Abstract: A solid-state laser system according to one aspect of the present disclosure includes a first semiconductor laser device configured to output a first pulse laser beam having a first wavelength, and a first burst pulse light generating apparatus including a first generation stage that generates a first burst pulse light beam including two pulse laser beams by branching the first pulse laser beam into a first branch light beam and a second branch light beam, and then coupling the first branch light beam and the second branch light beam. The first generation stage includes a first optical path having a first optical path length for propagating the first branch light beam, and a second optical path having a second optical path length, which is longer than the first optical path length, for propagating the second branch light beam.

Abstract: A debris trap is arranged on an exhaust path including a gas inlet port through which a gas containing debris flows from a chamber and a gas exhaust port through which the gas is exhausted. The debris trap includes a first multi-tube and a second multi-tube arranged respectively along a first direction which is a flow direction of the gas traveling from the gas inlet port to the gas exhaust port. Each of the first multi-tube and the second multi-tube includes a plurality of tubes having different maximum outer dimensions in a second direction perpendicular to the first direction. The second multi-tube is arranged downstream of the first multi-tube in the first direction. A number of tubes configuring the second multi-tube is more than a number of tubes configuring the first multi-tube.

Abstract: A laser management server for a laser device includes a sending and receiving processor receiving a query and transmit a query response; a query input processor receiving the query, decomposing the query, and generating a first query item that requires external information and a second query item that does not require external information; an agent action processor receiving the first query item, acquiring the required external information from unstructured data and structured data of the laser device, and generating an agent response; a response output processor receiving the second query item, receiving the agent response, and generating a query item prompt related to the second query item; and a large language model processor receiving the query item prompt, and generating a query item response. The response output processor receives the query item response, configures the query response, and transmits the query response to the sending and receiving processor.

Abstract: A laser processing method includes a first step of processing a pilot hole by irradiating fluororesin with a pulse laser beam having an ultraviolet wavelength so as to draw a first closed trajectory, and a second step of processing a hole by irradiating the fluororesin in which the pilot hole is processed with the pulse laser beam so as to draw a second closed trajectory that is similar in shape to the first closed trajectory and is larger than the first closed trajectory.

Abstract: A laser processing apparatus performs laser processing by irradiating a workpiece with a laser beam output from a laser apparatus, and includes a mask disposed on an optical path of the laser beam and having an opening, an illumination optical system that focuses the laser beam to illuminate the opening, a projection optical system that forms an image of the opening on a surface of the workpiece, a beam splitter disposed between the illumination optical system and the mask to branch the laser beam, an image sensor disposed on an optical path of the laser beam branched by the beam splitter to generate an image including a focal image of the laser beam on the mask, and a processor that corrects a focal position of the laser beam relative to the opening by controlling the illumination optical system based on the image.

Abstract: An excimer laser apparatus includes an optical resonator, a chamber that includes a pair of electrodes and is disposed in an optical path of the optical resonator, a pulse power module configured to apply a pulse voltage between the electrodes, a charger configured to store electric energy to be supplied to the pulse power module, an energy monitor configured to measure pulse energy of a pulse laser beam output from the optical resonator, and a processor configured to acquire a charging voltage command value of the charger and a measured value of the pulse energy for each of a plurality of pulses, to obtain a correlation between the charging voltage command value and the pulse energy, and to determine whether or not the measured value is outside an allowable range based on a calculated value of the pulse energy calculated from the charging voltage command value and the correlation.

Abstract: A laser apparatus includes an oscillation stage laser configured to generate and output a pulse laser beam, and an amplification stage laser configured to amplify the pulse laser beam output from the oscillation stage laser. The amplification stage laser includes an optical resonator configured to be a transfer optical system, a first discharge electrode pair and a second discharge electrode pair separated from each other in a first direction intersecting an optical path of the optical resonator, the first and second discharge electrode pairs being disposed across the optical path and configured to alternately discharge, and a slit disposed at a transfer position of the transfer optical system and configured to limit a beam size in a second direction orthogonal to the first direction of the pulse laser beam amplified by discharge of one of the first and second discharge electrode pairs.

Abstract: A laser device includes a discharge-excitation-type laser oscillator configured to output pulse laser light in an ultraviolet wavelength range, a first optical pulse stretcher including a beam splitter and a plurality of concave mirrors and configured to extend a pulse width of the pulse laser light, and a relay lens including a first lens and a second lens arranged on an optical path of the pulse laser light with the pulse width extended. The first lens is a spherical plano-convex lens, and the second lens has a focal length in a longitudinal direction of a beam cross section of the pulse laser light shorter than a focal length in a transverse direction thereof.

Abstract: A machine learning method includes acquiring image data generated from reflected light of illumination light radiated to a first region of a semiconductor film on a substrate, the first region annealed by pulse laser light, acquiring data on a measured semiconductor property of the first region, generating training data including the image data as input and the measured data as output associated with each other, and performing machine learning using a neural network based on the training data to generate a learned model.

Abstract: A laser chamber includes a container configured to be filled with a laser gas, a first electrode arranged in the container, a second electrode arranged at a position closer to an inner wall of the container than the first electrode while facing the first electrode, and a preionization device arranged on at least one lateral side of the first electrode. Here, the preionization device includes a dielectric pipe, a preionization inner electrode arranged in the dielectric pipe, a preionization outer electrode arranged in contact with outside of the dielectric pipe, an electrically insulating tube inserted between the dielectric pipe and the preionization inner electrode at an end part of the dielectric pipe in a longitudinal direction, and an electrically insulating fixing base that fixes the dielectric pipe at the end part of the dielectric pipe in the longitudinal direction and makes point contact with the dielectric pipe.

