a gap between the portion of the base and the cathode-side cover.

Abstract: An extreme ultraviolet light generation apparatus includes a chamber including a first space and a second space; a first partition wall including a first opening through which extreme ultraviolet light passes; a connection portion connecting the chamber and an external apparatus; a second partition wall including a second opening through which the extreme ultraviolet light passes; a gas supply port which allows a gas to pass therethrough; a first exhaust port which opens to the first space; a second exhaust port which opens to a third space located inside the connection portion; a first sensor arranged in the third space; and a processor calculating a first passage flow rate of a gas passing through the first opening based on a measurement result of the first sensor and adjusting a supply flow rate of the gas to be supplied through the gas supply port based on the first passage flow rate.

Abstract: A laser device includes a laser oscillation device configured to output pulse laser light; a beam intensity distribution measurement device configured to measure a beam intensity distribution of the pulse laser light; a beam angle distribution measurement device configured to measure a beam angle distribution of the pulse laser light; a pulse waveform measurement device configured to measure a pulse waveform of the pulse laser light; a spectrum measurement device configured to measure a spectrum of the pulse laser light; and a laser controller configured to calculate a speckle contrast based on measurement data of each of the beam intensity distribution, the beam angle distribution, the pulse waveform, and the spectrum.

Abstract: An extreme ultraviolet light generation system, generating extreme ultraviolet light by irradiating a target substance with laser light, includes a tank storing the target substance in a liquid state, a nozzle outputting the target substance stored in the tank, a piezoelectric element applying vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a droplet detection device detecting a time interval of passage of the droplets output from the nozzle, and at least one processor. The processor acquires a first value of a vibration parameter relating to the vibration of the piezoelectric element, acquires a variation of the time interval corresponding to each of a plurality of values including the first value of the vibration parameter, and generates the droplets using a second value with which the variation of the time interval is smaller than that with the first value.

Abstract: A gas laser device includes a chamber device including an electrode inside the chamber device in which a laser gas is sealed and configured to output, to outside through a window, light generated from the laser gas by a voltage being applied to the electrode, a mirror disposed outside the chamber device and configured to reflect a part of the light output from the chamber device, a holding portion holding the mirror and configured to be movable in a predetermined direction perpendicular to an optical axis of the light, a frame member configured to be movable in the predetermined direction and including an opening from which the mirror is exposed, a moving mechanism configured to cause the frame member to move, and an elastic connecting portion configured to connect the holding portion and the frame member with an elastic force.

Abstract: A discharge electrode to be used in a gas laser device for exciting a laser gas containing fluorine by discharge includes a cathode having an elongated cathode discharge surface, and an anode having an elongated anode discharge surface and arranged in a posture in which the anode discharge surface faces the cathode discharge surface. Here, a large number of recesses are formed on the cathode discharge surface in an initial state, and a large number of recesses are not formed on the anode discharge surface in the initial state.

Abstract: A gas laser apparatus includes a laser oscillator including a pair of discharge electrodes disposed to face each other and configured to generate light from laser gas upon application of voltage, and a laser-side resonator in which the light resonates; an amplifier including an amplification unit and an amplification-side resonator; a beam splitter configured to reflect a part of the light from the laser-side resonator; an optical sensor configured to detect the light reflected by the beam splitter; and a processor configured to control the voltage based on an output from the optical sensor. The amplification-side resonator includes a rear mirror and an output coupling mirror. The laser-side resonator includes a grating and an output coupling mirror. The processor maintains the voltage at a constant value equal to or larger than a threshold of the voltage when the voltage is to be smaller than the threshold.

Abstract: A chamber device includes a housing into which a laser gas is filled, a pair of discharge electrodes generating light from the laser gas when a voltage is applied thereto, a window arranged at a wall surface of the housing and transmitting the light therethrough, a first fan causing the laser gas to flow between the discharge electrodes, a filter, a second fan rotating together with the first fan by a drive force of a drive source of the first fan, a fan-side flow path causing the laser gas filtered by the filter to flow by the second fan and a part of the laser gas to flow in a direction away from the window, and a window-side flow path communicating with the fan-side flow path and causing the laser gas flowing from the fan-side flow path by the second fan to flow toward the window.

Abstract: A laser apparatus includes: an oscillator configured to output seed light in a pulse form; a first amplifier configured to amplify the seed light and to output first amplified light; a first beam splitter configured to split the first amplified light into first split light and second split light having energy smaller than that of the first split light; a first delay optical system configured to delay the second split light; a second amplifier configured to amplify the delayed second split light and to output second amplified light; a beam combiner configured to combine the first split light and the second amplified light and to output combined light; and a pulse stretcher configured to stretch a pulse width of the combined light.

