Abstract: A tilt stage includes a mounting table on which a target supply device supplying a target to a predetermined region in a chamber is mounted, a rotation support portion supporting the mounting table rotatably about at least first and second axes, a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table, a first adjuster adjusting posture of the target supply device by moving one of the first ball and the first contact surface in a first direction, a second tilt support portion including a second ball and a second contact surface in contact with the first ball and supporting the mounting table, and a second adjuster adjusting the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction.

Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which plasma is generated from a droplet target of tin irradiated with laser light; a gas supply port supplying an etching gas containing hydrogen to the internal space; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port of a gas and an opening at the outside of the chamber as an exhaust port of the gas; an exhaust device; and a concentrating mirror. The partition wall has an inner circumferential surface on which tin is more likely to be deposited on a downstream side of a predetermined position on a downstream side of the plasma generation region in a flow direction of the gas inside the partition wall than on an upstream side of the predetermined position.

Abstract: A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.

Abstract: A laser apparatus includes an oscillator that outputs laser light, an amplifier, a front optical system and a rear optical system that are disposed at positions where the front and rear optical systems face each other with a chamber sandwiched therebetween and constitute a ring resonator having a first optical path and a second optical path, and first plane parallel substrates disposed on the first optical path or the second optical path. The first optical path is an optical path along which the front optical system outputs the laser light. The second optical path is an optical path along which the rear optical system outputs the laser light. The first plane parallel substrates translate the first optical path and the second optical path, respectively, in the directions in which the first and second optical paths approach each other on the side facing the chamber.

Abstract: An electronic device manufacturing method includes performing scanning exposure in which plural scan fields of a first photosensitive substrate are exposed to pulse laser light having a reference wavelength, measuring overlay errors at plural positions in each of the plural scan fields, calculating the average of the overlay errors at each of the plural positions in scan fields scanned in the same scan direction out of the plural scan fields, calculating the amount of wavelength adjustment with respect to the reference wavelength in such a way that a first overlay error parameter calculated from the averages and distortions produced when the wavelength of the pulse laser light is changed from the reference wavelength is smaller than a second overlay error parameter calculated from the averages, causing a laser apparatus to generate the pulse laser light having a wavelength controlled by using the amount of wavelength adjustment, outputting the pulse laser light to an exposure apparatus, and exposing a second

Abstract: An extreme ultraviolet light generation chamber device includes a chamber including, at an internal space thereof, a plasma generation region; an etching gas supply port supplying an etching gas; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port and an opening at the outside of the chamber as an exhaust port; and a concentrating mirror reflecting extreme ultraviolet light generated at the plasma generation region and having passed through the inlet port. A first recessed portion is provided at a part of a first region among an inner peripheral surface of the partition wall. The first region is on a travel direction side of the laser light with respect to the plasma generation region and surrounded by a curved surface that forms 45 degrees with respect to the optical axis of the laser light.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.

Abstract: A laser apparatus includes a first seed laser outputting continuous-wave first seed laser light having a first wavelength, a second seed laser outputting continuous-wave second seed laser light having a second wavelength, an optical switch sequentially selecting the first seed laser light and the second seed laser light one at a time and outputting the selected seed laser light, a first pulsing section pulsing the selected laser light and outputting first pulse laser light, a wavelength converter outputting output laser light by using the first pulse laser light, and a processor controlling a timing of sequentially selecting the first seed laser light and the second seed laser light one at a time. The wavelength converter outputs the output laser light having a first converted wavelength produced using the first wavelength, and outputs the output laser light having a second converted wavelength produced using the second wavelength.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.

Abstract: A laser processing apparatus forms a hole in a workpiece having a resin layer on a processing surface by irradiating the workpiece with a laser beam discharge-excited between a pair of discharge electrodes, and includes a laser apparatus that outputs the laser beam having a first divergence angle in a discharge direction between the pair of discharge electrodes larger than a second divergence angle in a direction perpendicular to the discharge direction and a laser beam traveling direction, a transfer mask that forms a transfer pattern, an introducing optical system for guiding the laser beam to the transfer mask, a projection optical system that images the transfer pattern on the resin layer, and a divergence angle adjusting optical system that is disposed on an optical path of the laser beam and adjusts a difference between the first divergence angle and the second divergence angle to be reduced.

Abstract: An extreme ultraviolet light generation chamber device includes a chamber generating, at an internal space thereof, extreme ultraviolet light by irradiating a droplet target of tin with laser light to turn the droplet target into plasma; a target supply unit supplying the droplet target into the internal space; an extreme ultraviolet light concentrating mirror arranged in the internal space and including a reflection surface which reflects the extreme ultraviolet light; a first etching gas supply unit supplying an etching gas containing a hydrogen gas to the reflection surface having a flow velocity at the reflection surface variable; a data generation unit generating data reflecting reflectance of the extreme ultraviolet concentrating mirror; and a processor controlling the first etching gas supply unit to decrease the flow velocity when the data indicates that an amount of decrease in the reflectance is equal to or more than a reference value.