Abstract: A beam steering device includes a first mirror configured to reflect, in a second direction, laser light incident thereon in a first direction; a second mirror configured to reflect, in a third direction, the laser light reflected by the first mirror; a first stage configured to integrally move the first mirror and the second mirror in a direction parallel to the first direction; a second stage arranged on the first stage and configured to move the second mirror in a direction parallel to the second direction; and a holder arranged on the second stage and configured to adjust an orientation of a reflection surface of the second mirror.

Abstract: A gas laser device includes a chamber device outputting pulse laser light, a pulse stretcher including looped optical paths, and a housing including a main body portion in which an opening is formed. Each of the looped optical paths includes a beam splitter, and a plurality of circulation mirrors sequentially reflecting a part of the pulse laser light incident on the beam splitter and returning the part of the pulse laser light to the beam splitter to be superimposed on another part thereof. The pulse stretcher includes a plurality of units each including two or more optical elements and being able to be individually taken in and out through the opening. The plurality of units includes first and second units. A deterioration speed of at least one optical element of the first unit is higher than a deterioration speed of the optical elements of the second unit.

Abstract: A pulse width extension device includes a beam splitter configured to split pulse laser light into loop light and through light and superimpose the loop light circulated through a loop optical path at least once on the through light, and a plurality of concave mirrors configuring the loop optical path. A total number of the concave mirrors is 4n, where n is an integer equal to or more than 1. A first concave mirror on which the loop light is incident firstly from the beam splitter and a second concave mirror on which the loop light is incident thirdly or in a 4n-1-th order from the beam splitter, among the plurality of concave mirrors, are arranged such that an angle of a reflection surface of each of the first concave mirror and the second concave mirror is capable of being adjusted with a position thereof fixed.

Abstract: A gas laser device includes a chamber device configured to output pulse laser light, and a pulse stretcher including a plurality of looped optical paths configured to extend a pulse width of the pulse laser light. Each of the looped optical paths includes a beam splitter on which the pulse laser light is incident and a plurality of orbit mirrors configured to sequentially reflect a part of the pulse laser light incident on the beam splitter and return the part of the pulse laser light to the beam splitter so as to be superimposed on another part of the pulse laser light. The pulse stretcher includes a unit that is detachable as separating two or more of the beam splitters from one or more of the orbit mirrors.

Abstract: An electronic device manufacturing method includes acquiring a pulse spectral shape of pulse laser light, and a target integrated spectral shape realized by the pulse laser light of pulses generated based on wavelength sequence in which a center wavelength of the pulse laser light periodically changes; calculating target center wavelengths allocated to the pulses to realize the target integrated spectral shape, and a number of allocation pulses of each target center wavelength being the number of allocation pulses per cycle of the wavelength sequence; calculating the wavelength sequence by correspondingly allocating at least one first center wavelength having the number of allocation pulses of 2 or greater so that the smaller the number of allocation pulses is, the larger a time interval of the allocation pulses for the first center wavelength is, and then correspondingly allocating at least one second center wavelength having the number of allocation pulses of 1.

Abstract: An extreme ultraviolet light generation system includes a chamber, a target supply unit supplying a target substance to a plasma generation region including a first point in the chamber, a window allowing pulse laser light with which the target substance is irradiated to pass therethrough, an EUV light concentrating mirror concentrating extreme ultraviolet light generated at the first point on a second point, a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and between the first and second points, an actuator causing the second point to be switched between a first position and a second position, a connection portion connectable to an external apparatus, a first EUV measurement unit on which the extreme ultraviolet light having passed through the second position is incident, and a processor controlling the actuator based on a signal from the external apparatus.

Abstract: An optical pulse stretcher that stretches a pulse width of a pulse laser beam includes a polarizer configured to separate a component in a specific polarization direction of the pulse laser beam that has entered, a delay optical system including a plurality of mirrors through which the pulse laser beam reflected by or transmitted through the polarizer is propagated; and a first Faraday rotator that includes a first magnet and a first Faraday material and is disposed on an optical path of the delay optical system to rotate a polarization direction of the pulse laser beam.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.

Abstract: An ultraviolet laser device includes an oscillation stage laser outputting linearly polarized pulse laser light having an ultraviolet wavelength, an optical isolator arranged on an optical path between the oscillation stage laser and an amplifier, and a processor. The optical isolator includes a first polarizer, a first Faraday rotator rotating a polarization direction of the pulse laser light transmitted through the first polarizer in a first rotation direction, a second polarizer arranged so that the pulse laser light output from the first Faraday rotator is transmitted therethrough, a first actuator relatively moving the first magnet and the first Faraday material in an optical axis direction, and a first sensor measuring a power of pulse laser light reflected by the second polarizer among the pulse laser light output from the oscillation stage laser. The processor controls the first actuator based on a measurement result of the first sensor.

Abstract: A chamber apparatus for a laser includes a chamber, a first optical path tube, a window, a resonance vessel, and a nozzle tube. In the chamber, a pair of discharge electrodes are disposed. The first optical path tube communicates with the chamber. The window is configured such that light is incident thereon from a region between the discharge electrodes via an interior of the first optical path tube. The nozzle tube is configured to cause the interior of the first optical path tube to communicate with the resonance vessel.