Abstract: A method for manufacturing an optical module may include a step for arranging a first autocollimator such that output light is perpendicularly incident on an incident-side surface of an output coupling mirror; an step for arranging, between the incident-side surface and the first autocollimator, an optical element including a first reflection surface and a second reflection surface facing the incident-side surface as forming an angle of 45° with the first reflection surface such that light output from the first autocollimator is perpendicularly incident on the first reflection surface; a step for arranging a second collimator such that output light is reflected by the second reflection surface and perpendicularly incident on the incident-side surface; and a step for arranging the planar mirror, after removing the optical element, such that light output from the second autocollimator is perpendicularly incident on the reflection surface.

Abstract: A laser apparatus includes an oscillator configured to output seed light in a pulse form, a first amplifier configured to amplify the seed light and to output first amplified light, a first pulse stretcher configured to stretch a pulse width of the first amplified light, a beam splitter configured to split the first amplified light having a stretched pulse width into first split light and second split light having energy smaller than that of the first split light, a second amplifier configured to amplify a part of the second split light and to output second amplified light, a second pulse stretcher configured to stretch a pulse width of the second amplified light, and a beam combiner configured to combine the first split light and the second amplified light having a stretched pulse width to output combined light.

Abstract: A laser chamber according to an aspect of the present disclosure is a laser chamber including a pair of electrodes disposed so as to face each other in a first direction, the laser chamber being configured such that a laser gas can be introduced into the laser chamber, at least one of the pair of electrodes including a discharge section extending in a second direction perpendicular to the first direction, and a shoulder section disposed so as to surround a side surface of the discharge section, a surface of the discharge section having a discharge surface extending in the second direction and an end surface provided at an end portion of the discharge section in the second direction, the end surface being a portion of a spheroid.

Abstract: A wavelength conversion system includes a first nonlinear optical crystal which first light having a first wavelength enters and from which second light having a second wavelength is output, a second nonlinear optical crystal which the second light and third light having a third wavelength enter and from which the third light and fourth light having a fourth wavelength are output, a third nonlinear optical crystal which the third light and the fourth light enter and from which fifth light having a fifth wavelength is output, and a light concentrating optical system configured to cause the first light to enter the first nonlinear optical crystal. Here, the first nonlinear optical crystal is located in a range within a Rayleigh length of the second light, and the third nonlinear optical crystal is located in a range within a Rayleigh length of the fourth light.

Abstract: A laser processing system for forming recesses by radiating pulse laser light to processing receiving regions separate from each other in a first direction on a surface of a workpiece includes a gas laser apparatus that outputs the pulse laser light, a mover that moves a radiation receiving region on the surface that is irradiated with the pulse laser light in the first direction, and a first galvanometric scanner that changes the optical path of the pulse laser light to move the radiation receiving region in the first direction. The mover moves the radiation receiving region such that the moved radiation receiving region overlaps with a part of the radiation receiving region irradiated immediately before. The first galvanometric scanner moves the radiation receiving region such that the moved radiation receiving region is located within the processing receiving region different from the processing receiving region irradiated immediately before.

Abstract: A laser processing method is a laser processing method for forming plural recesses by radiating pulse laser light to plural processing receiving regions separate from each other on a surface of a workpiece, the method including a first process of radiating the pulse laser light to a different one of the processing receiving regions on a pulse basis, and a second process of radiating the pulse laser light to a different one of the processing receiving regions on a pulse basis in such a way that the different processing receiving region overlaps with a part of a radiation receiving region irradiated with the pulse laser light in the first process.

Abstract: A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.

Abstract: A laser processing system includes a laser apparatus that outputs a deep ultraviolet laser beam in response to a light emission trigger signal, an optical isolator including a polarizer, a deep ultraviolet light transmitting element, and a piezoelectric element connected to the deep ultraviolet light transmitting element, and a processor that supplies, to the piezoelectric element, a drive signal having a voltage changeable with a natural frequency of the deep ultraviolet light transmitting element, and transmits the light emission trigger signal to the laser apparatus using the natural frequency or a frequency obtained by dividing the natural frequency as a repetition frequency so that the deep ultraviolet light transmitting element functions as a ¼ wave plate by stress birefringence due to force from the piezoelectric element, and processing is performed by irradiating a workpiece with the laser beam from the optical isolator.