Abstract: A gas laser apparatus includes a voltage application circuit, a chamber device that includes an electrode and is configured to output light generated when a voltage is applied to the electrode from the voltage application circuit, a first pallet that includes a mounting surface on which the chamber device and the voltage application circuit are disposed in parallel with each other, and a housing unit in and out of which the first pallet is movable by movement in an in-plane direction of the mounting surface.

Abstract: A laser apparatus includes an output coupling mirror; a grating that constitutes an optical resonator together with the output coupling mirror; a laser chamber in an optical path of the optical resonator; at least one prism in an optical path between the laser chamber and the grating; a rotary stage including an actuator that rotates the prism to change an incident angle of a laser beam from the laser chamber on the grating; a wavelength measuring unit that measures a central wavelength of the laser beam from the laser chamber through the output coupling mirror; an angle sensor that detects a rotation angle of the prism; a first control unit that controls the actuator at a first operation frequency; and a second control unit that controls the actuator at a second operation frequency.

Abstract: A gas laser device includes a chamber device including electrodes at an inside thereof to be filled with laser gas and configured to output, through a window to an outside thereof, light generated from the laser gas when a voltage is applied to the electrodes; a mirror arranged at the outside of the chamber device and configured to reflect at least a part of the light output through the window; a holding portion holding the mirror; a support member configured to support the holding portion to be movable along a plane perpendicular to an optical axis of the light output through the window; a moving mechanism configured to move the holding portion with respect to the support member along the plane; and an angle maintaining mechanism configured to maintain an inclination angle of the holding portion with respect to the support member at a predetermined angle.

Abstract: A gas laser device includes a laser oscillator outputting laser light, and a laser amplifier amplifying the laser light and outputting the amplified laser light. The laser amplifier includes a discharge chamber accommodating electrodes for causing discharge, an input coupling optical system causing part of the laser light to be transmitted toward the discharge chamber, and an output coupling optical system configuring an optical resonator together with the input coupling optical system and causing part of the laser light transmitted through the input coupling optical system and the discharge chamber to be transmitted therethrough and output the amplified laser light. A first focal point of the input coupling optical system and a second focal point of the output coupling optical system in a first direction being perpendicular to a direction of the discharge coincides at a position between the input coupling optical system and the output coupling optical system.

Abstract: An ultraviolet laser device includes an oscillation stage laser outputting linearly polarized pulse laser light having an ultraviolet wavelength, an optical isolator arranged on an optical path between the oscillation stage laser and an amplifier, and a processor. The optical isolator includes a first polarizer, a first Faraday rotator rotating a polarization direction of the pulse laser light transmitted through the first polarizer in a first rotation direction, a second polarizer arranged so that the pulse laser light output from the first Faraday rotator is transmitted therethrough, a first actuator relatively moving the first magnet and the first Faraday material in an optical axis direction, and a first sensor measuring a power of pulse laser light reflected by the second polarizer among the pulse laser light output from the oscillation stage laser. The processor controls the first actuator based on a measurement result of the first sensor.

Abstract: A bypass apparatus is attachable to and detachable from a laser apparatus, and constitutes a bypass optical path bypassing a pulse width stretching apparatus stretching the pulse width of pulse laser light having entered the pulse width stretching apparatus, the bypass apparatus including optical elements constituting the bypass optical path, and an enclosure housing the optical elements, the optical elements including a first highly reflective mirror that reflects the pulse laser light entering the pulse width stretching apparatus out of the pulse width stretching apparatus and that guides the reflected pulse laser light to the bypass optical path, and a second highly reflective mirror reflecting the pulse laser light reflected off the first highly reflective mirror and incident on the second highly reflective mirror through the bypass optical path to cause the reflected pulse laser light to return to a light-exiting-side optical path of the pulse width stretching apparatus.

Abstract: A control method of a discharge-excitation type laser device including a power source configured to control a pulse energy of pulse laser light includes: during a first period, outputting the pulse laser light including a plurality of pulses from the discharge-excitation type laser device while periodically changing a wavelength; calculating correction data for correcting a voltage command value to be set to the power source in accordance with a change in the wavelength by using first time-series data of pulse energies of the plurality of pulses; and during a second period, acquiring the voltage command value, correcting the acquired voltage command value using the correction data, and outputting the pulse laser light from the discharge-excitation type laser device in accordance with the corrected voltage command value.

Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.

Abstract: A wavelength control method in a laser apparatus including a wavelength actuator configured to cyclically change the wavelength of pulse laser light output in the form of a burst includes reading data on a wavelength target value, determining from the data a first target wavelength and a second target wavelength shorter than the first target wavelength, and setting wavelengths of at least one first-period long wavelength pulse and at least one first-period short wavelength pulse contained in a first period at a start of a burst to a first set wavelength shorter than the first target wavelength and a second set wavelength longer than the second target wavelength, respectively, by using the first target wavelength and the second target wavelength to control the wavelength actuator.